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¡æ Last Updated: Wednesday, 29 June 2011, 22:00 GMT
No. |
Date |
ºÐ·ù |
ÇмúȸÀǸí (Conference) |
Àå¼Ò |
¹ßÇ¥ÀÚ |
¹ßÇ¥ÁÖÁ¦(Title) |
195 |
2013.11 |
±¹¿Ü |
International Conference on Surface Engineering 2013 |
ºÎ»ê |
Á¶¼º¿ø |
Thermo-Compression Flipchip Interconnection using Plasma Enhanced Copper Organic Solderability Preservative Etched Substrate |
194 |
2013.11 |
±¹¿Ü |
International Conference on Surface Engineering 2013 |
ºÎ»ê |
±èµ¿È¯ |
A comparative study on the floating harmonic method using dual frequency in an inductive discharge |
193 |
2013.11 |
±¹¿Ü |
9th Asia Plasma and Fusion Association Conference |
°æÁÖ |
±èµ¿È¯ |
A plasma diagnostic technique using intermodulation frequencies in a floating Langmuir probe |
192 |
2013.11 |
±¹¿Ü |
9th Asia Plasma and Fusion Association Conference |
°æÁÖ |
¹ÚÀϼ |
Time-resolved measurements of far-SOL plasma arameters in H-mode discharges during ELM crash using sideband technique |
191 |
2013.09 |
±¹¿Ü |
66th Gaseous Electronics Conference |
Princeton |
ÀÌȿâ |
Polymerizable Supramolecular Sensor for Plasma Diagnostics on Wafer Level |
190 |
2013.09 |
±¹¿Ü |
66th Gaseous Electronics Conference |
Princeton |
ÀÌÀç¿ø |
A study of increasing radical density and etch rate using remote plasma generator system |
189 |
2013.09 |
±¹¿Ü |
66th Gaseous Electronics Conference |
Princeton |
°ÇöÁÖ |
Measurement of electron energy distribution functions in a low pressure and low density inductively coupled plasma |
188 |
2013.09 |
±¹¿Ü |
66th Gaseous Electronics Conference |
Princeton |
ÀÌȿâ |
Evolution of Electron Temperature and Coupling between Electron Temperature and Power Absorption |
187 |
2013.09 |
±¹¿Ü |
66th Gaseous Electronics Conference |
Princeton |
ÀÌȿâ |
E to H Heating Mode Transition and Hysteresis in Inductively Coupled Plasma |
186 |
2013.09 |
±¹¿Ü |
66th Gaseous Electronics Conference |
Princeton |
ÀÌȿâ |
Effect of Radio Frequency Bias on the Plasma Density and Electron Heating in Inductive Discharge |
185 |
2013.09 |
±¹¿Ü |
66th Gaseous Electronics Conference |
Princeton |
±èÀ¯½Å |
A new method for measuring pulsed plasma with hightime resolution based on floating harmonic method |
184 |
2013.09 |
±¹¿Ü |
66th Gaseous Electronics Conference |
Princeton |
±è¿µÃ¶ |
Non-invasive electrical method for measurement of electron temperature in an atmospheric pressure plasma jet source |
183 |
2013.09 |
±¹¿Ü |
66th Gaseous Electronics Conference |
Princeton |
¿À½ÂÁÖ |
A study on measurement of the surface charge accumulation using anodic aluminum oxide template |
182 |
2013.09 |
±¹¿Ü |
66th Gaseous Electronics Conference |
Princeton |
±èÁø¿ë |
Real time monitoring of dielectric-film thickness on the surface of chamber wall for plasma processing |
181 |
2013.08 |
±¹¿Ü |
9th Asian-European International Conference On Plasma Surface Engineering |
Á¦ÁÖµµ |
±è°æÇö |
E-H transition measurement in cylindrical ICP with external DC magnetic field |
180 |
2013.08 |
±¹¿Ü |
9th Asian-European International Conference On Plasma Surface Engineering |
Á¦ÁÖµµ |
¿À½ÂÁÖ |
Correlation between electrical characteristics of RF bias and plasma parameters in biased inductively coupled |
179 |
2013.08 |
±¹¿Ü |
9th Asian-European International Conference On Plasma Surface Engineering |
Á¦ÁÖµµ |
ÀÌȿâ |
Photochromic Polymer Sensor for Plasma Diagnostic |
178 |
2013.08 |
±¹¿Ü |
9th Asian-European International Conference On Plasma Surface Engineering |
Á¦ÁÖµµ |
ÀÌȿâ |
Effect of Antenna Size on the E to H Heating Mode Transition in Inductively Coupled Plasma |
177 |
2013.08 |
±¹¿Ü |
9th Asian-European International Conference On Plasma Surface Engineering |
Á¦ÁÖµµ |
ÀÌȿâ |
Effect of Flow Rate related to Pressure Gradient in Plasma Process Reactor |
176 |
2013.08 |
±¹¿Ü |
9th Asian-European International Conference On Plasma Surface Engineering |
Á¦ÁÖµµ |
¹®ÁØÇö |
Experimental verification of the characteristic of plasmas on the effect of antenna turns in inductively coupled plasmas |
175 |
2013.08 |
±¹¿Ü |
9th Asian-European International Conference On Plasma Surface Engineering |
Á¦ÁÖµµ |
Á¶¼º¿ø |
Effect of Flow Rate on the Plasma Parameters in a Dual Type Inductively Coupled Plasma |
174 |
2013.06 |
±¹¿Ü |
2013 International Forum on Functional Materials |
Á¦ÁÖµµ |
±è¿µÃ¶ |
