177

2020.12

JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY

11(219-226)

Improvement of corrosion properties of plasma in an aluminum alloy 6061-T6 by phytic acid anodization temperature;

Minjoong Kim, Eunmi Choi, Jongho So, Jae-Soo Shin, Chin-Wook Chung, Seon-Jeong Maeng, Ju-Young Yun

176

2020.11

PHYSICS OF PLASMAS

22(013501)

The opposite pressure dependence of electron temperature with respect to O2Ar mixing ratio in an inductively coupled plasma;

Moo-Young Lee, Jiwon Jung, Tae-Woo Kim, Kyung-Hyun Kim, Deuk-Chul Kwon, Chin-Wook Chung

175

2020.10

PHYSICS OF PLASMAS

27(103506)

Experimental observation of the effect of electron attachment and detachment reactions on the electron energy distribution in an inductive oxygen discharge;

Jiwon Jung, Moo-Young Lee, Kyung-Hyun Kim, Chin-Wook Chung

174

2020.09

PHYSICS OF PLASMAS

27(093504)

Electrical and plasma characterization of a hybrid plasma source combined with inductively coupled and capacitively coupled plasmas for O atom generation;

Kwan-Yong Kim, Kyung-Hyun Kim, Jun-Hyeon Moon, Chin-Wook Chung

173

2020.09

PHYSICS OF PLASMAS

27(093508)

Effect of the RF bias on the plasma density in an argon inductively coupled plasma;

Ho-won Lee, Kyung-Hyun Kim, Jong In Seo, Chin-Wook Chung

172

2020.07

PHYSICS OF PLASMAS

27(073505)

Control of electron and ion density profiles via virtual ground position control in an inductively coupled plasma;

Tae-Woo Kim,, Ju-ho Kim, Moo-Young Lee, Chin-Wook Chung

171

2020.06

PLASMA SOURCES SCIENCE AND TECHNOLOGY

29(065017)

A method for measuring negative ion density distribution using harmonic currents in a low-pressure oxygen plasma;

Aixian Zhang, Deuk-Chul Kwon and Chin-Wook Chung

170

2020.06

PHYSICS OF PLASMAS

27(063511)

Effect of electron kinetics on plasma density in inductively coupled plasmas using a passive resonant antenna;

Ju-Ho Kim,?Chin-Wook Chung

169

2020.06

PLASMA SOURCES SCIENCE AND TECHNOLOGY

29(075006)

A method for measuring plasma parameters and dielectric film thickness by analyzing transient voltages for deposition plasma processing monitoring;

Moo-Young Lee, Jiwon Jung, Tae-Woo Kim, Kyung-Hyun Kim, Chin-Wook Chung

168

2020.03

PHYSICS OF PLASMAS

27(033511)

Hysteresis and current reduction during E?H mode transition in an inductively coupled plasma;

Jun-Hyeon Moon,?Kyung-Hyun Kim,?Young-Hun Hong,?Moo-Young Lee,?Chin-Wook Chung

167

2020.03

PHYSICS OF PLASMAS

27(033508)

Nonlinear circuit analysis of intermodulation currents in a floating Langmuir probe with a capacitive load;

Kyung-Hyun Kim, Moo-Young Lee, Chin-Wook Chung

166

2020.03

Journal of vacuum science & technology B

38(022801)

Effect of low frequency power on the electron energy distribution function in argon inductively coupled plasmas;

Ju-Ho Kim,?Deuk-Chul Kwon, Chin-Wook Chung

165

2020.02

PHYSICS OF PLASMAS

27(023503)

On the E to H mode transition in a dual frequency (2 and 13.56MHz) inductively coupled plasma;

Ju-Ho Kim/ Chin-Wook Chung

164

2019.12

PHYSICS OF PLASMAS

26(123516)

Measurement of the electron energy distribution function in CO2 inductively coupled plasma;

Kyung-Hyun Kim/ Kwan-Yong Kim/ Young-Hun Hong/ Ho-Jun Moon/ Chin-Wook Chung

163

2019.11

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

37(062922)

Experimental comparative analysis on series and parallel antenna in an inductively coupled plasma;

Tae-Woo Kim/ Kyung-Hyun Kim/ Moo-Young Lee/ Chin-Wook Chung

162

2019.09

PHYSICS OF PLASMAS

26(093505)

Experimental investigation on the reduction in antenna coil current during the E to H mode transition in an inductively coupled plasma;

Jun-Hyeon Moon/ Ho-Jun Moon/ Chin-Wook Chung

161

2019.08

PHYSICS OF PLASMAS

26(083509)

Experimental investigation on the spatial distribution of floating potential at the wafer-level in inductively coupled oxygen plasma;

Aixian Zhang/ Kyung-Hyun Kim/ Deuk-Chul Kwon/ Chin-Wook Chung

160

2018.11

REVIEW OF SCIENTIFIC INSTRUMENTS

89(115006)

A monitoring device made of an anodic aluminum oxide template for plasma-induced charging potential measurements in the high-aspect-ratio trench structure;

Ji-Hwan Park/ Chin-Wook Chung

159

2018.11

JOURNAL OF MEMBRANE SCIENCE

566(336-345)

Ultrathin gutter layer for high-performance thin-film composite membranes for CO2 separation;

Myung-Jin Yoo, Kyung-Hyun Kim, Jun-Hyeok Lee, Tae-Woo Kim/ Chin-Wook Chung, Young-Hoon Cho, Ho-Bum Park

158

2018.07

PLASMA SOURCES SCIENCE AND TECHNOLOGY

27(075010)

Transient voltage analysis on a series capacitor of the floating probe for plasma diagnostics;

Moo-Young Lee, Kyung-Hyun Kim/ Chin-Wook Chung

157

2018.05

PLASMA SOURCES SCIENCE AND TECHNOLOGY

27(055018)

