¡æ Last Updated: Wednesday, 29 June 2011, 22:00 GMT

No.

Date

ºÐ·ù

ÇмúȸÀǸí (Conference)

Àå¼Ò

¹ßÇ¥ÀÚ

¹ßÇ¥ÁÖÁ¦(Title)

195

2013.11

±¹¿Ü

International Conference on Surface Engineering 2013

ºÎ»ê

Á¶¼º¿ø

Thermo-Compression Flipchip Interconnection using Plasma Enhanced Copper Organic Solderability Preservative Etched Substrate

194

2013.11

±¹¿Ü

International Conference on Surface Engineering 2013

ºÎ»ê

±èµ¿È¯

A comparative study on the floating harmonic method using dual frequency in an inductive discharge

193

2013.11

±¹¿Ü

9th Asia Plasma and Fusion Association Conference

°æÁÖ

±èµ¿È¯

A plasma diagnostic technique using intermodulation frequencies in a floating Langmuir probe

192

2013.11

±¹¿Ü

9th Asia Plasma and Fusion Association Conference

°æÁÖ

¹ÚÀϼ­

Time-resolved measurements of far-SOL plasma arameters in H-mode discharges during ELM crash using sideband technique

191

2013.09

±¹¿Ü

66th Gaseous Electronics Conference

Princeton

ÀÌȿâ

Polymerizable Supramolecular Sensor for Plasma Diagnostics on Wafer Level

190

2013.09

±¹¿Ü

66th Gaseous Electronics Conference

Princeton

ÀÌÀç¿ø

A study of increasing radical density and etch rate using remote plasma generator system

189

2013.09

±¹¿Ü

66th Gaseous Electronics Conference

Princeton

°­ÇöÁÖ

Measurement of electron energy distribution functions in a low pressure and low density inductively coupled plasma

188

2013.09

±¹¿Ü

66th Gaseous Electronics Conference

Princeton

ÀÌȿâ

Evolution of Electron Temperature and Coupling between Electron Temperature and Power Absorption

187

2013.09

±¹¿Ü

66th Gaseous Electronics Conference

Princeton

ÀÌȿâ

E to H Heating Mode Transition and Hysteresis in Inductively Coupled Plasma

186

2013.09

±¹¿Ü

66th Gaseous Electronics Conference

Princeton

ÀÌȿâ

Effect of Radio Frequency Bias on the Plasma Density and Electron Heating in Inductive Discharge

185

2013.09

±¹¿Ü

66th Gaseous Electronics Conference

Princeton

±èÀ¯½Å

A new method for measuring pulsed plasma with hightime resolution based on floating harmonic method

184

2013.09

±¹¿Ü

66th Gaseous Electronics Conference

Princeton

±è¿µÃ¶

Non-invasive electrical method for measurement of electron temperature in an atmospheric pressure plasma jet source

183

2013.09

±¹¿Ü

66th Gaseous Electronics Conference

Princeton

¿À½ÂÁÖ

A study on measurement of the surface charge accumulation using anodic aluminum oxide template

182

2013.09

±¹¿Ü

66th Gaseous Electronics Conference

Princeton

±èÁø¿ë

Real time monitoring of dielectric-film thickness on the surface of chamber wall for plasma processing

181

2013.08

±¹¿Ü

9th Asian-European International Conference On Plasma Surface Engineering

Á¦ÁÖµµ

±è°æÇö

E-H transition measurement in cylindrical ICP with external DC magnetic field

180

2013.08

±¹¿Ü

9th Asian-European International Conference On Plasma Surface Engineering

Á¦ÁÖµµ

¿À½ÂÁÖ

Correlation between electrical characteristics of RF bias and plasma parameters in biased inductively coupled

179

2013.08

±¹¿Ü

9th Asian-European International Conference On Plasma Surface Engineering

Á¦ÁÖµµ

ÀÌȿâ

Photochromic Polymer Sensor for Plasma Diagnostic

178

2013.08

±¹¿Ü

9th Asian-European International Conference On Plasma Surface Engineering

Á¦ÁÖµµ

ÀÌȿâ

Effect of Antenna Size on the E to H Heating Mode Transition in Inductively Coupled Plasma