Gas temperature measurement in atmospheric pressure plasma sources |
173 |
2013.06 |
±¹¿Ü |
IEEE Pulsed power & plasma science PPPS 2013 |
San Francisco |
¹ÚÀϼ |
OBSERVATION OF THE ELM ACTIVITY THE FAR SOL REGION OF KSTAR TOKAMAK PLASMA USING PROBE DIAGNOSTICS |
172 |
2013.06 |
±¹¿Ü |
IEEE Pulsed power & plasma science PPPS 2013 |
San Francisco |
±èµ¿È¯ |
ADVANCED ELECTROSTATIC PLASMA DIAGNOSTIC USUNG SIDEBAND FLOATING HARMONIC METHOD |
171 |
2013.02 |
±¹³» |
Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
°ÇöÁÖ |
Àú¹Ðµµ À¯µµ °áÇÕ ÇöóÁ¿¡¼ ÀüÀÚ ¿¡³ÊÁö ºÐÆ÷ ÃøÁ¤ |
170 |
2013.02 |
±¹³» |
Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
¹ÚÀϼ |
ÀÌÁß ÁÖÆļöÀÇ À§»óº¯È¿¡ µû¸¥ ÀÚ±â¹ÙÀ̾¸¦ ÀÌ¿ëÇÑ ÇöóÁ º¯¼ö ÃøÁ¤ |
169 |
2013.02 |
±¹³» |
Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
±èÁø¿ë |
ÆòÆÇÇü ŽħÀ» ÀÌ¿ëÇÑ °øÁ¤ è¹ö º® ÁõÂø ¸· µÎ²² ÃøÁ¤ |
168 |
2013.02 |
±¹³» |
Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
±èµ¿È¯ |
´Ù¾çÇÑ ºÎÀ¯ °íÁ¶ÈÆÄ Å½Ä§¹ýÀÇ ºñ±³¿¬±¸ |
167 |
2013.02 |
±¹³» |
Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
±èÀ¯½Å |
ÆÞ½ºÇöóÁ¿¡¼ ºÎÀ¯°íÁ¶È¸¦ ÀÌ¿ëÇÏ¿© °í½Ã°£ºÐÇØ´ÉÀ¸·Î ÇöóÁ Áø´Ü¹æ¹ý |
166 |
2013.02 |
±¹³» |
Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
ȲÇýÁÖ |
À¯µµ °áÇÕ »ê¼Ò ÇöóÁ¿¡¼ °íÁ¶ÈÆÄ ºÐ¼®¹ýÀ» ÀÌ¿ëÇÑ À½ÀÌ¿Â °ø°£ ºÐÆ÷ ÃøÁ¤ |
165 |
2013.02 |
±¹³» |
Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
±è¿µÃ¶ |
ÇöóÁ¿¡¼ º¼Ã÷¸¸ °ü°è½ÄÀÇ ½ÇÇèÀû °ËÁõ |
164 |
2013.02 |
±¹³» |
Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
¿À½ÂÁÖ |
±ØÆÇ Àü±ØÀÌ Àΰ¡µÈ À¯µµ °áÇÕ ÇöóÁ¿¡¼ À¯µµ °áÇÕ Àü±âÀå°ú ¿ë·®¼º °áÇÕ Àü±âÀå¿¡ °üÇÑ ÀüÀÚ °¡¿ ¿¬±¸ |
163 |
2013.02 |
±¹³» |
Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
ÀÌÀç¿ø |
SMP(Symmetric Multi-Power) ¾ÈÅ׳ª¿¡ ÀÇÇÑ ÇöóÁ ¹Ðµµ ºÐÆ÷ °³¼±¿¡ ´ëÇÑ ¿¬±¸ |
162 |
2013.02 |
±¹³» |
Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
±è¿µµµ |
À¯µµ°áÇÕ ÇöóÁ¿¡¼ ÀÓÇÇ´ø½º Á¤ÇÕÁ¶°ÇÀ» ÀÌ¿ëÇÑ ºñħÅõ½Ä Áø´Ü¹æ¹ý |
161 |
2013.02 |
±¹³» |
2013 KSTAR Conference |
Ãæ³²ºÎ¿© |
¹ÚÀϼ |
Investigation on the far-SOL particle transport after ELM crash using probe diagnostics |
160 |
2012.1 |
±¹¿Ü |
65th Gaseous Electronics Conference |
U.S.A |
ȲÇýÁÖ |
Spatial distributions measurement of negative ion density by using floating probe in the oxygen inductive coupled plasmas |
159 |
2012.1 |
±¹¿Ü |
65th Gaseous Electronics Conference |
U.S.A |
°ÇöÁÖ |
Transmission characteristics of the wave cut-off probe with parallel plates |
158 |
2012.1 |
±¹¿Ü |
65th Gaseous Electronics Conference |
U.S.A |
ÀÌÈñÁø |
Control of plasma density profile via wireless power transfer in an inductively coupled discharge |
157 |
2012.1 |
±¹¿Ü |
65th Gaseous Electronics Conference |
U.S.A |
ÇÑ´ö¼± |
Experimental measurement of plasma parameters and electron energy distribution in ferrite-core side type Ar/He inductively coupled plasma |
156 |
2012.1 |
±¹¿Ü |
65th Gaseous Electronics Conference |
U.S.A |
ÀÌȿâ |
Spatial plasma potentials and electron energy distributions in inductively and capacitively coupled plasmas under a weakly collisional and nonlocal electron kinetic regime |
155 |
2012.08 |
±¹³» |
The 2nd International Symposium on Plasma Biosciences |
±¤¿î´ë |
±è¿µÃ¶ |
GAS TEMPERATURE MEASUREMENT USING OPTICAL EMISSION SPECTROSCOPY FOR ATMOSPHERIC PLASMA DIAGNOSTICS |
154 |
2012.08 |
±¹³» |
The 2nd International Symposium on Plasma Biosciences |
±¤¿î´ë |
±è¿µÃ¶ |
ELECTRON TEMPERATURE MEASUREMENT IN ATMOSPHERE PLASMA USING FLOATING HARMONIC DIAGNOSTIC METHOD |
153 |
2012.07 |
±¹¿Ü |
International Conference on Plasma Science |
¿¡µò¹ö·¯ |
±èÀ¯½Å |
Plasma diagnostics with high-time resolution based on floating harmonic method in pulsed plasma |
152 |
2012.07 |
±¹¿Ü |
International Conference on Plasma Science |
¿¡µò¹ö·¯ |
±èµ¿È¯ |
Probe diagnostics in the edge of KSTAR tokamak plasma using fast floating harmonic method |
151 |
2012.07 |
±¹³» |
"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)" |
Á¦ÁÖµµ |
±èµ¿È¯ |
A study on the scale up of plasma processing chamber by using global model |
150 |
2012.07 |
±¹³» |
"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)" |
Á¦ÁÖµµ |
±è¿µµµ |
A study on the correlations between external discharge parameters and plasma characteristics in an inductively coupled plasma using transformer circuit model |
149 |
2012.07 |
±¹³» |
"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)" |
Á¦ÁÖµµ |
