|
|
207 |
2024.02 |
Plasma Sources Science and Technology |
33(025028) |
A harmonic method for measuring electron temperature and ion density using an asymmetric double probe |
Hyundong Eo, Sung Joon Park, Ju Ho Kim, and Chin-Wook Chung |
|
206 |
2023.12 |
Physics of Plasmas |
30(123504) |
Ion energy distribution measurement device using a capillary plate with high-aspect ratio |
Ho-Won Lee, Ju Ho Kim, Chin-Wook Chung |
|
205 |
2023.08 |
Applied Surface Science |
629(157367) |
Investigation of contamination particles generation and surface chemical reactions on Al2O3, Y2O3, and YF3 coatings in F-based plasma |
Jongho So, Minjoong Kim, Hyuksung Kwon, Seonjeong Maeng, Eunmi Choi, Chin-Wook Chung, Ju-Young Yun |
|
204 |
2023.07 |
Journal of Vacuum Science & Technology A |
41(053003) |
Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas |
Ho-Jun Moon, Jae-Won Lee, Ho-Won Lee, Yeong-Min Lim, Jiwon Jung, and Chin-Wook Chung |
|
203 |
2023.07 |
Plasma Sources Science and Technology |
32(075008) |
Improvement of photoresist etching by impedance control of a bias electrode in an inductive discharge |
You He, Yi-Lang Jiang, Jiwon Jung, Min-Seok Kim, Ju-Ho Kim, and Chin-Wook Chung |
|
202 |
2023.07 |
Plasma Sources Science and Technology |
32(075012) |
High-speed plasma diagnostics based on the floating harmonic method in inductively coupled plasma and pulsed plasma; |
Beom-Jun Seo, Kyung-Hyun Kim, Hyundong Eo, Ho-Won Lee, Ju Ho Kim and Chin-Wook Chung |
|
201 |
2023.02 |
Physics of Plasmas |
30(023504) |
Electron-assisted PR etching in oxygen inductively coupled plasma via a low-energy electron beam; |
Jiwon Jung, Min-Seok Kim, Junyoung Park, Chang-Min Lim, Tae-Wung Hwang, Beom-Jun Seo, and Chin-Wook Chung |
|
200 |
2023.02 |
Plasma Science and Technology |
25(045401) |
Effect of parallel resonance on the electron energy distributioin function in a 60 MHz capacitively coupled plasma; |
You HE, Yeong-Min LIM, Jun-Ho LEE1, Ju-Ho KIM, Moo-Young LEE and Chin-Wook CHUNG |
|
199 |
2023.02 |
Physics of Plasmas |
30(023501) |
A method for measuring electron temperature and ion density with immunity to RF fluctuation and ion current; |
Hyundong Eo,Kyung-Hyun Kim, Moo-Young Lee, Ju Ho Kim,and Chin-Wook Chung |
|
198 |
2022.12 |
Journal of Vacuum Science & Technology A |
41(013005) |
Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor; |
Yeong-Min Lim, Young-Hun Hong, Gil-Ho Kang, and Chin-Wook Chung |
|
197 |
2022.10 |
Nuclear Engineering and Technology |
54(3717-3723) |
Two-dimensional measurements of the ELM filament using a multichannel electrical probe array with high time resolution at the far SOL region in the KSTAR; |
Young-Hun Hong a , Kwan-Yong Kim a , Ju-Ho Kim a , Soo-Hyun Son b , Hyung-Ho Lee b , Hyun-Dong Eo a , Min-Seok Kim a , Suk-Ho Hong b , Chin-Wook Chung |
|
196 |
2022.10 |
Plasma Sources Science and Technology |
31(105007) |
Effect of electron energy distributions on the electron density in nitrogen inductively coupled plasma; |
Kwan-Yong Kim, Jung Hyung Kim, Chin-Wook Chung and Hyo-Chang Lee |
|
195 |
2022.10 |
Journal of Vacuum Science & Technology A |
40(063003) |
Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma; |
Yeong-Min Lim, So-Yeong Park, You He, Young-Hun Hong, and Chin-Wook Chung |
|
194 |
2022.09 |
Physics of Plasmas |
29(093506) |
Experimental investigation on the hysteresis in low-pressure inductively coupled neon discharge; |
Young-Hun Hong, Tae-Woo Kim, Ju-Ho Kim, Yeong-Min Lim, Moo-Young Lee, and Chin-Wook Chung |
|
193 |
2022.08 |
Plasma Sources Science and Technology |