177

2013.08

±¹¿Ü

9th Asian-European International Conference On Plasma Surface Engineering

Á¦ÁÖµµ

ÀÌȿâ

Effect of Flow Rate related to Pressure Gradient in Plasma Process Reactor

176

2013.08

±¹¿Ü

9th Asian-European International Conference On Plasma Surface Engineering

Á¦ÁÖµµ

¹®ÁØÇö

Experimental verification of the characteristic of plasmas on the effect of antenna turns in inductively coupled plasmas

175

2013.08

±¹¿Ü

9th Asian-European International Conference On Plasma Surface Engineering

Á¦ÁÖµµ

Á¶¼º¿ø

Effect of Flow Rate on the Plasma Parameters in a Dual Type Inductively Coupled Plasma

174

2013.06

±¹¿Ü

2013 International Forum on Functional Materials

Á¦ÁÖµµ

±è¿µÃ¶

Gas temperature measurement in atmospheric pressure plasma sources

173

2013.06

±¹¿Ü

IEEE Pulsed power & plasma science PPPS 2013

San Francisco

¹ÚÀϼ­

OBSERVATION OF THE ELM ACTIVITY THE FAR SOL REGION OF KSTAR TOKAMAK PLASMA USING PROBE DIAGNOSTICS

172

2013.06

±¹¿Ü

IEEE Pulsed power & plasma science PPPS 2013

San Francisco

±èµ¿È¯

ADVANCED ELECTROSTATIC PLASMA DIAGNOSTIC USUNG SIDEBAND FLOATING HARMONIC METHOD

171

2013.02

±¹³»

Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ

Æòâ

°­ÇöÁÖ

Àú¹Ðµµ À¯µµ °áÇÕ ÇöóÁ¿¡¼­ ÀüÀÚ ¿¡³ÊÁö ºÐÆ÷ ÃøÁ¤

170

2013.02

±¹³»

Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ

Æòâ

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ÀÌÁß ÁÖÆļöÀÇ À§»óº¯È­¿¡ µû¸¥ ÀÚ±â¹ÙÀ̾¸¦ ÀÌ¿ëÇÑ ÇöóÁ º¯¼ö ÃøÁ¤

169

2013.02

±¹³»

Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ

Æòâ

±èÁø¿ë

ÆòÆÇÇü ŽħÀ» ÀÌ¿ëÇÑ °øÁ¤ è¹ö º® ÁõÂø ¸· µÎ²² ÃøÁ¤

168

2013.02

±¹³»

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Æòâ

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´Ù¾çÇÑ ºÎÀ¯ °íÁ¶È­ÆÄ Å½Ä§¹ýÀÇ ºñ±³¿¬±¸

167

2013.02

±¹³»

Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ

Æòâ

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ÆÞ½ºÇöóÁ¿¡¼­ ºÎÀ¯°íÁ¶È­¸¦ ÀÌ¿ëÇÏ¿© °í½Ã°£ºÐÇØ´ÉÀ¸·Î ÇöóÁ Áø´Ü¹æ¹ý

166

2013.02

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Æòâ

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À¯µµ °áÇÕ »ê¼Ò ÇöóÁ¿¡¼­ °íÁ¶È­ÆÄ ºÐ¼®¹ýÀ» ÀÌ¿ëÇÑ À½ÀÌ¿Â °ø°£ ºÐÆ÷ ÃøÁ¤

165

2013.02

±¹³»

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Æòâ

±è¿µÃ¶

ÇöóÁ¿¡¼­ º¼Ã÷¸¸ °ü°è½ÄÀÇ ½ÇÇèÀû °ËÁõ

164

2013.02

±¹³»

Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ

Æòâ

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±ØÆÇ Àü±ØÀÌ Àΰ¡µÈ À¯µµ °áÇÕ ÇöóÁ¿¡¼­ À¯µµ °áÇÕ Àü±âÀå°ú ¿ë·®¼º °áÇÕ Àü±âÀå¿¡ °üÇÑ ÀüÀÚ °¡¿­ ¿¬±¸

163

2013.02

±¹³»

Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ

Æòâ

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SMP(Symmetric Multi-Power) ¾ÈÅ׳ª¿¡ ÀÇÇÑ ÇöóÁ ¹Ðµµ ºÐÆ÷ °³¼±¿¡ ´ëÇÑ ¿¬±¸