ȲÇýÁÖ |
A new method for measuring transferred power to plasma in inductive discharge |
148 |
2012.07 |
±¹³» |
"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)" |
Á¦ÁÖµµ |
±è¿µµµ |
Spatial characteristics of plasma parameters in a weak dc magnetic field in solenoidal inductive discharge |
147 |
2012.07 |
±¹³» |
"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)" |
Á¦ÁÖµµ |
ÀÌÀç¿ø |
Characteristics of electron cyclotron resonance in magnetized solenoid type inductively coupled plasmas |
146 |
2012.07 |
±¹³» |
"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)" |
Á¦ÁÖµµ |
ÀÌȿâ |
Collisionless electron heating and control of electron energy distribution by adding pulsed inductive fields in capacitively coupled plasma |
145 |
2012.07 |
±¹³» |
"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)" |
Á¦ÁÖµµ |
À̼öÁø |
Mode transition of power dissipation in and plasma parameters in an asymmetric capacitive discharge |
144 |
2012.07 |
±¹³» |
"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)" |
Á¦ÁÖµµ |
¿À¼¼Áø |
Interpolation for two-dimensional spatial distribution estimation of plasma densities in a cylindrical RF discharge reactor |
143 |
2012.07 |
±¹³» |
"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)" |
Á¦ÁÖµµ |
Á¶¼º¿ø |
Effect of plasma density distribution for polymer surface etching at low frequency (50 kHz) O2+CF4 capacitive discharge |
142 |
2012.07 |
±¹³» |
"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)" |
Á¦ÁÖµµ |
Á¶¼º¿ø |
The Digital Matching System with Transformer type for 400 kHz Ferrite inductively Coupled Plasma |
141 |
2012.05 |
±¹¿Ü |
IWPT 2012 (Innovative Wireless Power Transmission: Technologies, Systems, and Applications) |
±³Åä |
ÀÌÈñÁø |
Electromagnetically Coupled Resonators Using Toroidal Ferrite Core for Wireless Power Transfer |
140 |
2012.02 |
±¹³» |
KSTAR Conference |
¹«ÁÖ |
±èµ¿È¯ |
Plasma diagnostic in the SOL region of KSTAR using floating harmonic method |
139 |
2012.02 |
±¹³» |
Á¦ 42ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
¹ÚÀϼ |
ÀÌÁßÁÖÆļö ºÎÀ¯Çü Žħ¹ýÀ» ÀÌ¿ëÇÑ ÇöóÁ Áø´Ü ¿¬±¸ |
138 |
2012.02 |
±¹³» |
Á¦ 42ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
±èÇöÁØ |
Àü·Â °ø±Þ ¹æ½Ä¿¡ µû¸¥ À¯µµ °áÇÕ ÇöóÁ Ư¼º º¯È ¿¬±¸ |
137 |
2012.02 |
±¹³» |
Á¦ 42ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
¿À½ÂÁÖ |
ÁؾÈÁ¤ ÁØÀ§¸¦ Æ÷ÇÔÇÑ Çï·ý ÇöóÁÀÇ ¿µÂ÷¿ø ¸ð»ç ¿¬±¸ |
136 |
2012.02 |
±¹³» |
Á¦ 42ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
ȲÇýÁÖ |
À¯µµ °áÇÕ ÇöóÁ¿¡¼ ½Ã½ºÅÛÀÇ ¼Òºñ Àü·Â ÃøÁ¤ ¹æ¹ý¿¡ ´ëÇÑ ¿¬±¸ |
135 |
2012.02 |
±¹³» |
Á¦ 42ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
±èµ¿È¯ |
0Â÷¿ø ¸ðµ¨À» ÀÌ¿ëÇÑ °øÁ¤Àåºñ Scale Up ¿¬±¸ |
134 |
2012.02 |
±¹³» |
Á¦ 42ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
ÇÑ´ö¼± |
Uniformity Control by Using Helium Gas in the Large Area Ferrite Side Type inductively Coupled Plasma |
133 |
2012.02 |
±¹³» |
Á¦ 42ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
ÀÌÀç¿ø |
ÀÚ±âÀåÀ» Àΰ¡ÇÑ ¼Ö·¹³ëÀ̵åÇü À¯µµ °áÇÕ ÇöóÁ ÀåÄ¡¿¡¼ÀÇ ÀüÀÚ ½ÎÀÌŬ·ÎÆ®·Ð °ø¸í ÇöóÁ Ư¼º |
132 |
2012.02 |
±¹³» |
Á¦ 42ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
°ÇöÁÖ |
°íÁÖÆļö ÃàÀü °áÇÕ ÇöóÁ¿¡¼ ÇöóÁ º¯¼öµéÀÌ Àü±âÀå ºÐÆ÷¿¡ ¹ÌÄ¡´Â ¿µÇâ¿¡ ´ëÇÑ ¿¬±¸ |
131 |
2012.02 |
±¹³» |
Á¦ 42ȸ Çѱ¹Áø°øÇÐȸ |
Æòâ |
ÀÌȿâ |
À¯µµ°áÇÕÇöóÁ¿¡¼ ÇöóÁ º¯¼ö¿Í ÀüÀÚ ¿¡³ÊÁö ºÐÆ÷¿¡ ´ëÇÑ RF biasÀÇ ¿µÇâ |
130 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
ÀÌȿâ |
Role of additional inductive power on the electron energy distribution in Ar/O2 capacitively coupled plasma |
129 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
°ÇöÁÖ |
The effect of collision frequency on the electric field distribution in a high frequency capacitive discharge |
128 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
±èÇöÁØ |
Experimental observation of balanced power effect of antenna on plasma parameters in inductively coupled plasma |
127 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
ÀÌÀç¿ø |
Measurement of power transfer efficiency and ion density in various radio-frequency inductively couipled plasma |
126 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
¿À½ÂÁÖ |
A study on plasma parameters in various mixed Ar/SF6 inductively coupled plasma |
125 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
±è¿µµµ |
A simple analysis of inductively coupled discharge using transformer circuit model |