31(075008) |
Electron energy probability function measurement in a 2 MHz and 13.56 MHz dual-frequency capacitively coupled argon plasma; |
Young-Hun Hong, Tae-Woo Kim, Beom-Seok Kim, Moo-Young Lee and Chin-Wook Chung |
|
192 |
2022.07 |
Journal of Physics D: Applied Physics |
55(375204) |
Correlation of SiO2 etch rate in CF4 plasma with electrical circuit parameter obtained from VI probe in inductively coupled plasma etcher; |
Nayeon Lee, Woohyun Lee, Ohyung Kwon and Chin-Wook Chung |
|
191 |
2022.06 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
31(065006) |
Enhanced plasma generation in capacitively coupled plasma using a parallel inductor; |
Yeong-Min Lim , You He, Jaewon Lee, Ju-Ho Kim , Kyung-Hyun Kim and Chin-Wook Chung |
|
190 |
2022.05 |
Nuclear Engineering and Technology |
31(065006) |
Two-dimensional measurements of the ELM filament using a multi-channel electrical probe array with high time resolution at the far SOL region in the KSTAR; |
Young-Hun Hong, Kwan-Young Kim, Ju-Ho Kim, Soo-Hyun Son, Hyung-Ho Lee, Hyun-Dong Eo, Min Seok Kim, Suk-Ho Hong, Chin-Wook Chung |
|
189 |
2022.04 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
31(045015) |
Measurement of the electron energy distribution functions in low density RF plasmas through a tunable external RF filter; |
Sang-Bum Jeon, Ji-Hwan Park and Chin-Wook Chung |
|
188 |
2022.02 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
31(025002) |
Low-energy electron beam generation in inductively coupled plasma via a DC biased grid; |
Jiwon Jung, Moo-Young Lee, Jae-Gu Hwang, Moo-Hyun Lee, Min-Seok Kim, Jaewon Lee and Chin-Wook Chung |
|
187 |
2022.01 |
PHYSICS OF PLASMAS |
29(013510) |
Effect of RF bias power on discharge mode transition and its hysteresis in inductively coupled plasmas; |
Aixian Zhang, Min-Seok Kim, Young-Hun Hong, Jun-Hyeon Moon, Kyung-Hyun Kim, and Chin-Wook Chung |
|
186 |
2022.01 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
31(015002) |
Plasma and electrical characteristics depending on an antenna position in an inductively coupled plasma with a passive resonant antenna; |
Ju Ho Kim and Chin-wook Chung |
|
185 |
2021.11 |
Fusion Engineering and Design |
172(112900) |
Simultaneous measurements of plasma parameters and blob characteristics at the far-SOL region using a hybrid probe in KSTAR; |
Kwan-Yong Kim, Soo-Hyun Son, Suk-Ho Hong, Il-Seo Park, Ju-Ho Kim, Jae-won Lee, Chin-Wook Chung |
|
184 |
2021.06 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
30(065006) |
Improvement of the floating probe method for ion density and electron temperature measurement without compensation due to voltage reduction across the sheath; |
Moo-Young Lee, Jong-In Seo, Hyundong Eo, Tae-Woo Kim, Jiwon Jung, Yeong-Min Lim and Chin-Wook Chung |
|
183 |
2021.05 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
30(055017) |
Development of high-efficiency capacitive discharge using magnetic resonance wireless power transfer systems; |
Ju-Ho Kim and Chin-Wook Chung |
|
182 |
2021.05 |
PHYSICS OF PLASMAS |
28(053507) |
Experimental investigation on optimal plasma generation in inductively coupled plasma; |
Young-Hun Hong, Ju-Ho Kim, Tae-Woo Kim, Ho-Won Lee, Moo-Young Lee, and Chin-Wook Chung |
|
181 |
2021.05 |
REVIEW OF SCIENTIFIC INSTRUMENTS |
92(053531) |
A wafer-like apparatus for two-dimensional measurement of plasma parameters and temperature distribution in lowtemperature plasmas; |
Yeong-Min Lim, Hyundong Eo, Kyung-Hyun Kim, Moo-Young Lee, and Chin-Wook Chung |
|
180 |
2021.03 |
JOURNAL OF APPLIED PHYSICS |