162

2013.02

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Á¦ 44ȸ Çѱ¹Áø°øÇÐȸ

Æòâ

±è¿µµµ

À¯µµ°áÇÕ ÇöóÁ¿¡¼­ ÀÓÇÇ´ø½º Á¤ÇÕÁ¶°ÇÀ» ÀÌ¿ëÇÑ ºñħÅõ½Ä Áø´Ü¹æ¹ý

161

2013.02

±¹³»

2013 KSTAR Conference

Ãæ³²ºÎ¿©

¹ÚÀϼ­

Investigation on the far-SOL particle transport after ELM crash using probe diagnostics

160

2012.1

±¹¿Ü

65th Gaseous Electronics Conference

U.S.A

ȲÇýÁÖ

Spatial distributions measurement of negative ion density by using floating probe in the oxygen inductive coupled plasmas

159

2012.1

±¹¿Ü

65th Gaseous Electronics Conference

U.S.A

°­ÇöÁÖ

Transmission characteristics of the wave cut-off probe with parallel plates

158

2012.1

±¹¿Ü

65th Gaseous Electronics Conference

U.S.A

ÀÌÈñÁø

Control of plasma density profile via wireless power transfer in an inductively coupled discharge

157

2012.1

±¹¿Ü

65th Gaseous Electronics Conference

U.S.A

ÇÑ´ö¼±

Experimental measurement of plasma parameters and electron energy distribution in ferrite-core side type Ar/He inductively coupled plasma

156

2012.1

±¹¿Ü

65th Gaseous Electronics Conference

U.S.A

ÀÌȿâ

Spatial plasma potentials and electron energy distributions in inductively and capacitively coupled plasmas under a weakly collisional and nonlocal electron kinetic regime

155

2012.08

±¹³»

The 2nd International Symposium on Plasma Biosciences

±¤¿î´ë

±è¿µÃ¶

GAS TEMPERATURE MEASUREMENT USING OPTICAL EMISSION SPECTROSCOPY FOR ATMOSPHERIC PLASMA DIAGNOSTICS

154

2012.08

±¹³»

The 2nd International Symposium on Plasma Biosciences

±¤¿î´ë

±è¿µÃ¶

ELECTRON TEMPERATURE MEASUREMENT IN ATMOSPHERE PLASMA USING FLOATING HARMONIC DIAGNOSTIC METHOD

153

2012.07

±¹¿Ü

International Conference on Plasma Science

¿¡µò¹ö·¯

±èÀ¯½Å

Plasma diagnostics with high-time resolution based on floating harmonic method in pulsed plasma

152

2012.07

±¹¿Ü

International Conference on Plasma Science

¿¡µò¹ö·¯

±èµ¿È¯

Probe diagnostics in the edge of KSTAR tokamak plasma using fast floating harmonic method

151

2012.07

±¹³»

"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)"

Á¦ÁÖµµ

±èµ¿È¯

A study on the scale up of plasma processing chamber by using global model

150

2012.07

±¹³»

"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)"

Á¦ÁÖµµ

±è¿µµµ

A study on the correlations between external discharge parameters and plasma characteristics in an inductively coupled plasma using transformer circuit model

149

2012.07

±¹³»

"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)"

Á¦ÁÖµµ

ȲÇýÁÖ

A new method for measuring transferred power to plasma in inductive discharge

148

2012.07

±¹³»

"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)"

Á¦ÁÖµµ

±è¿µµµ

Spatial characteristics of plasma parameters in a weak dc magnetic field in solenoidal inductive discharge

147

2012.07

±¹³»

"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)"

Á¦ÁÖµµ

ÀÌÀç¿ø

Characteristics of electron cyclotron resonance in magnetized solenoid type inductively coupled plasmas

146

2012.07

±¹³»

"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)"

Á¦ÁÖµµ

ÀÌȿâ

Collisionless electron heating and control of electron energy distribution by adding pulsed inductive fields in capacitively coupled plasma

145

2012.07

±¹³»

"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)"

Á¦ÁÖµµ

À̼öÁø

Mode transition of power dissipation in and plasma parameters in an asymmetric capacitive discharge

144

2012.07

±¹³»

"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)"

Á¦ÁÖµµ

¿À¼¼Áø

Interpolation for two-dimensional spatial distribution estimation of plasma densities in a cylindrical RF discharge reactor

143

2012.07

±¹³»

"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)"