Evolution of two-dimensional plasma parameters in the plane of the wafer during the E- to H- and H- to E-mode transition in an inductively coupled plasma;

Il-seo Park, Kyung-Hyun Kim, Tae-Woo Kim, Kwan-Young Kim, Ho-Jun Moon/ Chin-Wook Chung

156

2018.05

PHYSICS OF PLASMAS

25(053516)

Compensation of the sheath effects in cylindrical floating probes;

Ji-Hwan Park/ Chin-Wook Chung

155

2018.03

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

36(031302)

Noninvasive electrical plasma monitoring method using reactor substrates as alternative current-sensing electrodes;

Ji-Hwan Park/ Chin-Wook Chung

154

2017.12

PHYSICS OF PLASMAS

24(123506)

Experimental investigation of edge-to-center density ratio in E-H mode transition of an inductively coupled plasma;

Il-seo Park, Hyun-Ju Kang, Kyung-Hyun Kim/ Chin-Wook Chung

153

2017.11

PHYSICS OF PLASMAS

24(113509)

Improved numerical AC superposition method for electron energy distribution functions;

Hyun-Ju Kang, Dong-Hwan Kim , Moo-Young Lee/ Chin-Wook Chung

152

2017.05

PHYSICS OF PLASMAS

24(053510)

Temporal evolution of two-dimensional electron temperature and ion flux on a substrate in a pulsed-power inductively coupled plasma;

Il-seo Park, Dong-Hwan Kim, Kyung-Hyun Kim/ Chin-Wook Chung

151

2017.04

Plasma Sources Sci. Technol.

26(055016)

Time-resolved spatial distribution measurements of pulse-modulated argon plasmas in an inductively coupled plasma reactor;

Ji-Hwan Park, Dong-Hwan Kim, Yu-Sin Kim/ Chin-Wook Chung

150

2017.02

PHYSICS OF PLASMAS

24(023503)

Effect of remote inductively coupled plasma (ICP) on the electron energy probability function of an in-tandem main ICP;

Jaewon Lee, Kyung-Hyun Kim/ Chin-Wook Chung

149

2017.01

PHYSICS OF PLASMAS

24(013512)

A study on plasma parameters in Ar/SF6 inductively coupled plasma;

Seung-Ju Oh, Hyo-Chang Lee/ Chin-Wook Chung

148

2017.01

PHYSICS OF PLASMAS

24(013508)

Pulsed floating-type Langmuir probe for measurements of electron energy distribution function in plasmas;

Ikjin Choi, Aram Kim, Hyo-Chang Lee, Dong-Hwan Kim/ Chin-Wook Chung

147

2017.01

Applied Physics Letters

110(014106)

Evolution of electron temperature in inductively coupled plasma;

Hyo-Chang Lee, B. H. Seo, Deuk-Chul Kwon, J.H. Seong, S.J. Oh/ Chin-Wook Chung, K.H. You, ChaeHo Shin

146/font>

2016.12

Plasma Sources Sci. Technol

26(025001)

Nonlinear circuit analysis of harmonic currents in a floationg Langmuir probe with a capacitive load;

Kyung-Hyun Kim, Dong-Hwan Kim /Chin-Wook Chung

145

2016.12

PHYSICS OF PLASMAS

23(123508)

Global model including multistep ionizations in helium plasmas;

Seung-Ju Oh, Hyo-Chang Lee /Chin-Wook Chung

144

2016.11

PHYSICS OF PLASMAS

23(113504)

Effects of antenna coil turns on plasma density and antenna voltage in solenoidal inductively coupled plasmas;

Jun-Hyeon Moon/ Kyung-Hyun Kim, Ming-Chieh Lin /Chin-Wook Chung

143

2016.08

PHYSICS OF PLASMAS

23(083517)

The radio-frequency fluctuation effect on the floating harmonic method;

Jaewon Lee, Kyung-Hyun Kim, Dong-Hwan Kim /Chin-Wook Chung

142

2016.06

PHYSICS OF PLASMAS

23(063509)

On modified finite difference method to obtain the electron energy distribution functions in Langmuir probes;

Hyun-Ju Kang/ Hyeok Choi, Jae-Hyun Kim, Se-Hun Lee, Tae-Ho Yoo/Chin-Wook Chung

141

2016.06

PHYSICS OF PLASMAS

23(063506)

Experimental observation of electron bounce resonance through electron energy distribution measurement in a finite size inductively coupled plasma;

Seuli Gu/ Hyun-Ju Kang, Deuk-Chul Kwon, Yu-sin Kim, Yoon-Min Chang/Chin-Wook Chung

140

2016.06

PHYSICS OF PLASMAS

23(063507)

Discharge dynamics and plasma density recovery by on/off switches of additional gas;

Hyo-Chang Lee/ Deuk-Chul Kwon, SeungJu Oh, Hyun-Ju Kang, Yu-Sin Kim/Chin-Wook Chung

139

2016.06

PHYSICS OF PLASMAS

23(063504)

Control of the floating potential using dual-frequency;

Il-Seo Park, Dong-Hwan Kim/Chin-Wook Chung

138

2015.12

REVIEW OF SCIENTIFIC INSTRUMENTS

86(123508)

Probe diagnostics in the far scrape-off layer plasma of Korea Superconducting Tokamak Advanced Research tokamak using a sideband harmonic method;

Dong-Hwan Kim, Suk-Ho Hong, Il-Seo Park, Hyo-Chang Lee, Hyun-Ju Kang/Chin-Wook Chung

137

2015.12

REVIEW OF SCIENTIFIC INSTRUMENTS

86(123502)

Real-time dielectric-film thickness measurement system for plasma processing chamber wall monitoring;