124 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
±èÁø¿ë |
Measurement of electron energy distribution in magnetized solenoidal inductively coupled plasma |
123 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
À̼öÁø |
Electrical characteristics and mode transition of power dissipation in an asymmetric capacitively coupled plasma |
122 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
ÀÌ¿µ±¤ |
Experimental investigation of argon metastable density and electron temperature in low-pressure plasma by line ratio OES technique |
121 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
¿À¼¼Áø |
Double probe using an ac bias signal for plasma parameters measurement |
120 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
À¯°æ |
A study on floating method in non-Maxwellian plasmas |
119 |
2011.11 |
±¹¿Ü |
64th Gaseous Electronics Conference |
Salt Lake city, USA |
±è¿µÃ¶ |
Measurement of the plasma density and electron temperature uniformities in inductively coupled plasmas using 2D real time measurement method |
118 |
2011.08 |
±¹³» |
Á¦41ȸ Çѱ¹Áø°øÇÐȸ µ¿°èÁ¤±âÇмú´ëȸ |
´ë±¸ EXCO |
ÀÌ¿µ±¤ |
±¤¹æ»ç ¼¼±âºñ¸¦ ÀÌ¿ëÇÑ °øÁ¤ ÇöóÁÀÇ º¯¼ö Áø´Ü |
117 |
2011.08 |
±¹³» |
Á¦41ȸ Çѱ¹Áø°øÇÐȸ µ¿°èÁ¤±âÇмú´ëȸ |
´ë±¸ EXCO |
°ÇöÁÖ |
Ãæµ¹ÁÖÆļö°¡ °íÁÖÆÄ ¼öÆòÇàÆòÆÇ ÇöóÁÀÇ Àü±âÀå ±ÕÀϵµ¿¡ ¹ÌÄ¡´Â ¿µÇâ ¿¬±¸ |
116 |
2011.07 |
±¹¿Ü |
The 3rd International Conference on Microelectronics and Plasma Technology |
Dalina, China |
¿À¼¼Áø |
Real-time Dose Monitoring System by Sensing Implanter Current and Biased Pulse Voltage in Plasma Source Ion Implantation |
115 |
2011.07 |
±¹¿Ü |
The 3rd International Conference on Microelectronics and Plasma Technology |
Dalina, China |
ÀÌȿâ |
Studies on the spatial and Temporal Behaviors of the Electron Energy Distribution and Plasma Parameters in inductively and/or capacitively coupled plasma |
114 |
2011.07 |
±¹¿Ü |
The 3rd International Conference on Microelectronics and Plasma Technology |
Dalina, China |
¿À½ÂÁÖ |
Numerical Calculation of Spatial Electric Field by RF Bias in High Density Plasmas |
113 |
2011.07 |
±¹¿Ü |
The 3rd International Conference on Microelectronics and Plasma Technology |
Dalina, China |
±è¿µÃ¶ |
Study on plasma uniformity by using 2D real time measurement method in Ar/He inductively coupled plasmas |
112 |
2011.07 |
±¹¿Ü |
The 3rd International Conference on Microelectronics and Plasma Technology |
Dalina, China |
±è¿µµµ |
Spatial evolutions of the electron energy distributions in a weakly magnetized solenoidal-type inductively coupled plasma |
111 |
2011.02 |
±¹³» |
±¹°¡ÇÙÀ¶ÇÕ¿¬±¸¼Ò(NFRI) |
¹«ÁÖ, Çѱ¹ |
¹æÁø¿µ |
Real-time observation of capacitance of surface material during plasma operation |
110 |
2011.02 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ |
Æòâ, Çѱ¹ |
Á¤Áø¿í |
°øÁ¤ ÇöóÁ Áø´ÜÀ» À§ÇÑ °íÁ¶ÈÆÄ ºÐ¼®¹ý ¹× Áø´Ü °á°ú |
109 |
2011.02 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ |
Æòâ, Çѱ¹ |
¹æÁø¿µ |
ÇöóÁ·ÎºÎÅÍÀÇ ÀÌ¿ÂÆ÷°Ý¿¡ ÀÇÇÑ Ç¥¸é¹°ÁúÀÇ À¯Àüü Ư¼º º¯È °üÂû |
108 |
2011.02 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ |
Æòâ, Çѱ¹ |
¿À¼¼Áø |
¹ÝµµÃ¼ ÇöóÁ ÀÌ¿Â ÁÖÀÔ°øÁ¤¿¡¼ Á÷·ù ÆÞ½º Àü¾Ð, Àü·ù °¨Áö¸¦ ÅëÇÑ ½Ç½Ã°£ µµÁî ¸ð´ÏÅ͸µ ½Ã½ºÅÛ °³¹ß |
107 |
2011.02 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ |
Æòâ, Çѱ¹ |
±èÇöÁØ |
À¯µµ °áÇÕ ÇöóÁ¿¡¼ ¹ë·±½º ÆÄ¿ö¿¡ ÀÇÇÑ ÀüÀڹеµÀÇ Áõ°¡ È¿°ú |
106 |
2011.02 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ |
Æòâ, Çѱ¹ |
À̼öÁø |
ºñ´ëĪ Àü±Ø ±¸Á¶¸¦ °®´Â ¿ë·®¼º °áÇÕ ÇöóÁ¿¡¼ÀÇ ¹æÀü Ư¼º°ú Àü·Â ¼Òºñ ¸ðµå ÀüÀÌ¿¡ °üÇÑ ¿¬±¸ |
105 |
2011.02 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ |
Æòâ, Çѱ¹ |
ÀÌÀç¿ø |
´Ù¾çÇÑ °øÁ¤ ÁÖÆļö¿¡¼ À¯µµ °áÇÕ ÇöóÁÀÇ ÇöóÁ ¹Ðµµ¿Í ¿¡³ÊÁö Àü´Þ È¿À² ÃøÁ¤ |
104 |
2011.02 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ |
Æòâ, Çѱ¹ |
ÃÖÀÍÁø |
ÃàÀü±âÀÇ °úµµ Çö»óÀ» ÀÌ¿ëÇÑ ºÎÀ¯Çü ´ÜÀÏŽħ ÇöóÁ Áø´Ü¹ý ¿¬±¸ |
103 |
2011.02 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ |
Æòâ, Çѱ¹ |
ÀÌ¿µ±¤ |
The influence of radiation trapping on the metastable population density and applications to low-pressure plasma |
102 |
2011.02 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ |
Æòâ, Çѱ¹ |
À¯°æ |
Ç¥¸é ºÐ¼®¹ýÀ» ÀÌ¿ëÇÑ ÇöóÁ¿¡¼ÀÇ º¸·Ð¹Ú¸· µÎ²² ÃøÁ¤ |
101 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
ÀÌÁ¤±Ô |
Measurement of the electron energy distribution function and E-H mode transition in inductively coupled plasma with various gases |