Á¦ÁÖµµ

Á¶¼º¿ø

Effect of plasma density distribution for polymer surface etching at low frequency (50 kHz) O2+CF4 capacitive discharge

142

2012.07

±¹³»

"4th ICMAP(The 4th International Conference on Microelectronics and Plasma Technology)"

Á¦ÁÖµµ

Á¶¼º¿ø

The Digital Matching System with Transformer type for 400 kHz Ferrite inductively Coupled Plasma

141

2012.05

±¹¿Ü

IWPT 2012 (Innovative Wireless Power Transmission: Technologies, Systems, and Applications)

±³Åä

ÀÌÈñÁø

Electromagnetically Coupled Resonators Using Toroidal Ferrite Core for Wireless Power Transfer

140

2012.02

±¹³»

KSTAR Conference

¹«ÁÖ

±èµ¿È¯

Plasma diagnostic in the SOL region of KSTAR using floating harmonic method

139

2012.02

±¹³»

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Æòâ

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ÀÌÁßÁÖÆļö ºÎÀ¯Çü Žħ¹ýÀ» ÀÌ¿ëÇÑ ÇöóÁ Áø´Ü ¿¬±¸

138

2012.02

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Æòâ

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Àü·Â °ø±Þ ¹æ½Ä¿¡ µû¸¥ À¯µµ °áÇÕ ÇöóÁ Ư¼º º¯È­ ¿¬±¸

137

2012.02

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Æòâ

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ÁؾÈÁ¤ ÁØÀ§¸¦ Æ÷ÇÔÇÑ Çï·ý ÇöóÁÀÇ ¿µÂ÷¿ø ¸ð»ç ¿¬±¸

136

2012.02

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À¯µµ °áÇÕ ÇöóÁ¿¡¼­ ½Ã½ºÅÛÀÇ ¼Òºñ Àü·Â ÃøÁ¤ ¹æ¹ý¿¡ ´ëÇÑ ¿¬±¸

135

2012.02

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Æòâ

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0Â÷¿ø ¸ðµ¨À» ÀÌ¿ëÇÑ °øÁ¤Àåºñ Scale Up ¿¬±¸

134

2012.02

±¹³»

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Æòâ

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Uniformity Control by Using Helium Gas in the Large Area Ferrite Side Type inductively Coupled Plasma

133

2012.02

±¹³»

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Æòâ

ÀÌÀç¿ø

ÀÚ±âÀåÀ» Àΰ¡ÇÑ ¼Ö·¹³ëÀ̵åÇü À¯µµ °áÇÕ ÇöóÁ ÀåÄ¡¿¡¼­ÀÇ ÀüÀÚ ½ÎÀÌŬ·ÎÆ®·Ð °ø¸í ÇöóÁ Ư¼º

132

2012.02

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Æòâ

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°íÁÖÆļö ÃàÀü °áÇÕ ÇöóÁ¿¡¼­ ÇöóÁ º¯¼öµéÀÌ Àü±âÀå ºÐÆ÷¿¡ ¹ÌÄ¡´Â ¿µÇâ¿¡ ´ëÇÑ ¿¬±¸

131

2012.02

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À¯µµ°áÇÕÇöóÁ¿¡¼­ ÇöóÁ º¯¼ö¿Í ÀüÀÚ ¿¡³ÊÁö ºÐÆ÷¿¡ ´ëÇÑ RF biasÀÇ ¿µÇâ

130

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

ÀÌȿâ

Role of additional inductive power on the electron energy distribution in Ar/O2 capacitively coupled plasma

129

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

°­ÇöÁÖ

The effect of collision frequency on the electric field distribution in a high frequency capacitive discharge

128

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

±èÇöÁØ

Experimental observation of balanced power effect of antenna on plasma parameters in inductively coupled plasma

127

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

ÀÌÀç¿ø

Measurement of power transfer efficiency and ion density in various radio-frequency inductively couipled plasma

126

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

¿À½ÂÁÖ

A study on plasma parameters in various mixed Ar/SF6 inductively coupled plasma

125

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

±è¿µµµ

A simple analysis of inductively coupled discharge using transformer circuit model

124

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

±èÁø¿ë

Measurement of electron energy distribution in magnetized solenoidal inductively coupled plasma

123

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

À̼öÁø

Electrical characteristics and mode transition of power dissipation in an asymmetric capacitively coupled plasma