129(103305) |
Control of the spatial distribution of ion flux in dual inductively coupled plasmas; |
Sung-Won Cho, Jun-Hyeon Moon, Aixian Zhang, and Chin-Wook Chung |
|
179 |
2021.02 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
30(025002) |
Local electron and ion density control using passive resonant coils in inductively coupled plasma; |
Tae-Woo Kim, Moo-Young Lee, Young-Hun Hong, Moo-Hyun Lee, Ju-Ho Kim and Chin-Wook Chung |
|
178 |
2021.02 |
AIP Advances |
11(025027) |
Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasma; |
Nayeon Lee, Ohyung Kwon,Chin-Wook Chung |
|
177 |
2020.12 |
JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY |
11(219-226) |
Improvement of corrosion properties of plasma in an aluminum alloy 6061-T6 by phytic acid anodization temperature; |
Minjoong Kim, Eunmi Choi, Jongho So, Jae-Soo Shin, Chin-Wook Chung, Seon-Jeong Maeng, Ju-Young Yun |
|
176 |
2020.11 |
PHYSICS OF PLASMAS |
22(013501) |
The opposite pressure dependence of electron temperature with respect to O2Ar mixing ratio in an inductively coupled plasma; |
Moo-Young Lee, Jiwon Jung, Tae-Woo Kim, Kyung-Hyun Kim, Deuk-Chul Kwon, Chin-Wook Chung |
|
175 |
2020.10 |
PHYSICS OF PLASMAS |
27(103506) |
Experimental observation of the effect of electron attachment and detachment reactions on the electron energy distribution in an inductive oxygen discharge; |
Jiwon Jung, Moo-Young Lee, Kyung-Hyun Kim, Chin-Wook Chung |
|
174 |
2020.09 |
PHYSICS OF PLASMAS |
27(093504) |
Electrical and plasma characterization of a hybrid plasma source combined with inductively coupled and capacitively coupled plasmas for O atom generation; |
Kwan-Yong Kim, Kyung-Hyun Kim, Jun-Hyeon Moon, Chin-Wook Chung |
|
173 |
2020.09 |
PHYSICS OF PLASMAS |
27(093508) |
Effect of the RF bias on the plasma density in an argon inductively coupled plasma; |
Ho-won Lee, Kyung-Hyun Kim, Jong In Seo, Chin-Wook Chung |
|
172 |
2020.07 |
PHYSICS OF PLASMAS |
27(073505) |
Control of electron and ion density profiles via virtual ground position control in an inductively coupled plasma; |
Tae-Woo Kim,, Ju-ho Kim, Moo-Young Lee, Chin-Wook Chung |
|
171 |
2020.06 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
29(065017) |
A method for measuring negative ion density distribution using harmonic currents in a low-pressure oxygen plasma; |
Aixian Zhang, Deuk-Chul Kwon and Chin-Wook Chung |
|
170 |
2020.06 |
PHYSICS OF PLASMAS |
27(063511) |
Effect of electron kinetics on plasma density in inductively coupled plasmas using a passive resonant antenna; |
Ju-Ho Kim,?Chin-Wook Chung |
|
169 |
2020.06 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
29(075006) |
A method for measuring plasma parameters and dielectric film thickness by analyzing transient voltages for deposition plasma processing monitoring; |
Moo-Young Lee, Jiwon Jung, Tae-Woo Kim, Kyung-Hyun Kim, Chin-Wook Chung |
|
168 |
2020.03 |
PHYSICS OF PLASMAS |
27(033511) |
Hysteresis and current reduction during E?H mode transition in an inductively coupled plasma; |
Jun-Hyeon Moon,?Kyung-Hyun Kim,?Young-Hun Hong,?Moo-Young Lee,?Chin-Wook Chung |
|
167 |
2020.03 |
PHYSICS OF PLASMAS |
27(033508) |
Nonlinear circuit analysis of intermodulation currents in a floating Langmuir probe with a capacitive load; |
Kyung-Hyun Kim, Moo-Young Lee, Chin-Wook Chung |
|
166 |
2020.03 |
Journal of vacuum science & technology B |
38(022801) |
Effect of low frequency power on the electron energy distribution function in argon inductively coupled plasmas; |
Ju-Ho Kim,?Deuk-Chul Kwon, Chin-Wook Chung |
|
165 |