100 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
±èÀ¯½Å |
In situ feedback control of ion flux by using a floating harmonic method in processing plasmas |
99 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
±èÁø¿ë |
Developement of an embedded two-dimensional probe for diagnostic of the spatial uniformity in plasmas |
98 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
¿À¼¼Áø |
RF-compensation method using Langmuir probe with auxiliary double probes |
97 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
¿À½ÂÁÖ |
Experimental measurement of the plasma parameters in Ar/SF6 inductively coupled plasma |
96 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
ÀÌ¿µÈ£ |
Investigation of the negative ion temperature and ion flux in low-pressure SF6 plasma using the AC-superposition method |
95 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
±è¿µµµ |
Analysis of current harmonics and application on the floating harmonics method with multiple voltane waveforms in a plasma |
94 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
±è¿µÃ¶ |
Experimental result of two dimensional spatial distribution of plasma parameters in CVD processing plasma |
93 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
ÀÌȿâ |
Effect of flow rate on the plasma parameters and electron energy distribution in plasma pocess reactor |
92 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
ÀÌȿâ |
E-H heating mode transition in high-pressure helium inductively coupled plasma |
91 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
ÀÌȿâ |
Strong modification of the electron energy distribution function in inductive discharge in SF6/Ar plasmas due to additional capacitive bias with small power input |
90 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
ÀÌ¿µ±¤ |
Measurement of metastable fractions and effect of stepwise ionizations in inductively coupled argon plasmas by optical emission spectroscopy |
89 |
2010.1 |
±¹¿Ü |
63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas |
Paris, France |
¹æÁø¿µ |
Synergistic effect of dual power on plasma density by shift of power absorption region in inductively coupled plasma |
88 |
2010.08 |
±¹¿Ü |
10th IEEE international Conference on Nanotechnology joint symposium with nano Korea 2010 |
Ilsan, Korea |
ÀÌȿâ |
Inductively couples RF heating of nano-particle for non-invasive and selective cancer cell destruction |
87 |
2010.07 |
±¹¿Ü |
The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials |
Jeju, Korea |
¿À¼¼Áø |
A two-dimensional interpolation algorithm for spatial density profile evaluation in RF plasmas |
86 |
2010.07 |
±¹¿Ü |
The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials |
Jeju, Korea |
ÀÌȿâ |
Plasma non-uniformity by RF bias power in inductively coupled plasma |
85 |
2010.07 |
±¹¿Ü |
The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials |
Jeju, Korea |
ÀÌȿâ |
Effects fo flow rate on the plasma parameters in plasma process reactor |
84 |
2010.07 |
±¹¿Ü |
The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials |
Jeju, Korea |
ÀÌ¿µ±¤ |
Metastable number density and stepwise ionization in a low-pressure inductively coupled argon plasma |
83 |
2010.07 |
±¹¿Ü |
The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials |
Jeju, Korea |
¹æÁø¿µ |
A self-consistent model of collisionless oscillating sheaths for ion energy simulation in various types of dual frequency capacitively coupled plasma |
82 |
2010.07 |
±¹¿Ü |
The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials |
Jeju, Korea |
Á¤Áø¿í |
New plasma diagnostic method using the harmonic analysis method and its application in processing plasmas |
81 |
2009.1 |
±¹¿Ü |
62th Gaseous Electronics Conference |
NY, U.S.A |
ÀÌȿâ |
Effects of RF-bias power on plasma parameters in a low gas pressure inductively coupled plasma |
80 |
2009.1 |
±¹¿Ü |
62th Gaseous Electronics Conference |
NY, U.S.A |
¹æÁø¿µ |
Additional Planar Antenna Effect on the Ferromagnetic Core Incudtively Coupled Plasma. |
79 |
2009.1 |
±¹¿Ü |
62th Gaseous Electronics Conference |
NY, U.S.A |
ÀÌ¿µ±¤ |
Investigation of electron energy distribution function in a weak magnetic field in solenoidal inductive discharge |
78 |
2009.1 |
±¹¿Ü |
62th Gaseous Electronics Conference |
NY, U.S.A |
ÀÌȿâ |