122

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

ÀÌ¿µ±¤

Experimental investigation of argon metastable density and electron temperature in low-pressure plasma by line ratio OES technique

121

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

¿À¼¼Áø

Double probe using an ac bias signal for plasma parameters measurement

120

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

À¯°æ

A study on floating method in non-Maxwellian plasmas

119

2011.11

±¹¿Ü

64th Gaseous Electronics Conference

Salt Lake city, USA

±è¿µÃ¶

Measurement of the plasma density and electron temperature uniformities in inductively coupled plasmas using 2D real time measurement method

118

2011.08

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±¤¹æ»ç ¼¼±âºñ¸¦ ÀÌ¿ëÇÑ °øÁ¤ ÇöóÁÀÇ º¯¼ö Áø´Ü

117

2011.08

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Ãæµ¹ÁÖÆļö°¡ °íÁÖÆÄ ¼öÆòÇàÆòÆÇ ÇöóÁÀÇ Àü±âÀå ±ÕÀϵµ¿¡ ¹ÌÄ¡´Â ¿µÇâ ¿¬±¸

116

2011.07

±¹¿Ü

The 3rd International Conference on Microelectronics and Plasma Technology

Dalina, China

¿À¼¼Áø

Real-time Dose Monitoring System by Sensing Implanter Current and Biased Pulse Voltage in Plasma Source Ion Implantation

115

2011.07

±¹¿Ü

The 3rd International Conference on Microelectronics and Plasma Technology

Dalina, China

ÀÌȿâ

Studies on the spatial and Temporal Behaviors of the Electron Energy Distribution and Plasma Parameters in inductively and/or capacitively coupled plasma

114

2011.07

±¹¿Ü

The 3rd International Conference on Microelectronics and Plasma Technology

Dalina, China

¿À½ÂÁÖ

Numerical Calculation of Spatial Electric Field by RF Bias in High Density Plasmas

113

2011.07

±¹¿Ü

The 3rd International Conference on Microelectronics and Plasma Technology

Dalina, China

±è¿µÃ¶

Study on plasma uniformity by using 2D real time measurement method in Ar/He inductively coupled plasmas

112

2011.07

±¹¿Ü

The 3rd International Conference on Microelectronics and Plasma Technology

Dalina, China

±è¿µµµ

Spatial evolutions of the electron energy distributions in a weakly magnetized solenoidal-type inductively coupled plasma

111

2011.02

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±¹°¡ÇÙÀ¶ÇÕ¿¬±¸¼Ò(NFRI)

¹«ÁÖ, Çѱ¹

¹æÁø¿µ

Real-time observation of capacitance of surface material during plasma operation

110

2011.02

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Æòâ, Çѱ¹

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°øÁ¤ ÇöóÁ Áø´ÜÀ» À§ÇÑ °íÁ¶È­ÆÄ ºÐ¼®¹ý ¹× Áø´Ü °á°ú

109

2011.02

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Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ

Æòâ, Çѱ¹

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108

2011.02

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Æòâ, Çѱ¹

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¹ÝµµÃ¼ ÇöóÁ ÀÌ¿Â ÁÖÀÔ°øÁ¤¿¡¼­ Á÷·ù ÆÞ½º Àü¾Ð, Àü·ù °¨Áö¸¦ ÅëÇÑ ½Ç½Ã°£ µµÁî ¸ð´ÏÅ͸µ ½Ã½ºÅÛ °³¹ß

107

2011.02

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Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ

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À¯µµ °áÇÕ ÇöóÁ¿¡¼­ ¹ë·±½º ÆÄ¿ö¿¡ ÀÇÇÑ ÀüÀڹеµÀÇ Áõ°¡ È¿°ú

106

2011.02

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Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ

Æòâ, Çѱ¹

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105

2011.02

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Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ

Æòâ, Çѱ¹

ÀÌÀç¿ø

´Ù¾çÇÑ °øÁ¤ ÁÖÆļö¿¡¼­ À¯µµ °áÇÕ ÇöóÁÀÇ ÇöóÁ ¹Ðµµ¿Í ¿¡³ÊÁö Àü´Þ È¿À² ÃøÁ¤

104

2011.02

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Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ

Æòâ, Çѱ¹

ÃÖÀÍÁø

ÃàÀü±âÀÇ °úµµ Çö»óÀ» ÀÌ¿ëÇÑ ºÎÀ¯Çü ´ÜÀÏŽħ ÇöóÁ Áø´Ü¹ý ¿¬±¸

103

2011.02

±¹³»

Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ

Æòâ, Çѱ¹

ÀÌ¿µ±¤

The influence of radiation trapping on the metastable population density and applications to low-pressure plasma

102

2011.02

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Çѱ¹Áø°øÇÐȸ Á¦40ȸ µ¿°è Á¤±âÇмú´ëȸ

Æòâ, Çѱ¹

À¯°æ

Ç¥¸é ºÐ¼®¹ýÀ» ÀÌ¿ëÇÑ ÇöóÁ¿¡¼­ÀÇ º¸·Ð¹Ú¸· µÎ²² ÃøÁ¤

101

2010.1

±¹¿Ü

63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

ÀÌÁ¤±Ô

Measurement of the electron energy distribution function and E-H mode transition in inductively coupled plasma with various gases

100

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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In situ feedback control of ion flux by using a floating harmonic method in processing plasmas

99

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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Developement of an embedded two-dimensional probe for diagnostic of the spatial uniformity in plasmas

98

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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RF-compensation method using Langmuir probe with auxiliary double probes

97

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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Experimental measurement of the plasma parameters in Ar/SF6 inductively coupled plasma

96

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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Investigation of the negative ion temperature and ion flux in low-pressure SF6 plasma using the AC-superposition method

95

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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Analysis of current harmonics and application on the floating harmonics method with multiple voltane waveforms in a plasma

94

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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Experimental result of two dimensional spatial distribution of plasma parameters in CVD processing plasma

93

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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Effect of flow rate on the plasma parameters and electron energy distribution in plasma pocess reactor

92

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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E-H heating mode transition in high-pressure helium inductively coupled plasma

91

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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Strong modification of the electron energy distribution function in inductive discharge in SF6/Ar plasmas due to additional capacitive bias with small power input

90

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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Measurement of metastable fractions and effect of stepwise ionizations in inductively coupled argon plasmas by optical emission spectroscopy

89

2010.1

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63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas

Paris, France

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Synergistic effect of dual power on plasma density by shift of power absorption region in inductively coupled plasma

88

2010.08

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10th IEEE international Conference on Nanotechnology joint symposium with nano Korea 2010

Ilsan, Korea

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Inductively couples RF heating of nano-particle for non-invasive and selective cancer cell destruction

87

2010.07

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The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials

Jeju, Korea

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A two-dimensional interpolation algorithm for spatial density profile evaluation in RF plasmas

86

2010.07

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The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials

Jeju, Korea

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Plasma non-uniformity by RF bias power in inductively coupled plasma

85

2010.07

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The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials

Jeju, Korea

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Effects fo flow rate on the plasma parameters in plasma process reactor

84

2010.07

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The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials

Jeju, Korea

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Metastable number density and stepwise ionization in a low-pressure inductively coupled argon plasma

83

2010.07

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The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials

Jeju, Korea

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A self-consistent model of collisionless oscillating sheaths for ion energy simulation in various types of dual frequency capacitively coupled plasma

82

2010.07

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The 10th Asia Pacific Conference on Plasma Science and Technology and the 23rd Symposium on Plasma Science for Materials

Jeju, Korea

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New plasma diagnostic method using the harmonic analysis method and its application in processing plasmas

81

2009.1

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62th Gaseous Electronics Conference

NY, U.S.A

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Effects of RF-bias power on plasma parameters in a low gas pressure inductively coupled plasma

80

2009.1

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62th Gaseous Electronics Conference

NY, U.S.A

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Additional Planar Antenna Effect on the Ferromagnetic Core Incudtively Coupled Plasma.