Jin-Yong Kim/Chin-Wook Chung

136

2015.12

PHYSICS OF PLASMAS

22(123504)

A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma;

Young-Cheol Kim, Hyun-Jun Kim, Hyo-Chang Lee/Chin-Wook Chung

135

2015.12

PHYSICS OF PLASMAS

22(123503)

The sheath effect on the floating harmonic method;

Jaewon Lee, Kyung-Hyun Kim/Chin-Wook Chung

134

2015.10

NATURE

5(15254)

Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment, and Modeling;

Hyo-Chang Lee/Chin-Wook Chung

133

2015.09

PHYSICS OF PLASMAS

22(093517)

Relatively high plasma density in low pressure inductive discharges;

Hyun-Ju Kang, Yu-Sin Kim/ Chin-Wook Chung

132

2015.08

PHYSICS OF PLASMAS

22(083511)

Non-invasive probe diagnostic method for electron temperature and ion current density in atmospheric pressure plasma jet source;

Young-Cheol Kim, Yu-Sin Kim, Hyo-Chang Lee, Jun-Hyeon Moon/ Chin-Wook Chung, Yunjung Kim, Guangsup Cho

131

2015.08

PHYSICS OF PLASMAS

22(083512)

Correlation between vibrational temperature of N2 and plasma parameters in inductively coupled Ar/N2 plasmas;

Young-Cheol Kim, Hyo-Chang Lee, Yu-Sin Kim / Chin-Wook Chung

130

2015.07

IEEE TRANSACTIONS ON PLAMSA SCIENCE

43(8)

Control of Spatial Power Deposition by Wireless Power Transfer Method Applicable to Inductively Coupled Plasma;

Seung-Ju Oh, Hyo-Chang Lee / Chin-Wook Chung

129

2015.07

PHYSICS OF PLASMAS

22(073502)

Experimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasma;

Ju-Ho Kim, Young-Cheol Kim/Chin-Wook Chung

128

2015.06

JOURNAL OF APPLIED PHYSICS

117(243302)

Pulsed plasma measurement method using harmonic analysis;

Yu-Sin Kim/Dong-Hwan Kim, Hyo-Chang Lee/Chin-Wook Chung

127

2015.04

JOURNAL OF APPLIED PHYSICS

117(153302)

On uniform plasma generation for the large area plasma processing in intermediate pressures;

Hyun Jun Kim/Hye-Ju Hwang, Dong Hwan Kim, Jeong Hee Cho, Hee Sun Chae/Chin-Wook Chung

126

2015.04

PHYSICS OF PLASMAS

22(043504)

Relationship between the discharge mode and the spatial oxygen plasma distribution in a large size ferrite inductively coupled plasmas;

Hyun Jun Kim/Hye-Ju Hwang, Dong Hwan Kim, Jeong Hee Cho, Hee Sun Chae/Chin-Wook Chung

125

2015.03

PHYSICS OF PLASMAS

22(053505)

Experimental verification of the Boltzmann relation at the wall in inductively coupled plasmas;

Hyo-Chang Lee/Chin-Wook Chung

124

2015.02

APPLIED PHYSICS LETTERS

24(024001)

Experimental verification of the Boltzmann relation at the wall in inductively coupled plasmas;

Young-Cheol Kim, June Young Kim/ Hyo-Chang Lee, Yu-Sin Kim, Jin-Yong Kim, Sung-Won Cho/Chin-Wook Chung

123

2015.02

PLASMA SOURCES SCIENCE & TECHNOLOGY

24(024001)

Electron heating and control of electron energy distribution for the enhancement of the plasma ashing processing;

Hyo-Chang/ Lee Chin-Wook Chung

122

2015.01

PHYSICS OF PLASMAS

22(013501)

Effect of the electron energy distribution on total energy loss with argon in inductively coupled plasmas;

June Young Kim Young-Cheol Kim, Yu-Sin Kim, Chin-Wook Chung

121

2014.12

Journal of Nanoscience and Nanotechnology

21(113505)

Thermal Compression Chip Interconnection Using Organic Solderability Preservative Etched Substrate by Plasma Processing;

Sung-Won Cho /JoonYoung Choi/ Chin-Wook Chung

120

2014.11

PHYSICS OF PLASMAS

21(113505)

Investigation of plasma diagnostics using a dual frequency harmonic technique;

June Young Kim /Dong-Hwan Kim ,Ju Ho Kim ,Sang-Bum Jeon ,Sung-Won Cho/ Chin-Wook Chung

119

2014.09

JOURNAL OF APPLIED PHYSICS

116(093302)

Investigation of plasma diagnostics using a dual frequency harmonic technique;

Dong-Hwan Kim/ Young-Do Kim, Sung-Won Cho, Yu-Sin Kim /Chin-Wook Chung

118

2014.09

PLASMA SOURCES SCIENCE & TECHNOLOGY

23(062002)

Control of electron energy distribution by adding a pulse inductive field in capacitive discharge;

Hyo-Chang Lee /Chin-Wook Chung

117

2014.08

IEEE TRANSACTIONS ON PLASMA SCIENCE

42(2858-2859)

Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas;

Young-Cheol Kim/ Hyo-Chang Lee /Chin-Wook Chung

116

2014.07

IEEE TRANSACTIONS ON PLASMA SCIENCE

42(2766-2767)

Enhanced Plasma Uniformity in RF Plasma With Side Multihole;

Hyo-Chang Lee/ Chin-Wook Chung

115

2014.07

SENSORS AND ACTUATORS B

203(130-134)

Colorimetric polydiacetylene for plasma diagnostics;

Hyo-Chang Lee /Seongho Jeon, Jong-Man Kim /Chin-Wook Chung

114

2013.08

PHYSICS OF PLASMAS

20(033506)

Experimental observation of the plasma potential with the screening temperature;