Experimental observation of the transition from nonlocal to local kineticsin inductively coupled plasma |
77 |
2009.1 |
±¹¿Ü |
62th Gaseous Electronics Conference |
NY, U.S.A |
±¸ÁÖȯ |
Measurement of total energy losses per electron-ion lost in various mixed gas inductively coupled plasmas |
76 |
2009.1 |
±¹¿Ü |
62th Gaseous Electronics Conference |
NY, U.S.A |
±è¾Æ¶÷ |
Floating Harmonics Method for non-Maxwellian plasmas |
75 |
2009.1 |
±¹¿Ü |
62th Gaseous Electronics Conference |
NY, U.S.A |
±è¿µÃ¶ |
Real time two-dimensional spatial distribution measurement method of electron temperature and plasma density |
74 |
2009.1 |
±¹¿Ü |
62th Gaseous Electronics Conference |
NY, U.S.A |
ÇÑÇü½Ä |
Measurement of Sheath Thickness using a Cylindrical Probe at a Floating Potential |
73 |
2009.1 |
±¹¿Ü |
62th Gaseous Electronics Conference |
NY, U.S.A |
±èÀ¯½Å |
Electron temperature measurement by using an optical emission spectroscopy in inductive Ar/O2 mixture discharge |
72 |
2009.1 |
±¹¿Ü |
2nd International Conference on Microelectronics and Technology |
Busan, Korea |
À强ȣ |
Langmuir probe perturbation in inductively coupled plasmas |
71 |
2009.1 |
±¹¿Ü |
2nd International Conference on Microelectronics and Technology |
Busan, Korea |
ÀÌȿâ |
Low energy electron heating and evolution of the electron energy distribution by diluted O2 in a planar inductive Ar/O2 mixture discharge |
70 |
2009.1 |
±¹¿Ü |
2nd International Conference on Microelectronics and Technology |
Busan, Korea |
±¸ÁÖȯ |
Measurement of total energy losses per electron-ion lost in various mixed gas inductively coupled plasmas |
69 |
2009.1 |
±¹¿Ü |
2nd International Conference on Microelectronics and Technology |
Busan, Korea |
±è¾Æ¶÷ |
Floating Harmonics Method for Non-Maxwellian plasmas |
68 |
2009.1 |
±¹¿Ü |
2nd International Conference on Microelectronics and Technology |
Busan, Korea |
ÇÑÇü½Ä |
Measurement of Sheath Thickness using a Cylindrical Probe at a Floating Potential |
67 |
2009.1 |
±¹¿Ü |
2nd International Conference on Microelectronics and Technology |
Busan, Korea |
±èÀ¯½Å |
Spectroscopic measurement of the electron temperature by using a simple collisional-radiative model in inductive Ar/O2 mixture discharge |
66 |
2008.1 |
±¹¿Ü |
AVS 55th international symposium & exhibitation |
Bosgton, U.S.A. |
À强ȣ |
Real time feedback control of plasma density by using a floating probe in inductively coupled plasmas |
65 |
2008.1 |
±¹¿Ü |
61th Gaseous Electronics Conference |
Dallas, U.S.A. |
±è°ÇÈ£ |
Experimetal investigation on Edge-to-Center density ratio in an inductively coupled plasma |
64 |
2008.1 |
±¹¿Ü |
61th Gaseous Electronics Conference |
Dallas, U.S.A. |
Ȳ±¤Å |
Real-time measurement of electron temperatures and ion densities using self-bias effect in argon inductively coupled plasma |
63 |
2008.1 |
±¹¿Ü |
61th Gaseous Electronics Conference |
Dallas, U.S.A. |
ÀÌȿâ |
Electron series resonance in an inductive ion etching reactor |
62 |
2008.1 |
±¹¿Ü |
61th Gaseous Electronics Conference |
Dallas, U.S.A. |
ÀÌȿâ |
New method to measure the electron temperature in Ar/He mixture capacitive discharge |
61 |
2008.1 |
±¹¿Ü |
61th Gaseous Electronics Conference |
Dallas, U.S.A. |
¹æÁø¿µ |
Experimental investigation on the Boltzmann relation for a bi-Maxwellian plasma |
60 |
2008.1 |
±¹¿Ü |
61th Gaseous Electronics Conference |
Dallas, U.S.A. |
ÀÌ¿µ±¤ |
Experimental Measurement of the total energy losses in a low pressure inductively coupled argon plasma |
59 |
2008.1 |
±¹¿Ü |
61th Gaseous Electronics Conference |
Dallas, U.S.A. |
ÃÖÀÍÁø |
Simple Analysis method of I-V Curve |
58 |
2008.1 |
±¹¿Ü |
61th Gaseous Electronics Conference |
Dallas, U.S.A. |
À强ȣ |
Real time feedback control of plasma density by using a floating probe in inductively coupled plasmas |
57 |
2008.8 |
±¹¿Ü |
1st International conference on microelectronics and plasma technology |
Á¦ÁÖ, Çѱ¹ |
À强ȣ |
Langmuir probe perturbation in inductively coupled plasmas |
56 |
2008.8 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦35ȸ ÇÏ°è Á¤±âÇмú´ëȸ |
Á¦ÁÖ, Çѱ¹ |
Ȳ±¤Å |
Àڱ⠹ÙÀ̾ Çö»óÀ» ÀÌ¿ëÇÑ ÀüÀڿµµ ¹× À̿¹еµ ÃøÁ¤¿¬±¸ |
55 |
2008.6 |
±¹³» |
Á¦ 2ȸ ¹ÝµµÃ¼ °øÁ¤ Áø´Ü ¿öÅ©¼¥ |
´ëÀü, Çѱ¹ |
ÀÌȿâ |
ÃàÀü °áÇÕ ÇöóÁ¿¡¼ ÀüÀڿµµ¸¦ ÃøÁ¤ÇÏ´Â »õ·Î¿î ¹æ¹ý |
54 |
2008.2 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦34ȸ µ¿°è Á¤±âÇмú´ëȸ |
¿ëÀÎ, Çѱ¹ |
Á¤Áø¿í |