79

2009.1

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62th Gaseous Electronics Conference

NY, U.S.A

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Investigation of electron energy distribution function in a weak magnetic field in solenoidal inductive discharge

78

2009.1

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62th Gaseous Electronics Conference

NY, U.S.A

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Experimental observation of the transition from nonlocal to local kineticsin inductively coupled plasma

77

2009.1

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62th Gaseous Electronics Conference

NY, U.S.A

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Measurement of total energy losses per electron-ion lost in various mixed gas inductively coupled plasmas

76

2009.1

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62th Gaseous Electronics Conference

NY, U.S.A

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Floating Harmonics Method  for non-Maxwellian plasmas

75

2009.1

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62th Gaseous Electronics Conference

NY, U.S.A

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Real time two-dimensional spatial distribution measurement method of electron temperature and plasma density

74

2009.1

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62th Gaseous Electronics Conference

NY, U.S.A

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Measurement of Sheath Thickness using a Cylindrical Probe at a Floating Potential

73

2009.1

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62th Gaseous Electronics Conference

NY, U.S.A

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Electron temperature measurement  by using an optical emission spectroscopy  in inductive Ar/O2 mixture discharge

72

2009.1

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2nd International Conference on Microelectronics and Technology

Busan, Korea

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Langmuir probe perturbation  in inductively coupled plasmas

71

2009.1

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2nd International Conference on Microelectronics and Technology

Busan, Korea

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Low energy electron heating and evolution of the electron energy distribution by diluted O2 in a planar inductive Ar/O2 mixture discharge

70

2009.1

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2nd International Conference on Microelectronics and Technology

Busan, Korea

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Measurement of total energy losses per electron-ion lost in various mixed gas inductively coupled plasmas

69

2009.1

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2nd International Conference on Microelectronics and Technology

Busan, Korea

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Floating Harmonics Method for Non-Maxwellian plasmas

68

2009.1

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2nd International Conference on Microelectronics and Technology

Busan, Korea

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Measurement of Sheath Thickness using a Cylindrical Probe at a Floating Potential

67

2009.1

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2nd International Conference on Microelectronics and Technology

Busan, Korea

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Spectroscopic measurement of the electron temperature by using a simple collisional-radiative model in inductive Ar/O2 mixture discharge

66

2008.1

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AVS 55th international symposium & exhibitation

Bosgton, U.S.A.

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Real time feedback control of  plasma  density by using a floating probe  in inductively coupled plasmas

65

2008.1

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61th Gaseous Electronics Conference

Dallas, U.S.A.

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Experimetal investigation on Edge-to-Center density ratio in an inductively coupled plasma

64

2008.1

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61th Gaseous Electronics Conference

Dallas, U.S.A.

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Real-time measurement of electron temperatures and ion densities using self-bias effect in argon inductively coupled plasma

63

2008.1

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61th Gaseous Electronics Conference

Dallas, U.S.A.

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Electron series resonance in an inductive ion etching reactor

62

2008.1

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61th Gaseous Electronics Conference

Dallas, U.S.A.

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New method to measure the electron temperature in Ar/He mixture capacitive discharge

61

2008.1

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61th Gaseous Electronics Conference

Dallas, U.S.A.

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Experimental investigation on the Boltzmann relation for a bi-Maxwellian plasma

60

2008.1

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61th Gaseous Electronics Conference

Dallas, U.S.A.

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Experimental Measurement of the total energy losses in a low pressure inductively coupled argon plasma

59

2008.1

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61th Gaseous Electronics Conference

Dallas, U.S.A.

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Simple Analysis method of I-V Curve

58

2008.1

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61th Gaseous Electronics Conference

Dallas, U.S.A.

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Real time feedback control of  plasma  density by using a floating probe in inductively coupled plasmas

57

2008.8

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1st International conference on microelectronics and plasma technology

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Langmuir probe perturbation in inductively coupled plasmas

56

2008.8

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2008.1

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SEMI Technology Symposium 2008

Seoul, KOREA

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New Plasma Processing Monitoring Technology

52

2007.11

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PAM User Conference in Korea HnaPAM 2007

Seoul, KOREA

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The study of the plasma characteristics According to Antennas position in inductively coupled plasma

51

2007.11

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2007.1

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60th Gaseous Electronics Conference

Arlington, U.S.A.

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Measurement of electron temerature and argon metastable density by measuring optical emission in the inductively coupled plasma

49

2007.1

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60th Gaseous Electronics Conference

Arlington, U.S.A.

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Langmuir probe perturbation in plasma distribution measurement in an inductively coupled plasma

48

2007.1

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60th Gaseous Electronics Conference

Arlington, U.S.A.

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Development of a novel Inductive coupled plasma source

47

2007.1

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60th Gaseous Electronics Conference

Arlington, U.S.A.

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The effect of a planar antenna on a ferromagnetic core ICP

46

2007.8

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2007.6

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International Conference On Plasma Science 2007

Albuquerque, U.S.A.

