* Prof. Chin-Wook Chung

                   [ Á¤Áø¿í ±³¼ö´Ô]

- ¼Ò¼Ó Affiliation

   Professor in Department of Electrical Engineering

   Plasma Electronics Laboratory 

   Room 403-1  Annex of the Engineering Center
   Hanyang University, Seoul, 133-791, Korea

   Office : +82-2-2220-0344
   FAX   : +82-2-2281-9912

   E-mail: joykang@hanyang.ac.kr

- °­ÀÇ°ú¸ñ Lectures

      ÇкΠUndergraduate School

          1Çбâ : ÀüÀÚ±âÇÐ, ÇöóÁ ÀüÀÚ°øÇÐ
          2Çбâ : ÀüÀÚÀå, ¼öÄ¡Çؼ®

      ´ëÇпø Graduate School

           1Çбâ: ÇöóÁ °øÇÐƯ·Ð, ¹Ú¸·°øÁ¤
           2Çбâ: ÇöóÁ ¼Ò½º Áø´Ü Ư·Ð

Textbook :

   °øÁ¤ÇöóÁ ±âÃÊ¿Í ÀÀ¿ë (ÇкÎ)

    Principles of Plasma Discharges and Materials Processing (´ëÇпø)

- °ü½ÉºÐ¾ß Research Interests

 - ÇöóÁ Áø´Ü  Advanced Plasma Dagnostics

           Àü±âÀû & ±¤ÇÐÀû ¹æ¹ý (Electrical & Optical method)

           2D ÇöóÁ ºÐ¼® (2D Plasma Analysis)

           °øÁ¤ ¸ð´ÏÅ͸µ (Processing Monitoring)

  - ¹ÝµµÃ¼/ µð½ºÇ÷¹ÀÌ¿ë ÇöóÁ ¼Ò½º Plasma Sources for Processing

          Â÷¼¼´ë ÇöóÁ °³¹ß

          Àü·Â È¿À² ¹× Àü·Â Ư¼º °³¼± ¿¬±¸

          °í¹Ðµµ ÇöóÁ ¹°¼º ºÐ¼® (High density plasma)

          ÀüÀÚ±â ÄÄÇ»ÅÍ ¸ð»ç (E&M Field Analysis)

  - ¹«¼± Àü·Â Àü¼Û Wireless Power Transfer