½Ç½Ã°£ ÇöóÁ Áø´Ü ±â¼ú |
53 |
2008.1 |
±¹¿Ü |
SEMI Technology Symposium 2008 |
Seoul, KOREA |
Á¤Áø¿í |
New Plasma Processing Monitoring Technology |
52 |
2007.11 |
±¹¿Ü |
PAM User Conference in Korea HnaPAM 2007 |
Seoul, KOREA |
À强ȣ |
The study of the plasma characteristics According to Antennas position in inductively coupled plasma |
51 |
2007.11 |
±¹³» |
´ëÇÑÀü±âÇÐȸ Àü·Â±â¼úºÎ¹®È¸ Á¤±â ÃÑȸ ¹× Ãß°èÇмú´ëȸ |
Ⱦ¼º, Çѱ¹ |
±èÁø¼º |
À¯µµ°áÇÕ ÇöóÁ¿¡¼ µÎ ¾ÈÅ׳ªÀÇ ±¸Á¶¿¡ µû¸¥ Ư¼º ¿¬±¸ |
50 |
2007.1 |
±¹¿Ü |
60th Gaseous Electronics Conference |
Arlington, U.S.A. |
ÀÌ¿µ±¤ |
Measurement of electron temerature and argon metastable density by measuring optical emission in the inductively coupled plasma |
49 |
2007.1 |
±¹¿Ü |
60th Gaseous Electronics Conference |
Arlington, U.S.A. |
À强ȣ |
Langmuir probe perturbation in plasma distribution measurement in an inductively coupled plasma |
48 |
2007.1 |
±¹¿Ü |
60th Gaseous Electronics Conference |
Arlington, U.S.A. |
³²ÇüÈ£ |
Development of a novel Inductive coupled plasma source |
47 |
2007.1 |
±¹¿Ü |
60th Gaseous Electronics Conference |
Arlington, U.S.A. |
¹æÁø¿µ |
The effect of a planar antenna on a ferromagnetic core ICP |
46 |
2007.8 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦33ȸ Á¤±âÇмú´ëȸ |
Á¦ÁÖ, Çѱ¹ |
À±ÀÎâ |
ºñħÅõ½Ä ÀÌ¿Â ¼±¼Ó ÃøÁ¤ |
45 |
2007.6 |
±¹¿Ü |
International Conference On Plasma Science 2007 |
Albuquerque, U.S.A. |
À̹ÎÇü |
E to H transition mechanisms in inductively coupled plasma |
44 |
2007.6 |
±¹¿Ü |
International Conference On Plasma Science 2007 |
Albuquerque, U.S.A. |
Á¶¼º¿ø |
The digital matching network for a ferromagnetic ICP driven at 400 Khz |
43 |
2007.6 |
±¹³» |
Çѱ¹ ¹ÝµµÃ¼ ¹× µð½ºÇ÷¹ÀÌ Àåºñ ÇÐȸ 2007 Ãá°è Çмú´ëȸ |
¼¿ï, Çѱ¹ |
³²ÇüÈ£ |
°íÈ¿À² ȸÀü´ëĪ¼º Çâ»óÀ» À§ÇÑ À¯µµ°áÇÕ ÇöóÁ ¾ÈÅ׳ª |
42 |
2007.6 |
±¹³» |
Çѱ¹ ¹ÝµµÃ¼ ¹× µð½ºÇ÷¹ÀÌ Àåºñ ÇÐȸ 2007 Ãá°è Çмú´ëȸ |
¼¿ï, Çѱ¹ |
Á¶¼º¿ø |
400kHz Æä¶óÀÌÆ® À¯µµ°áÇÕ ÇöóÁ¸¦ À§ÇÑ ÀÓÇÇ´ø½º ¸ÅĪ ³×Æ®¿öÅ© |
41 |
2007.6 |
±¹³» |
Çѱ¹ ¹ÝµµÃ¼ ¹× µð½ºÇ÷¹ÀÌ Àåºñ ÇÐȸ 2007 Ãá°è Çмú´ëȸ |
¼¿ï, Çѱ¹ |
¹æÁø¿µ |
º¸Á¶ ¾ÈÅ׳ª¸¦ ÀÌ¿ëÇÑ Ãø¸éÇü Æä¶óÀÌÆ® ICPÀÇ ÇöóÁ º¯¼ö Á¦¾î |
40 |
2007.6 |
±¹³» |
Çѱ¹ ¹ÝµµÃ¼ ¹× µð½ºÇ÷¹ÀÌ Àåºñ ÇÐȸ 2007 Ãá°è Çмú´ëȸ |
¼¿ï, Çѱ¹ |
ÀÌ¿µ±¤ |
¾Æ¸£°ï 4p ÁØÀ§ ±¤¹æÃâ¹ýÀ» ÀÌ¿ëÇÑ ÇöóÁÀÇ ÀüÀڿµµ ¹× ÁؾÈÁ¤ ¹Ðµµ ÃøÁ¤ |
39 |
2007.6 |
±¹³» |
Çѱ¹ ¹ÝµµÃ¼ ¹× µð½ºÇ÷¹ÀÌ Àåºñ ÇÐȸ 2007 Ãá°è Çмú´ëȸ |
¼¿ï, Çѱ¹ |
ÀÌȿâ |
Experiment and characteristics for size of a planar rf-antenna in ICP(inductively coupled plasma) |
38 |
2006.1 |
±¹¿Ü |
59th Gaseous Electronics Conference |
Columbus, U.S.A. |
ÀÌ°æÈ¿ |
Electrical and plasma parameters of side type ferromagnetic ICP |
37 |
2006.1 |
±¹¿Ü |
59th Gaseous Electronics Conference |
Columbus, U.S.A. |
À̹ÎÇü |
On the multistep ionizations in argon inductively coupled plamas |
36 |
2006.1 |
±¹¿Ü |
59th Gaseous Electronics Conference |
Columbus, U.S.A. |
À̹ÎÇü |
On the E to H and H to E transition mechanisms in inductively coupled plasmas |
35 |
2006.1 |
±¹¿Ü |
59th Gaseous Electronics Conference |
Columbus, U.S.A. |
ÃÖÀÍÁø |
Measurement of ion density and electron temperature in Hanbit magnetic mirror device by using RF compensation triple probe |
34 |
2006.7 |
±¹¿Ü |
8th Asia-Pacific Conference on Plasma Science and Technology |
Queensland, AUSTRALIA |
ÀÌ°æÈ¿ |
Electrical and plasma parameters of ferromagnetic ICP as an alternative plasma processing tool |
33 |
2006.7 |
±¹¿Ü |
8th Asia-Pacific Conference on Plasma Science and Technology |
Queensland, AUSTRALIA |
À强ȣ |
The study of the multi-step ionizations in an argon inductively coupled plasma |
32 |
2006.6 |
±¹³» |
´ëÇÑÀü±âÇÐȸ Á¦ 37ȸ ÇÏ°èÇмú´ëȸ |
¼¿ï, Çѱ¹ |
ÃÖÀÍÁø |
RFº¸»ó »ïÁߎħÀ» ÀÌ¿ëÇÑ ÇѺûÀÚ±â°Å¿ïÇöóÁÀÇ Áø´Ü°ú Ư¼º¿¬±¸ |
31 |
2006.6 |
±¹¿Ü |
International Conference On Plasma Science 2006 |
Traverse, U.S.A. |
À̹ÎÇü |
New probe method applicable to plasma processing |
30 |
2006.5 |
±¹¿Ü |
11th Light Sources Workshop 2006 |
Shanghai, CHINA |
ÃÖÀÍÁø |
Investigation of Shielding Effects of Double Half Turn Antenna and deveopment of plasma diagnostic system applicable for light source |
29 |
2006.4 |
±¹³» |
Çѱ¹¹°¸®ÇÐȸ 2006³â º½ Çмú³í¹®¹ßǥȸ ¹× Á¦82ȸ Á¤±âÃÑȸ |
Æòâ, Çѱ¹ |
ÃÖÀÍÁø |
ºÎÀ¯Çü ´ÜÀÏŽħÀ» ÀÌ¿ëÇÑ ÇöóÁ Áø´Ü¹ý |
28 |
2006.4 |
±¹³» |
Çѱ¹¹°¸®ÇÐȸ 2006³â º½ Çмú³í¹®¹ßǥȸ ¹× Á¦82ȸ Á¤±âÃÑȸ |
Æòâ, Çѱ¹ |
ÃÖÀÍÁø |
RFTCÀÇ DHT ¾ÈÅ׳ªÀÇ ÄÚÆÿ¡ µû¸¥ ¹æÀüƯ¼º ÃøÁ¤ |
27 |
2005.1 |
±¹¿Ü |
58th Gases Electronics Conference |