2020.02 |
PHYSICS OF PLASMAS |
27(023503) |
On the E to H mode transition in a dual frequency (2 and 13.56MHz) inductively coupled plasma; |
Ju-Ho Kim/ Chin-Wook Chung |
|
164 |
2019.12 |
PHYSICS OF PLASMAS |
26(123516) |
Measurement of the electron energy distribution function in CO2 inductively coupled plasma; |
Kyung-Hyun Kim/ Kwan-Yong Kim/ Young-Hun Hong/ Ho-Jun Moon/ Chin-Wook Chung |
|
163 |
2019.11 |
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B |
37(062922) |
Experimental comparative analysis on series and parallel antenna in an inductively coupled plasma; |
Tae-Woo Kim/ Kyung-Hyun Kim/ Moo-Young Lee/ Chin-Wook Chung |
|
162 |
2019.09 |
PHYSICS OF PLASMAS |
26(093505) |
Experimental investigation on the reduction in antenna coil current during the E to H mode transition in an inductively coupled plasma; |
Jun-Hyeon Moon/ Ho-Jun Moon/ Chin-Wook Chung |
|
161 |
2019.08 |
PHYSICS OF PLASMAS |
26(083509) |
Experimental investigation on the spatial distribution of floating potential at the wafer-level in inductively coupled oxygen plasma; |
Aixian Zhang/ Kyung-Hyun Kim/ Deuk-Chul Kwon/ Chin-Wook Chung |
|
160 |
2018.11 |
REVIEW OF SCIENTIFIC INSTRUMENTS |
89(115006) |
A monitoring device made of an anodic aluminum oxide template for plasma-induced charging potential measurements in the high-aspect-ratio trench structure; |
Ji-Hwan Park/ Chin-Wook Chung |
|
159 |
2018.11 |
JOURNAL OF MEMBRANE SCIENCE |
566(336-345) |
Ultrathin gutter layer for high-performance thin-film composite membranes for CO2 separation; |
Myung-Jin Yoo, Kyung-Hyun Kim, Jun-Hyeok Lee, Tae-Woo Kim/ Chin-Wook Chung, Young-Hoon Cho, Ho-Bum Park |
|
158 |
2018.07 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
27(075010) |
Transient voltage analysis on a series capacitor of the floating probe for plasma diagnostics; |
Moo-Young Lee, Kyung-Hyun Kim/ Chin-Wook Chung |
|
157 |
2018.05 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
27(055018) |
Evolution of two-dimensional plasma parameters in the plane of the wafer during the E- to H- and H- to E-mode transition in an inductively coupled plasma; |
Il-seo Park, Kyung-Hyun Kim, Tae-Woo Kim, Kwan-Young Kim, Ho-Jun Moon/ Chin-Wook Chung |
|
156 |
2018.05 |
PHYSICS OF PLASMAS |
25(053516) |
Compensation of the sheath effects in cylindrical floating probes; |
Ji-Hwan Park/ Chin-Wook Chung |
|
155 |
2018.03 |
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A |
36(031302) |
Noninvasive electrical plasma monitoring method using reactor substrates as alternative current-sensing electrodes; |
Ji-Hwan Park/ Chin-Wook Chung |
|
154 |
2017.12 |
PHYSICS OF PLASMAS |
24(123506) |
Experimental investigation of edge-to-center density ratio in E-H mode transition of an inductively coupled plasma; |
Il-seo Park, Hyun-Ju Kang, Kyung-Hyun Kim/ Chin-Wook Chung |
|
153 |
2017.11 |
PHYSICS OF PLASMAS |
24(113509) |
Improved numerical AC superposition method for electron energy distribution functions; |
Hyun-Ju Kang, Dong-Hwan Kim , Moo-Young Lee/ Chin-Wook Chung |
|
152 |
2017.05 |
PHYSICS OF PLASMAS |
24(053510) |
Temporal evolution of two-dimensional electron temperature and ion flux on a substrate in a pulsed-power inductively coupled plasma; |
Il-seo Park, Dong-Hwan Kim, Kyung-Hyun Kim/ Chin-Wook Chung |
|
151 |
2017.04 |
Plasma Sources Sci. Technol. |
26(055016) |
Time-resolved spatial distribution measurements of pulse-modulated argon plasmas in an inductively coupled plasma reactor; |
Ji-Hwan Park, Dong-Hwan Kim, Yu-Sin Kim/ Chin-Wook Chung |
|
150 |
2017.02 |
PHYSICS OF PLASMAS |