June Young Kim, Dong-Hwan Kim and Chin-Wook Chung

113

2014.02

PHYSICS OF PLASMAS

20(023511)

Investigation of the Boltzmann relation in plasmas with non-Maxwellian electron distribution;

June Young Kim, Hyo-Chang Lee, Dong-Hwan Kim, Yu-Sin Kim, Young-cheol Kim and Chin-Wook Chung

112

2014.02

PHYSICS OF PLASMAS

21(023512)

Measurement of sheath thickness at a floating potential;

Hyung-Sik Han, Hyo-Chang Lee, Se-Jin Oh and Chin-Wook Chung

111

2013.09

PHYSICS OF PLASMAS

20(093508)

A study on the maximum power transfer condition in an inductively coupled plasma using transformer circuit model;

Young-Do Kim, Hyo-Chang Lee and Chin-Wook Chung

110

2013.08

APPLIED PHYSICS LETTERS

103(084103)

Plasma diagnostic method using intermodulation frequencies in a Langmuir probe;

Dong-Hwan Kim, Hyo-Chang Lee, Yu-Sin Kim and Chin-Wook Chung

109

2013.08

PHYSICS OF PLASMAS

20(101612)

Transition of electron kinetics in weakly magnetized inductively coupled plasmas;

Jin-Yong Kim, Hyo-Chang Lee, Young-Do Kim, Young-cheol Kim and Chin-Wook Chung

108

2013.08

PHYSICS OF PLASMAS

20(083508)

Electron density and electron temperature measurement in a bi-Maxwellian electron distribution using a derivative method of Langmuir probes;

Hyo-Chang Lee, Se-Youn Moon and Chin-Wook Chung

107

2013.08

Plasma Sources Sci. Technol.

22(055011)

Effects of capacitor termination to an antenna coil on the plasma parameters in a radio frequency inductively coupled plasma;

Duksun Han, Hyo-Chang Lee, Hyun-Jun Kim, Yu-Sin Kim, Heesun Chae and Chin-Wook Chung

106

2013.08

PHYSICS OF PLASMAS

20(101607)

Effect of antenna size on electron kinetics in inductively coupled plasmas;

Hyo-Chang Lee and Chin-Wook Chung

105

2013.07

Meas. Sci. Technol

24(095102)

Wireless wafer-type probe system for measurement of two-dimensional plasma parameters and spatial uniformity;

Jin-Yong Kim, Se-Jin Oh, Young-cheol Kim, Ik-Jin Choi and Chin-Wook Chung

104

2013.06

APPLIED PHYSICS LETTERS

102(234104)

Discharge mode transition and hysteresis in inductively coupled plasma;

Hyo-Chang Lee, Dong-Hwan Kim and Chin-Wook Chung

103

2013.06

Thin Solid Films

547(9-12)

Method for measurement of transferred power to plasma in inductive discharges;

Hye-Ju Hwang, Young-cheol Kim and Chin-Wook Chung

102

2013.05

Thin Solid Films

547(38)

Mode transition of power dissipation and plasma parameters in an asymmetric capacitive discharge;

Su-Jin Lee, Hyo-Chang Lee, Jin-Young Bang, SeungJu Oh and Chin-Wook Chung

101

2013.05

REVIEW OF SCIENTIFIC INSTRUMENTS

84(053505)

Two-dimensional-spatial distribution measurement of electron temperature and plasma density in low temperature plasmas;

Young-cheol Kim, Sung-Ho Jang, Se-Jin Oh, Hyo-Chang Lee and Chin-Wook Chung

100

2013.05

Plasma Sources Sci. Technol.

22(032002)

Control of plasma density distribution via wireless power transfer in an inductively coupled plasma;

Hee-Jin Lee, Hyo-Chang Lee, Young-cheol Kim and Chin-Wook Chung

99

2013.03

PHYSICS OF PLASMAS

20(033504)

Experimental verification of the Boltzmann relation in confined plasmas : Comparison of noble and molecule gases;

Hyo-Chang Lee, Hye-Ju Hwang, Young-Cheol Kim, June Young Kim, Dong-Hwan Kim and Chin-Wook Chung

98

2013.02

PHYSICS OF PLASMAS

20(023505)

Spatial measurements of electron energy distribution and plasma parameters in a weakly magnetized inductive discharge;

Young-Do Kim, Young-Kwang Lee, Hyo-Chang Lee, and Chin-Wook Chung

97

2013.01

Japanese Journal of Applied Physics

52(01AA01)

Plasma Characteristics Depending on power Feeding Method in an inductively Coupled Plasma;

Hyun-Jun Kim, Young-cheol Kim and Chin-Wook Chung

96

2013.01

CURRENT APPLIED PHYSICS

13(76-79)

Real time feedback control of plasma density using a floating probe in semiconductor processing;

Sung-Ho Jang, Se-Jin Oh, Young-Kwang Lee, Chin-Wook Chung

95

2012.12

Thin Solid Films

521(185-188)

Comparisons of the electrical characteristics by impedance matching conditions on the E-H and H-E transition and the hysteresis of inductively coupled plasma;

Hyo-Chang Lee and Chin-Wook Chung

94

2012.12

APPLIED PHYSICS LETTERS

101(244104)

Collisionless electron heating by radio frequency bias in low gas pressure inductive discharge;

Hyo-Chang Lee and Chin-Wook Chung

93

2012.05

JOURNAL OF APPLIED PHYSICS

111(093301)

Effect of adding small amount of inductive fields to O2, Ar/O2 capacitively coupled plasmas;

Min-Hyong Lee, Hyo-Chang Lee, and Chin-Wook Chung

92

2012.05

Microwave Workshop Series on Innovative Wireless Power Transmission: Technologies, Systems, and Applications (IMWS), 2012 IEEE MTT-S International

(183-186)