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E to H transition mechanisms in inductively coupled plasma

44

2007.6

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International Conference On Plasma Science 2007

Albuquerque, U.S.A.

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The digital matching network for a ferromagnetic ICP driven at 400 Khz

43

2007.6

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2007.6

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38

2006.1

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59th Gaseous Electronics Conference

Columbus, U.S.A.

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Electrical and plasma parameters of side type ferromagnetic ICP

37

2006.1

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59th Gaseous Electronics Conference

Columbus, U.S.A.

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On the multistep ionizations in argon inductively coupled plamas

36

2006.1

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59th Gaseous Electronics Conference

Columbus, U.S.A.

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On the E to H and H to E transition mechanisms in inductively coupled plasmas

35

2006.1

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59th Gaseous Electronics Conference

Columbus, U.S.A.

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Measurement of ion density and electron temperature in Hanbit magnetic mirror device by using RF compensation triple probe

34

2006.7

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8th Asia-Pacific Conference on Plasma Science and Technology

Queensland, AUSTRALIA

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Electrical and plasma parameters of ferromagnetic ICP as an alternative plasma processing tool

33

2006.7

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8th Asia-Pacific Conference on Plasma Science and Technology

Queensland, AUSTRALIA

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The study of the multi-step ionizations in an argon inductively coupled plasma

32

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31

2006.6

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International Conference On Plasma Science 2006

Traverse, U.S.A.

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New probe method applicable to plasma processing

30

2006.5

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11th Light Sources Workshop 2006

Shanghai, CHINA

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Investigation of Shielding Effects of Double Half Turn Antenna and deveopment of plasma diagnostic system applicable for light source

29

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27

2005.1

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58th Gases Electronics Conference

San Jose, U.S.A.

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Measurements of the Sheath Capacitance using a Tunnel Diode Oscillator in Inductively Coupled Plasmas

26

2005.1

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58th Gases Electronics Conference

San Jose, U.S.A.

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Noninvasive Measurement of Ion Energy Distributions in a Plasma Etching System

25

2005.1

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58th Gases Electronics Conference

San Jose, U.S.A.

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Absolute electron density measurement using the cut-off method in magnetized plasmas

24

2005.1

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58th Gases Electronics Conference

San Jose, U.S.A.

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On the floating type Langmuir probe using the harmonic technique in inductively coupled plasmas

23

2005.1

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58th Gases Electronics Conference

San Jose, U.S.A.

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Electrical and Plasma Parameters of Distributed ICP Driven by Ferromagnetic Core Array

22

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21

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18

2005.6

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International Conference On Plasma Science 2005

Monterey, U.S.A.

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Characterization of inductively coupled plasma driven with ferrite cores at 400kHz

17

2005.6

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International Conference On Plasma Science 2005

Monterey, U.S.A.

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Comparison of plasma density measurements using electrical probes and microwave probes in inductively coupled plasma

16

2005.5

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15

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14

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13

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11

2004.9

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57th Gases Electronics Conference

Clare, IRELAND

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Experimental Investigation on the difference between the plasma potential and the floating potential of the cylindrical probe in an inductively coupled plasmas

10

2004.6

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7th Asia Pacific Conference on Plasma Science and Technology

Fukuoka, JAPAN

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Experimental Investigation on the floating potential of cylindrical probe

9

2004.1

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8

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2004.1

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6

2003

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International Conference On Plasma Science 2003

JeJu, KOREA

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On Electron Heating Mechanism in Low Pressure High Density Inductively Coupled Plasma

5

2002

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International Conference On Plasma Science 2002

CANADA

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Heating mode transition in E mode of ICP and evolution of the EEDF during the E-H Transition

4

2001

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54th Gases Electronics Conference

U.S.A.

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Effect of pressure and gas species on Electron Cyclotron Resonance in a weakly magnetized Inductively Coupled Plasma

3

2000

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53th Gases Electronics Conference

U.S.A.

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The electron cyclotron resonance in RF inductive discharge

2

2000

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17th Symposium on Plasama Processing

JAPAN

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Nonlocal electron kinetics in a planar inductive discharge

1

1999

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52th Gases Electronics Conference

U.S.A.

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The effect of electron bounce resonance on EEDF in a solenoidal ICP