24(023503) |
Effect of remote inductively coupled plasma (ICP) on the electron energy probability function of an in-tandem main ICP; |
Jaewon Lee, Kyung-Hyun Kim/ Chin-Wook Chung |
|
149 |
2017.01 |
PHYSICS OF PLASMAS |
24(013512) |
A study on plasma parameters in Ar/SF6 inductively coupled plasma; |
Seung-Ju Oh, Hyo-Chang Lee/ Chin-Wook Chung |
|
148 |
2017.01 |
PHYSICS OF PLASMAS |
24(013508) |
Pulsed floating-type Langmuir probe for measurements of electron energy distribution function in plasmas; |
Ikjin Choi, Aram Kim, Hyo-Chang Lee, Dong-Hwan Kim/ Chin-Wook Chung |
|
147 |
2017.01 |
Applied Physics Letters |
110(014106) |
Evolution of electron temperature in inductively coupled plasma; |
Hyo-Chang Lee, B. H. Seo, Deuk-Chul Kwon, J.H. Seong, S.J. Oh/ Chin-Wook Chung, K.H. You, ChaeHo Shin |
|
146/font> |
2016.12 |
Plasma Sources Sci. Technol |
26(025001) |
Nonlinear circuit analysis of harmonic currents in a floationg Langmuir probe with a capacitive load; |
Kyung-Hyun Kim, Dong-Hwan Kim /Chin-Wook Chung |
|
145 |
2016.12 |
PHYSICS OF PLASMAS |
23(123508) |
Global model including multistep ionizations in helium plasmas; |
Seung-Ju Oh, Hyo-Chang Lee /Chin-Wook Chung |
|
144 |
2016.11 |
PHYSICS OF PLASMAS |
23(113504) |
Effects of antenna coil turns on plasma density and antenna voltage in solenoidal inductively coupled plasmas; |
Jun-Hyeon Moon/ Kyung-Hyun Kim, Ming-Chieh Lin /Chin-Wook Chung |
|
143 |
2016.08 |
PHYSICS OF PLASMAS |
23(083517) |
The radio-frequency fluctuation effect on the floating harmonic method; |
Jaewon Lee, Kyung-Hyun Kim, Dong-Hwan Kim /Chin-Wook Chung |
|
142 |
2016.06 |
PHYSICS OF PLASMAS |
23(063509) |
On modified finite difference method to obtain the electron energy distribution functions in Langmuir probes; |
Hyun-Ju Kang/ Hyeok Choi, Jae-Hyun Kim, Se-Hun Lee, Tae-Ho Yoo/Chin-Wook Chung |
|
141 |
2016.06 |
PHYSICS OF PLASMAS |
23(063506) |
Experimental observation of electron bounce resonance through electron energy distribution measurement in a finite size inductively coupled plasma; |
Seuli Gu/ Hyun-Ju Kang, Deuk-Chul Kwon, Yu-sin Kim, Yoon-Min Chang/Chin-Wook Chung |
|
140 |
2016.06 |
PHYSICS OF PLASMAS |
23(063507) |
Discharge dynamics and plasma density recovery by on/off switches of additional gas; |
Hyo-Chang Lee/ Deuk-Chul Kwon, SeungJu Oh, Hyun-Ju Kang, Yu-Sin Kim/Chin-Wook Chung |
|
139 |
2016.06 |
PHYSICS OF PLASMAS |
23(063504) |
Control of the floating potential using dual-frequency; |
Il-Seo Park, Dong-Hwan Kim/Chin-Wook Chung |
|
138 |
2015.12 |
REVIEW OF SCIENTIFIC INSTRUMENTS |
86(123508) |
Probe diagnostics in the far scrape-off layer plasma of Korea Superconducting Tokamak Advanced Research tokamak using a sideband harmonic method; |
Dong-Hwan Kim, Suk-Ho Hong, Il-Seo Park, Hyo-Chang Lee, Hyun-Ju Kang/Chin-Wook Chung |
|
137 |
2015.12 |
REVIEW OF SCIENTIFIC INSTRUMENTS |
86(123502) |
Real-time dielectric-film thickness measurement system for plasma processing chamber wall monitoring; |
Jin-Yong Kim/Chin-Wook Chung |
|
136 |
2015.12 |
PHYSICS OF PLASMAS |
22(123504) |
A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma; |
Young-Cheol Kim, Hyun-Jun Kim, Hyo-Chang Lee/Chin-Wook Chung |
|
135 |
2015.12 |
PHYSICS OF PLASMAS |
22(123503) |
The sheath effect on the floating harmonic method; |
Jaewon Lee, Kyung-Hyun Kim/Chin-Wook Chung |
|
134 |
2015.10 |
NATURE |
5(15254) |
Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment, and Modeling; |
Hyo-Chang Lee/Chin-Wook Chung |
|
133 |
2015.09 |
PHYSICS OF PLASMAS |
22(093517) |