San Jose, U.S.A. |
¿À¼¼Áø |
Measurements of the Sheath Capacitance using a Tunnel Diode Oscillator in Inductively Coupled Plasmas |
26 |
2005.1 |
±¹¿Ü |
58th Gases Electronics Conference |
San Jose, U.S.A. |
¿À¼¼Áø |
Noninvasive Measurement of Ion Energy Distributions in a Plasma Etching System |
25 |
2005.1 |
±¹¿Ü |
58th Gases Electronics Conference |
San Jose, U.S.A. |
ÃÖÀÍÁø |
Absolute electron density measurement using the cut-off method in magnetized plasmas |
24 |
2005.1 |
±¹¿Ü |
58th Gases Electronics Conference |
San Jose, U.S.A. |
À强ȣ |
On the floating type Langmuir probe using the harmonic technique in inductively coupled plasmas |
23 |
2005.1 |
±¹¿Ü |
58th Gases Electronics Conference |
San Jose, U.S.A. |
ÀÌ¿ø±â |
Electrical and Plasma Parameters of Distributed ICP Driven by Ferromagnetic Core Array |
22 |
2005.8 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦ 29ȸ Çмú¹ßǥȸ |
´ëÀü, Çѱ¹ |
ÃÖÀÍÁø |
ºÎÀ¯Çü ´ÜÀÏŽħÀ» ÀÌ¿ëÇÑ ÇöóÁ Áø´Ü¹ý |
21 |
2005.8 |
±¹³» |
Çѱ¹Áø°øÇÐȸ Á¦ 29ȸ Çмú¹ßǥȸ |
´ëÀü, Çѱ¹ |
À强ȣ |
Çϸð´ÐÅ×Å©´ÐÀ» ÀÌ¿ëÇÏ´Â Ç÷ÎÆÃÇü ·©¹Â¾î Žħ ÃøÁ¤¿¡ °üÇÑ ¿¬±¸ |
20 |
2005.7 |
±¹³» |
´ëÇÑÀü±âÇÐȸ 2005³âµµ Á¦ 36ȸ ÇÏ°èÇмú´ëȸ |
Æòâ, Çѱ¹ |
ÃÖÀÍÁø |
RF º¸»ó »ïÁߎħÀ» ÅëÇÑ RF ÇöóÁ Áø´Ü |
19 |
2005.7 |
±¹³» |
´ëÇÑÀü±âÇÐȸ 2005³âµµ Á¦ 36ȸ ÇÏ°èÇмú´ëȸ |
Æòâ, Çѱ¹ |
À强ȣ |
ÀüÀÚ ¿¡³ÊÁö ºÐÆ÷ ÇÔ¼ö ÃøÁ¤À» À§ÇÑ I V Ư¼º °î¼±ÀÇ È®·ü ¹ÐµµÇÔ¼ö¸¦ ÀÌ¿ëÇÑ smoothing method |
18 |
2005.6 |
±¹¿Ü |
International Conference On Plasma Science 2005 |
Monterey, U.S.A. |
ÀÌ¿ø±â |
Characterization of inductively coupled plasma driven with ferrite cores at 400kHz |
17 |
2005.6 |
±¹¿Ü |
International Conference On Plasma Science 2005 |
Monterey, U.S.A. |
±è¿ø±â |
Comparison of plasma density measurements using electrical probes and microwave probes in inductively coupled plasma |
16 |
2005.5 |
±¹³» |
´ëÇÑÀü±âÇÐȸ 2005 Ãá°è °íÀü¾Ð ¹× ¹æÀü ÀÀ¿ë±â¼ú¿¬±¸È¸ |
¼¿ï, Çѱ¹ |
¹Ú³²¼® |
Double Half Turn ¾ÈÅ׳ª¿¡ ÀÇÇØ ¹ß»ýµÈ ÇöóÁ Ư¼º¿¬±¸ |
15 |
2005.4 |
±¹³» |
Çѱ¹¹°¸®ÇÐȸ Á¦81ȸ Á¤±âÃÑȸ ¹× ¿¬±¸³í¹®¹ßǥȸ |
¼¿ï, Çѱ¹ |
À强ȣ |
EEDF ÃøÁ¤À» À§ÇÑ È®·ü ¹Ðµµ ÇÔ¼ö smoothing ¹æ¹ý |
14 |
2005.4 |
±¹³» |
Çѱ¹¹°¸®ÇÐȸ Á¦81ȸ Á¤±âÃÑȸ ¹× ¿¬±¸³í¹®¹ßǥȸ |
¼¿ï, Çѱ¹ |
±è¿ø±â |
¾Æ¸£°ï À¯µµ°áÇÕ ÇöóÁ¿¡¼ Á¤Àü Žħ°ú ¸¶ÀÌÅ©·ÎÆÄ Å½Ä§À» ÀÌ¿ëÇÑ ÇöóÁ ¹Ðµµ ÃøÁ¤ ºñ±³ ¿¬±¸ |
13 |
2005.4 |
±¹³» |
Çѱ¹¹°¸®ÇÐȸ Á¦81ȸ Á¤±âÃÑȸ ¹× ¿¬±¸³í¹®¹ßǥȸ |
¼¿ï, Çѱ¹ |
¿À¼¼Áø |
À¯µµ °áÇÕ ÇöóÁ¿¡¼ ºñ ħÅõÀû °£Á¢ÀûÀÎ ÀÌ¿Â ¿¡³ÊÁö ºÐÆ÷ ÃøÁ¤ |
12 |
2005.4 |
±¹³» |
Çѱ¹¹°¸®ÇÐȸ Á¦81ȸ Á¤±âÃÑȸ ¹× ¿¬±¸³í¹®¹ßǥȸ |
¼¿ï, Çѱ¹ |
À强ȣ |
À¯µµ °áÇÕ ÇöóÁ¿¡¼ÀÇ Pumping Æ÷Æ® À§Ä¡¿Í ÀÜ·ù½Ã°£ (residence time) È¿°ú °íÂû |
11 |
2004.9 |
±¹¿Ü |
57th Gases Electronics Conference |
Clare, IRELAND |
ÀÌ¿ø±â |
Experimental Investigation on the difference between the plasma potential and the floating potential of the cylindrical probe in an inductively coupled plasmas |
10 |
2004.6 |
±¹¿Ü |
7th Asia Pacific Conference on Plasma Science and Technology |
Fukuoka, JAPAN |
ÀÌ¿ø±â |
Experimental Investigation on the floating potential of cylindrical probe |
9 |
2004.1 |
±¹³» |
Çѱ¹¹°¸®ÇÐȸ 2004³âµµ ÀÓ½ÃÃÑȸ ¹× ¿¬±¸³í¹® ¹ßǥȸ |
Á¦ÁÖ, Çѱ¹ |
ÀÌ¿ø±â |
¶óµðÄ® ¼Ò½º¿ë ferrite ICPÀÇ Àü±âÀû Ư¼º ¿¬±¸ |
8 |
2004.1 |
±¹³» |
Çѱ¹¹°¸®ÇÐȸ 2004³âµµ ÀÓ½ÃÃÑȸ ¹× ¿¬±¸³í¹® ¹ßǥȸ |
Á¦ÁÖ, Çѱ¹ |
±è¿ø±â |
ÇöóÁ ¹Ðµµ°¡ ¿À¿°ÀÔÀÚ ¼ºÀå¿¡ ¹ÌÄ¡´Â ¿µÇâ ¿¬±¸ |
7 |
2004.1 |
±¹³» |
Çѱ¹¹°¸®ÇÐȸ 2004³âµµ ÀÓ½ÃÃÑȸ ¹× ¿¬±¸³í¹® ¹ßǥȸ |
Á¦ÁÖ, Çѱ¹ |
Á¤Áø¿í |
·®¹ÂÅÍ Å½Ä§ Áø´Ü°ú ÃÖ±Ù ¿¬±¸ °á°ú |
6 |
2003 |
±¹¿Ü |
International Conference On Plasma Science 2003 |
JeJu, KOREA |
Á¤Áø¿í |
On Electron Heating Mechanism in Low Pressure High Density Inductively Coupled Plasma |
5 |
2002 |
±¹¿Ü |
International Conference On Plasma Science 2002 |
CANADA |
Á¤Áø¿í |
Heating mode transition in E mode of ICP and evolution of the EEDF during the E-H Transition |
4 |
2001 |
±¹¿Ü |
54th Gases Electronics Conference |
U.S.A. |
Á¤Áø¿í |
Effect of pressure and gas species on Electron Cyclotron Resonance in a weakly magnetized Inductively Coupled Plasma |
3 |
2000 |
±¹¿Ü |
53th Gases Electronics Conference |
U.S.A. |
Á¤Áø¿í |
The electron cyclotron resonance in RF inductive discharge |
2 |
2000 |
±¹¿Ü |
17th Symposium on Plasama Processing |
JAPAN |
Á¤Áø¿í |
Nonlocal electron kinetics in a planar inductive discharge |
1 |
1999 |
±¹¿Ü |
52th Gases Electronics Conference |
U.S.A. |
Á¤Áø¿í |
The effect of electron bounce resonance on EEDF in a solenoidal ICP |