Electromagnetically coupled resonators using toroidal ferrite core for wireless power transfer;

Hee-Jin Lee, Jin-Young Bang and Chin-Wook Chung

91

2012.04

MEASUREMENT SCIENCE AND TECHNOLOGY

23(085001)

Double probe diagnostics based on harmonic current detection for electron temperature and electropositive ion flux measurement in RF plasmas;

Se-Jin Oh, Ik-Jin Choi, Jin-Yong Kim and Chin-Wook Chung

90

2012.04

APPLIED PHYSICS LETTERS

100(164107)

Effect of helium on spatial plasma parameters in low pressure argon-helium plasma;

Jin-Young Bang, Duksun Han, Sung-Won Cho, and Chin-Wook Chung

89

2012.04

PHYSICS OF PLASMAS

19(043505)

Variation of the electron energy distribution with He dilution in an inductively coupled argon discharge;

Hyo-Chang Lee and Chin-Wook Chung

88

2012.04

한국진공학회지

21권(3호 pp121-129)

유도 결합 플라즈마에서 플라즈마 변수와 전자 에너지 분포에 대한 극판 전력 인가의 영향;

이효창, 정진욱

86

2012.03

PLASMA SOURCES SCIENCE AND TECHNOLOGY

21(035003)

Experimental observation of the skin effect on plasma uniformity in inductively coupled plasmas with a radio frequency bias;

Hyo-Chang Lee, SeungJu Oh and Chin-Wook Chung

86

2012.03

PHYSICS OF PLASMAS

19(033514)

Experimental measurements of spatial plasma potentials and electron energy distributions in inductively coupled plasma under weakly collisional and nonlocal electron kinetic regimes;

Hyo-Chang Lee and Chin-Wook Chung

85

2012.02

JOURNAL OF APPLIED PHYSICS

111(043305)

Real-time observation of the capacitance variation in a surface dielectric layer in radio frequency discharge;

Jin-Young Bang, Kyoung Yoo, and Chin-Wook Chung

84

2012.01

REVIEW OF SCIENTIFIC INSTRUMENTS

83(013503)

Electrical test method using high density plasmas for high-end printed circuit boards;

Se-Jin Oh, Young-Cheol Kim, Chin-Wook Chung

83

2011.11

PLASMA SOURCES SCIENCE AND TECHNOLOGY

20(065005)

A plasma diagnostic technique using a floating probe for the dielectric deposition process;

Jin-Young Bang, Kyoung-Yoo, Dong-Hwan Kim, Chin-Wook Chung

82

2011.10

PHYSICS OF PLASMAS

18(103511)

Sheath capacitatnce of a planar probe;

Se-Jin Oh, Young-Kwnag Lee, Chin-Wook Chung

81

2011.09

Current Applied Physics

11(S149)

E-H mode transition in inductively coupled plasma using Ar, O2, N2, andmixture gas;

Jung-Kyu Lee, Hyo-Chang Lee, Chin-Wook Chung

80

2011.08

Thin Solid Films

519(7009)

Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma;

Hyo-Chang Lee, Jin-Young Bang, Chin-Wook Chung

79

2011.08

Thin Solid Films

519(7042)

Harmonic analysis of sideband signals generated in plasmas;

Sung-Ho Jang, Gun-Ho Kim, Chin-Wook Chung

78

2011.07

PHYSICS OF PLASMAS

18(073507)

Electron energy flux control using dual power in side-type inductively coupled plasma;

Jin-Young Bang, Jin-Yong Kim, Chin-Wook Chung

77

2011.06

JOURNAL OF PHYSICS D: APPLIED PHYSICS

44(285203)

Determination of metastable level densities in a low-pressure inductively coupled argon plasma by the line-ratio method of optical emission spectroscopy;

Young-Kwang Lee, Se-Youn Moon, Se-Jin Oh, Chin-Wook Chung

76

2011.05

IEEE TRANSACTIONS ON PLASMA SCIENCE

99(05762370)

Evolution of two-dimensional plasma density on the E–H heating-mode transition in planar-type inductively coupled plasma;

Hyo-Chang Lee, Young-Cheol Kim, Chin-Wook Chung

75

2011.05

IEEE TRANSACTIONS ON PLASMA SCIENCE

99(05762360)

Development of ferrite-enhanced side-type inductively coupled plasma;

Jin-Young Bang, Chin-Wook Chung

74

2011.03

PHYSICS OF PLASMAS

18(033508)

Characteristics of probe current harmonics based on various applied voltage waveforms in low temperature plasmas;

Young-Do Kim, Yu-Sin Kim, Hyo-Chang Lee, Jin-Young Bang, Chin-Wook Chung

73

2011.02

PHYSICS OF PLASMAS

18(023501)

Observation of pressure gradient and related flow rate effect on the plasma parameters in plasma processing reactor;

Hyo-Chang Lee, Aram Kim, Se-Youn Moon, Chin-Wook Chung

72

2011.02

REVIEW OF SCIENTIFIC INSTRUMENTS

82(026107)

Interpolation for evaluation of a two-dimensional spatial profile of plasma densities at low gas pressures;

Se-Jin Oh, Young-Cheol Kim, Chin-Wook Chung

71

2011.01

JOURNAL OF APPLIED PHYSICS

109(013312)

Correlation between nanoparticle and plasma parameters with particle growth in dusty plasmas;

K.B. Chai, C.R. Seon, C.W. Chung, N.S. Yoon, W.H. Choe

70

2011.01

JOURNAL OF APPLIED PHYSICS

109(013306)

Ionization in inductively coupled argon plasmas studied by optical emission spectroscopy;

Young-Kwang Lee, Chin-Wook Chung

69

2011.01

PLASMA SOURCES SCIENCE AND TECHNOLOGY

20(015005)