Relatively high plasma density in low pressure inductive discharges; |
Hyun-Ju Kang, Yu-Sin Kim/ Chin-Wook Chung |
|
132 |
2015.08 |
PHYSICS OF PLASMAS |
22(083511) |
Non-invasive probe diagnostic method for electron temperature and ion current density in atmospheric pressure plasma jet source; |
Young-Cheol Kim, Yu-Sin Kim, Hyo-Chang Lee, Jun-Hyeon Moon/ Chin-Wook Chung, Yunjung Kim, Guangsup Cho |
|
131 |
2015.08 |
PHYSICS OF PLASMAS |
22(083512) |
Correlation between vibrational temperature of N2 and plasma parameters in inductively coupled Ar/N2 plasmas; |
Young-Cheol Kim, Hyo-Chang Lee, Yu-Sin Kim / Chin-Wook Chung |
|
130 |
2015.07 |
IEEE TRANSACTIONS ON PLAMSA SCIENCE |
43(8) |
Control of Spatial Power Deposition by Wireless Power Transfer Method Applicable to Inductively Coupled Plasma; |
Seung-Ju Oh, Hyo-Chang Lee / Chin-Wook Chung |
|
129 |
2015.07 |
PHYSICS OF PLASMAS |
22(073502) |
Experimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasma; |
Ju-Ho Kim, Young-Cheol Kim/Chin-Wook Chung |
|
128 |
2015.06 |
JOURNAL OF APPLIED PHYSICS |
117(243302) |
Pulsed plasma measurement method using harmonic analysis; |
Yu-Sin Kim/Dong-Hwan Kim, Hyo-Chang Lee/Chin-Wook Chung |
|
127 |
2015.04 |
JOURNAL OF APPLIED PHYSICS |
117(153302) |
On uniform plasma generation for the large area plasma processing in intermediate pressures; |
Hyun Jun Kim/Hye-Ju Hwang, Dong Hwan Kim, Jeong Hee Cho, Hee Sun Chae/Chin-Wook Chung |
|
126 |
2015.04 |
PHYSICS OF PLASMAS |
22(043504) |
Relationship between the discharge mode and the spatial oxygen plasma distribution in a large size ferrite inductively coupled plasmas; |
Hyun Jun Kim/Hye-Ju Hwang, Dong Hwan Kim, Jeong Hee Cho, Hee Sun Chae/Chin-Wook Chung |
|
125 |
2015.03 |
PHYSICS OF PLASMAS |
22(053505) |
Experimental verification of the Boltzmann relation at the wall in inductively coupled plasmas; |
Hyo-Chang Lee/Chin-Wook Chung |
|
124 |
2015.02 |
APPLIED PHYSICS LETTERS |
24(024001) |
Experimental verification of the Boltzmann relation at the wall in inductively coupled plasmas; |
Young-Cheol Kim, June Young Kim/ Hyo-Chang Lee, Yu-Sin Kim, Jin-Yong Kim, Sung-Won Cho/Chin-Wook Chung |
|
123 |
2015.02 |
PLASMA SOURCES SCIENCE & TECHNOLOGY |
24(024001) |
Electron heating and control of electron energy distribution for the enhancement of the plasma ashing processing; |
Hyo-Chang/ Lee Chin-Wook Chung |
|
122 |
2015.01 |
PHYSICS OF PLASMAS |
22(013501) |
Effect of the electron energy distribution on total energy loss with argon in inductively coupled plasmas; |
June Young Kim Young-Cheol Kim, Yu-Sin Kim, Chin-Wook Chung |
|
121 |
2014.12 |
Journal of Nanoscience and Nanotechnology |
21(113505) |
Thermal Compression Chip Interconnection Using Organic Solderability Preservative Etched Substrate by Plasma Processing; |
Sung-Won Cho /JoonYoung Choi/ Chin-Wook Chung |
|
120 |
2014.11 |
PHYSICS OF PLASMAS |
21(113505) |
Investigation of plasma diagnostics using a dual frequency harmonic technique; |
June Young Kim /Dong-Hwan Kim ,Ju Ho Kim ,Sang-Bum Jeon ,Sung-Won Cho/ Chin-Wook Chung |
|
119 |
2014.09 |
JOURNAL OF APPLIED PHYSICS |
116(093302) |
Investigation of plasma diagnostics using a dual frequency harmonic technique; |
Dong-Hwan Kim/ Young-Do Kim, Sung-Won Cho, Yu-Sin Kim /Chin-Wook Chung |
|
118 |
2014.09 |
PLASMA SOURCES SCIENCE & TECHNOLOGY |
23(062002) |
Control of electron energy distribution by adding a pulse inductive field in capacitive discharge; |
Hyo-Chang Lee /Chin-Wook Chung |
|
117 |
2014.08 |
IEEE TRANSACTIONS ON PLASMA SCIENCE |
42(2858-2859) |
Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas; |
Young-Cheol Kim/ Hyo-Chang Lee /Chin-Wook Chung |
|
116 |
2014.07 |
IEEE TRANSACTIONS ON PLASMA SCIENCE |
42(2766-2767) |
Enhanced Plasma Uniformity in RF Plasma With Side Multihole; |
Hyo-Chang Lee/ Chin-Wook Chung |
|
115 |
2014.07 |
SENSORS AND ACTUATORS B |
203(130-134) |
Colorimetric polydiacetylene for plasma diagnostics; |
Hyo-Chang Lee /Seongho Jeon, Jong-Man Kim /Chin-Wook Chung |
|
114 |
2013.08 |
PHYSICS OF PLASMAS |
20(033506) |
Experimental observation of the plasma potential with the screening temperature; |
June Young Kim, Dong-Hwan Kim and Chin-Wook Chung |
|
113 |
2014.02 |
PHYSICS OF PLASMAS |
20(023511) |
Investigation of the Boltzmann relation in plasmas with non-Maxwellian electron distribution; |
June Young Kim, Hyo-Chang Lee, Dong-Hwan Kim, Yu-Sin Kim, Young-cheol Kim and Chin-Wook Chung |
|
112 |
2014.02 |
PHYSICS OF PLASMAS |
21(023512) |
Measurement of sheath thickness at a floating potential; |
Hyung-Sik Han, Hyo-Chang Lee, Se-Jin Oh and Chin-Wook Chung |
|
111 |
2013.09 |
PHYSICS OF PLASMAS |
20(093508) |
A study on the maximum power transfer condition in an inductively coupled plasma using transformer circuit model; |
Young-Do Kim, Hyo-Chang Lee and Chin-Wook Chung |
|
110 |
2013.08 |
APPLIED PHYSICS LETTERS |
103(084103) |
Plasma diagnostic method using intermodulation frequencies in a Langmuir probe; |
Dong-Hwan Kim, Hyo-Chang Lee, Yu-Sin Kim and Chin-Wook Chung |
|
109 |
2013.08 |
PHYSICS OF PLASMAS |
20(101612) |
Transition of electron kinetics in weakly magnetized inductively coupled plasmas; |
Jin-Yong Kim, Hyo-Chang Lee, Young-Do Kim, Young-cheol Kim and Chin-Wook Chung |
|
108 |
2013.08 |
PHYSICS OF PLASMAS |
20(083508) |
Electron density and electron temperature measurement in a bi-Maxwellian electron distribution using a derivative method of Langmuir probes; |
Hyo-Chang Lee, Se-Youn Moon and Chin-Wook Chung |
|
107 |
2013.08 |
Plasma Sources Sci. Technol. |
22(055011) |
Effects of capacitor termination to an antenna coil on the plasma parameters in a radio frequency inductively coupled plasma; |
Duksun Han, Hyo-Chang Lee, Hyun-Jun Kim, Yu-Sin Kim, Heesun Chae and Chin-Wook Chung |
|
106 |
2013.08 |
PHYSICS OF PLASMAS |
20(101607) |
Effect of antenna size on electron kinetics in inductively coupled plasmas; |
Hyo-Chang Lee and Chin-Wook Chung |
|
105 |
2013.07 |
Meas. Sci. Technol |
24(095102) |
Wireless wafer-type probe system for measurement of two-dimensional plasma parameters and spatial uniformity; |
Jin-Yong Kim, Se-Jin Oh, Young-cheol Kim, Ik-Jin Choi and Chin-Wook Chung |
|
104 |
2013.06 |
APPLIED PHYSICS LETTERS |
102(234104) |
Discharge mode transition and hysteresis in inductively coupled plasma; |
Hyo-Chang Lee, Dong-Hwan Kim and Chin-Wook Chung |
|
103 |
2013.06 |
Thin Solid Films |
547(9-12) |
Method for measurement of transferred power to plasma in inductive discharges; |
Hye-Ju Hwang, Young-cheol Kim and Chin-Wook Chung |
|
102 |
2013.05 |
Thin Solid Films |
547(38) |
Mode transition of power dissipation and plasma parameters in an asymmetric capacitive discharge; |
Su-Jin Lee, Hyo-Chang Lee, Jin-Young Bang, SeungJu Oh and Chin-Wook Chung |
|
101 |
2013.05 |
REVIEW OF SCIENTIFIC INSTRUMENTS |
84(053505) |
Two-dimensional-spatial distribution measurement of electron temperature and plasma density in low temperature plasmas; |
Young-cheol Kim, Sung-Ho Jang, Se-Jin Oh, Hyo-Chang Lee and Chin-Wook Chung |
|
100 |
2013.05 |
Plasma Sources Sci. Technol. |
22(032002) |
Control of plasma density distribution via wireless power transfer in an inductively coupled plasma; |