Measurements of the total energy lost per electron–ion pair lost in low-pressure inductive argon, helium, oxygen and nitrogen discharge;

Young-Kwang Lee, Ju-Hwan Ku, Chin-Wook Chung

68

2010.12

PHYSICS OF PLASMAS

17(123506)

A numerical method for determining highly precise electron energy distribution functions from Langmuir probe characteristics;

Jin-Young Bang, Chin-Wook Chung

67

2010.11

APPLIED PHYSICS LETTERS

97(201503)

Role of hydrogen in evolution of plasma parameters and dust growth in capacitively coupled dusty plasmas;

K.B. Chai, W.H. Choe, C.R. Seon, C.W. Chung

66

2010.11

Journal of the Electrochemical Society

158(H21)

Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films;

H.C. Kim, S.H. Woo, J.S. Lee, Y.C. Kim, H.R.Lee, I.J.Choi, Y.D.Kim, C.W. Chung, H.T. Jeon

65

2010.09

REVIEW OF SCIENTIFIC INSTRUMENTS

81(093501)

Radio frequency-compensated Langmuir probe with auxiliary double probes;

Se-Jin Oh, Seung-Ju Oh, Chin-Wook Chung

64

2010.08

Proceedings of 10th IEEE Conference on Nanotechnology (IEEE-NANO)

10(1049)

Inductively coupled RF heating of nano-particle for non-invasive and selective cancer cell destruction;

Hyo-Chang Lee, Jung-Kyu Lee, Seung-Ju Oh, Chin-Wook Chung

63

2010.07

PHYSICS OF PLASMAS

17(073504)

Experimental investigation of edge-to-center density ratio in inductively coupled plasmas;

Gun-Ho Kim, Hyo-Chang Lee, Chin-Wook Chung

62

2010.06

PHYSICS OF PLASMAS

17(064502)

Improved measurement method for electron energy distribution functions with high accuracy and reliability;

Jin-Young Bang, Aram Kim, Chin-Wook Chung

61

2010.06

PHYSICS OF PLASMAS

17(063501)

Measurement of electron temperature and ion density using the self-bias effect in plasmas;

Kwang-Tae Hwang, Se-Jin Oh, Ik-Jin Choi, Chin-Wook Chung

60

2010.05

JOURNAL OF APPLIED PHYSICS

107(103312)

Floating harmonics method for measuring electron temperature in non-Maxwellian plasmas;

Jin Young Bang, ARam Kim, Chin Wook Chung

59

2010.05

PLASMA SOURCES SCIENCE AND TECHNOLOGY

19(034013)

Transient effects caused by pulsed gas and liquid injections into low pressure plasmas;

D. Ogawa, C.W. Chung, M. Goeckner, L. Overzet

58

2010.05

REVIEW OF SCIENTIFIC INSTRUMENTS

81(053503)

New interpolation algorithm for evaluation a spatial profile of plasma densities in radio frequency discharges;

Se-Jin Oh, Sung-Ho Jang, Young-Cheol Kim, Chin-Wook Chung

57

2010.04

PHYSICS OF PLASMAS

17(043508)

Measurement of the total energy losses per electron-ion lost in various mixed gas inductively coupled plasmas;

Ju-Hwan Ku, Young-Kwang Lee, Chin-Wook Chung

56

2010.04

PHYSICAL REVIEW E

81(046402)

Comparison of pressure dependence of electron energy distributions in oxygen capacitively and inductively coupled plasmas;

Min-Hyong Lee, Hyo-Chang Lee, Chin-Wook Chung

55

2010.04

Thin Solid Films

518(5219)

Impedance transition and series resonance between bulk plasma and sheath in biased inductively coupled plasma;

Hyo-Chang Lee, Chin-Wook Chung

54

2010.03

PHYSICS OF PLASMAS

17(033506)

Evolution of the electron energy distribution and E-H mode transition in inductively coupled nitrogen plasma;

Hyo-Chang Lee, Jung-Kyu Lee, Chin-Wook Chung

53

2010.02

APPLIED PHYSICS LETTERS

96(071501)

Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma;

Hyo-Chang Lee, Min-Hyong Lee, Chin-Wook Chung

52

2010.01

APPLIED PHYSICS LETTERS

96(041503)

Experimental observation of the transition from nonlocal to local electron kinetics in inductively coupled plasmas;

Hyo-Chang Lee, Min-Hyong Lee, Chin-Wook Chung

51

2010.01

JOURNAL OF APPLIED PHYSICS

107(023303)

In situ method for real time measurement of dielectric film thickness in plasmas;

Sung-Ho Jang, Gun-Ho Kim, Chin-Wook Chung

50

2010.01

PHYSICS OF PLASMAS

17(013501)

Low energy electron heating and evolution of the electron energy distribution by diluted O;

Hyo-Chang Lee, Min-Hyong Lee, Chin-Wook Chung

49

2009.11

PLASMA SOURCES SCIENCE AND TECHNOLOGY

19(015011)

Observation of inverse hysteresis in the E to H mode transitions in inductively coupled plasmas;

Min-Hyong Lee, Chin-Wook Chung

48

2009.11

Journal of the Korean Physical Society

55(1869)

Langmuir Probe Perturbation in Inductively Coupled Plasmas;

Sung-Ho Jang, Min-Hyong Lee, Chin-Wook Chung

47

2009.09

PHYSICS OF PLASMAS

16(093502)

Experimental investigation of the Boltzmann relation for a bi-Maxwellian distribution in inductively coupled plasmas;

Jin-Young Bang, Chin-Wook Chung

46

2009.09

APPLIED PHYSICS LETTERS

95(111501)

Experimental measurement of the total energy losses in a low pressure inductively coupled argon plasma;

Young-Kwang Lee, Min-HyongLee, Chin-Wook Chung

45

2009.06

PHYSICS OF PLASMAS

16(063506)

Electron temperature control by an external magnetic field in solenoidal inductive discharge;

Min-Hyong Lee, Ju-Hwan Ku, Kwang-Tae Hwang, Chin-Wook Chung

44

2008.12

APPLIED PHYSICS LETTERS

93(231503)

Observationof collisionless heating of low energy electrons in low pressure inductively coupled argon plasmas;

Min-Hyong Lee, Hyo-Chang Lee, Chin-Wook Chung

43

2008.12

JOURNAL OF APPLIED PHYSICS

104(113303)

Evolution of an electron energy distribution function in a weak dc magnetic field in solenoidal inductive plasma;

Min-Hyong Lee, Seong-Wook Choi

42

2008.10

APPLIED PHYSICS LETTERS

93(151503)

Observation of the inductive to helicon mode transtion in a weakly magnetized solenoidal inductive discharge;

Min-Hyong Lee, Chin-Wook Chung

41

2008.06

Journal of the Korean Physical Society

52(1792)

Spectroscopic Measurement of the Electron Temperature and the Metastable Densities by Using a Simple Colisional-Radiative Model in a Low-Pressure Inductively-Coupled Argon Plasma;

Young-Kwang Lee, Kwang-Tae Hwang, Min-Hyong Lee, Chin-Wook Chung

40

2008.01

PLASMA SOURCES SCIENCE AND TECHNOLOGY

17(015014)

Characterization of a side-type ferrite inductively coupled plasma source for large scale processing;

K.H. Lee, Y.K. Lee, S.W. Jo, C.W. Chung, V. Godyak

39

2007.12

APPLIED PHYSICS LETTERS

91(221505)

Non-invasive method to measure ion flux in capacitive discharge;

Min-Hyong Lee, Hyo-Chang Lee, Chin-Wook Chung

38

2007.10

PHYSICS OF PLASMAS

14(103507)

Plasma characteristics in a solenoidal inductive/capacitive discharge under a weak dc magnetic field;

Min-Hyong Lee, Chin-Wook Chung

37

2007.10

Journal of the Korean Physical Society

51(1307)

New Method to Measure the Electron Temperature and the Plasma Density in a Single-Frequency Capacitive Discharge;

Min-Hyong Lee, Ik-Jin Choe, Chin-Wook Chung

36

2007.07

새물리

55(28)

페라이트 유도결합 플라즈마 특성 연구;

이경효, 이원기, 이영광, 조성원, 정진욱

35

2007.06

반도체 및 디스플레이 장비 학회지

6(1)

400 kHz 페라이트 유도결합 플라즈마를 위한 임피던스 매칭 네트워크;

조성원, 방진영, 이영광, 정진욱

34

2007.05

Microelectronic Engineering

85(300)

Etching characteristics of photoresist and low-k dielectrics by Ar/O;

H.W. Kim, J.W. Lee, W.S. Hwang, B.H. O, S.G. Lee, S.G. Park J.H. Kim, D.J. Chung, S.P. Chang, Y.C. Joo, J.H. Joo, C.W. Chung, W.J. Park, C.J. Kang, S.H. Joo, S.O. Park, K.H. Kim, J.Y. Jang

33

2007.05

APPLIED PHYSICS LETTERS

90(191502)

On the hysteresis in E to H and H to E transitions and the multistep ionization in inductively coupled plasma;

Min-Hyong Lee, Kyeong-Hyo Lee, Dong-Seok Hyun, Chin-Wook Chung

32

2007.02

JOURNAL OF APPLIED PHYSICS

101(033305)

Floating probe for electron temperature and ion density measurement applicable to processing plasmas;

Min-Hyong Lee, Sung-Ho Jang, Chin-Wook Chung

31

2006.10

Journal of the Korean Physical Society

49(1687)

Comparison of plasma densities measured by electrical probes to those measured by microwave probes in inductively coupled plasmas;

Won-Ki Kim, Min-Hyong Lee, Chin-Wook Chung

30

2006.10

Japanese Journal of Applied Physics

45(8035)

Distributed Ferromagnetic Inductively Coupled Plasma as an Alternative Plasma Processing Tool;

Valery Godyak, Chin-Wook Chung

29

2006.06

PHYSICS OF PLASMAS

13(063510)

On the E to H and H to E transition mechanisms in inductively coupled plasma;

Min-Hyong Lee, Chin-Wook Chung

28

2006.05

JOURNAL OF MATERIALS SCIENCE

41(5040)

Photoresist ashing technology using N;

H.W. Kim, J.H. Myung, J.W. Lee, H.S. Kim, K.H. Kim, J.Y. Jang, T.H. Yoon, S.K. Kim, D.K. Choi, C.W. Chung, G.Y. Yeom, J.M. Myoung, H.J. Kim

27

2006.05

PHYSICS OF PLASMAS

13(053502)

On the multistep ionizations in an argon inductively coupled plasma;

Min-Hyong Lee, Sung-Ho Jang, Chin-Wook Chung

26

2005.12

PHYSICS OF PLASMAS

12(123505)

Experimental investigation on the floating potential of cylindrical Langmuir probes in non-Maxwellian electron distributions;

Chin-Wook Chung

25

2005.09

APPLIED PHYSICS LETTERS

87(131502)

Effect of multistep ionizations on the electron temperature in an argon inductively coupled plasma;

Min-Hyong Lee, Chin-Wook Chung

24

2005.09

Thin Solid Films

506(222)

Study of ashing for low-k dielectrics using the N ferrite-core inductively coupled plasmas;

H.W. Kim, J.H. Myung, N.H. Kim, H.S. Lee, S.G. Park, J.G. Lee, C.W. Chung, W.J. Park, C.J. Kang, C.G. Yoo, K.H. Ko, J.H. Woo, S.D. Choi, D.K. Choi

23

2005.08

Surface Engineering, Surface Instrumetation & Vacuum Technology

80(193)

Photoresist ashing in nitrogen gas using ferrite core inductively coupled plasmas;

H.W. Kim, J.H Myung, N.H. Kim, C.W. Chung, W.J. Park, C.J. Kang, C.G. Yoo, D.K. Choi

22

2005.08

새물리

51(158)

높은 균일도를 갖는 300mm 공정용 유도결합 플라즈마 원 개발 연구;

이원기, 정진욱, 엄세훈, 이용관

21

2005.06

PHYSICS OF PLASMAS

12(063502)

Characterization of pulsed plasma in unbalanced magnetron argon discharge;

S. W. Lee, S. H. Seo, J. H. In, C. W. Chung

20

2005.06

PHYSICS OF PLASMAS

12(073501)

Self-consistent global model with multi-step ionizations in inductively coupled plasmas;

Min-Hyong Lee, Chin-Wook Chung

19

2005.07

APPLIED PHYSICS LETTERS

87(041501)

Feature of electron energy distribution in a low-pressure capacitive discharge;

S. J. You, C. W. Chung, H. Y. Chang

18

2005.06

새물리

50(410)

유도결합 플라즈마에서 터널 다이오드 발진을 이용한 음의 바이오스 영역의 쉬스 정전용량 측정 연구;

오세진, 이평우, 정진욱

17

2005.05

새물리

50(329)

유도결합 플라즈마에서 정전탐침과 파이크로 파 탐침을 이용한 밀도 측정 비교 연구;

김원기, 정진욱, 김정형, 신용현, 정광화

16

2005.02

Japanese Journal of Applied Physics

44(1081)

Development of a dual inductively coupled plasma for direct and remote plasma generation in a reactor;

Sae-Hoon Uhm, Kyung-Ho Lee, Hong- Young Chang, Chin-Wook Chung

15

2004.12

JOURNAL OF MATERIALS SCIENCE

40(3543)

Application of N/Ar inductively coupled plasma to the photoresist ashing for low-k dielectrics;

H.W. Kim, J.H. Myung, N.H. Kim, C.G. Yoo, K.W. Suh, S.K. Kim, D.K. Choi, C.W. Chung, C.J. Kang, W.J. Park, S.G. Park, J.G. Lee

14

2004.09

PHYSICS OF PLASMAS

11(4830)

On a dual inductively coupled plasma for direct and remote plasma in a reacto;

Sae-Hoon Uhm, Kyong-Ho Lee, Hong- Young Chang, Chin-Wook Chung

13

2004.01

PHYSICAL REVIEW E

69(016406)

Experimental measurement of the electron energy distribution function in the radio frequency electron cyclotron resonance inductive discharge;

Chin-Wook Chung, S. S. Kim, H. Y. Chang

12

2003.12

JOURNAL OF APPLIED PHYSICS

94(7422)

Mode transition for power dissipation induced by driving frequency in capacitively coupled plasma;

S.J. You, H.C. Kim, C.W. Chung, H.Y. Chang, J.K. Lee

11

2003.07

Thin Solid Films

435(72)

Theoretical investigation of the evolution of electron energy distribution functions in inductively coupled discharges;

S.S. Kim, Chin-Wook Chung, H.Y. Chang

10

2003.06

Surface and Coatings Technology

169-170(20)

On inductively coupled plasmas for next-generation processing;

Y.K. Lee , D.S. Lee , K.H. Bai, C.W. Chung, H.Y. Chang

9

2002.07

APPLIED PHYSICS LETTERS

81(2529)

Power dissipation mode transition by a magnetic field;

S. J. You, C.W. Chung, K.H. Bai, H.Y. Chang

8

2002.02

PHYSICAL REVIEW LETTERS

88(095002)

Electron Cyclotron Resonance in aWeakly Magnetized Radio-Frequency Inductive Discharge;

Chin-Wook Chung, S.S. Kim, H.Y. Chang

7

2002.01

APPLIED PHYSICS LETTERS

80(1725)

Heating-mode transition in the capacitive mode of inductively coupled plasmas;

Chin-Wook Chung, Hong-Young Chang

6

2001.04

PHYSICS OF PLASMAS

8(3498)

Pressure and helium mixing effects on plasma parameters in temperature control using a grid system;

K.H. Bai, J.I. Hong, C.W. Chung, S.S. Kim, H.Y. Chang

5

2001.02

PHYSICS OF PLASMAS

8(2992)

The electron bounce resonance in a low-pressure solenoidal inductive discharge;

C.W. Chung, K.I. You, S.H. Seo, S.S. Kim, H.Y. Chang

4

2000.09

Surface and Coatings Technology

131(1)

Review of heating mechanism in inductively coupled plasma;

Sang-Hun Seo, Chin-Wook Chung, Hong-Young Chang

3

2000.06

PHYSICS OF PLASMAS

7(3826)

The nonlocal and local property of the electron energy distribution function in a low-pressure inductively coupled plasma;

Chin-Wook Chung, Hong-Young Chang

2

2000.05

PHYSICS OF PLASMAS

7(3584)

The radio frequency magnetic field effect on electron heating in a low frequency inductively coupled plasma;

Chin-Wook Chung, Sang-Hun Seo, Hong-Young Chang

1

2000.04

JOURNAL OF APPLIED PHYSICS

88(1181)

The finite size effect in a planar inductively coupled plasma;

C.W. Chung, S.S. Kim, S.H. Seo, H.Y. Chang, N.S. Yoon

0

2000.02

PHYSICAL REVIEW E

62(7155)

Nonlocal electron kinetics in a planar inductive helium discharge;

Sang-Hun Seo, Chin-Wook Chung, Jung-In Hong, Hong-Young Chang