Hee-Jin Lee, Hyo-Chang Lee, Young-cheol Kim and Chin-Wook Chung |
|
99 |
2013.03 |
PHYSICS OF PLASMAS |
20(033504) |
Experimental verification of the Boltzmann relation in confined plasmas : Comparison of noble and molecule gases; |
Hyo-Chang Lee, Hye-Ju Hwang, Young-Cheol Kim, June Young Kim, Dong-Hwan Kim and Chin-Wook Chung |
|
98 |
2013.02 |
PHYSICS OF PLASMAS |
20(023505) |
Spatial measurements of electron energy distribution and plasma parameters in a weakly magnetized inductive discharge; |
Young-Do Kim, Young-Kwang Lee, Hyo-Chang Lee, and Chin-Wook Chung |
|
97 |
2013.01 |
Japanese Journal of Applied Physics |
52(01AA01) |
Plasma Characteristics Depending on power Feeding Method in an inductively Coupled Plasma; |
Hyun-Jun Kim, Young-cheol Kim and Chin-Wook Chung |
|
96 |
2013.01 |
CURRENT APPLIED PHYSICS |
13(76-79) |
Real time feedback control of plasma density using a floating probe in semiconductor processing; |
Sung-Ho Jang, Se-Jin Oh, Young-Kwang Lee, Chin-Wook Chung |
|
95 |
2012.12 |
Thin Solid Films |
521(185-188) |
Comparisons of the electrical characteristics by impedance matching conditions on the E-H and H-E transition and the hysteresis of inductively coupled plasma; |
Hyo-Chang Lee and Chin-Wook Chung |
|
94 |
2012.12 |
APPLIED PHYSICS LETTERS |
101(244104) |
Collisionless electron heating by radio frequency bias in low gas pressure inductive discharge; |
Hyo-Chang Lee and Chin-Wook Chung |
|
93 |
2012.05 |
JOURNAL OF APPLIED PHYSICS |
111(093301) |
Effect of adding small amount of inductive fields to O2, Ar/O2 capacitively coupled plasmas; |
Min-Hyong Lee, Hyo-Chang Lee, and Chin-Wook Chung |
|
92 |
2012.05 |
Microwave Workshop Series on Innovative Wireless Power Transmission: Technologies, Systems, and Applications (IMWS), 2012 IEEE MTT-S International |
(183-186) |
Electromagnetically coupled resonators using toroidal ferrite core for wireless power transfer; |
Hee-Jin Lee, Jin-Young Bang and Chin-Wook Chung |
|
91 |
2012.04 |
MEASUREMENT SCIENCE AND TECHNOLOGY |
23(085001) |
Double probe diagnostics based on harmonic current detection for electron temperature and electropositive ion flux measurement in RF plasmas; |
Se-Jin Oh, Ik-Jin Choi, Jin-Yong Kim and Chin-Wook Chung |
|
90 |
2012.04 |
APPLIED PHYSICS LETTERS |
100(164107) |
Effect of helium on spatial plasma parameters in low pressure argon-helium plasma; |
Jin-Young Bang, Duksun Han, Sung-Won Cho, and Chin-Wook Chung |
|
89 |
2012.04 |
PHYSICS OF PLASMAS |
19(043505) |
Variation of the electron energy distribution with He dilution in an inductively coupled argon discharge; |
Hyo-Chang Lee and Chin-Wook Chung |
|
88 |
2012.04 |
ѱ ȸ |
21 (3ȣ pp121-129) |
ö ö ΰ ; |
ȿâ, |
|
86 |
2012.03 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
21(035003) |
Experimental observation of the skin effect on plasma uniformity in inductively coupled plasmas with a radio frequency bias; |
Hyo-Chang Lee, SeungJu Oh and Chin-Wook Chung |
|
86 |
2012.03 |
PHYSICS OF PLASMAS |
19(033514) |
Experimental measurements of spatial plasma potentials and electron energy distributions in inductively coupled plasma under weakly collisional and nonlocal electron kinetic regimes; |
Hyo-Chang Lee and Chin-Wook Chung |
|
85 |
2012.02 |
JOURNAL OF APPLIED PHYSICS |
111(043305) |
Real-time observation of the capacitance variation in a surface dielectric layer in radio frequency discharge; |
Jin-Young Bang, Kyoung Yoo, and Chin-Wook Chung |
|
84 |
2012.01 |
REVIEW OF SCIENTIFIC INSTRUMENTS |
83(013503) |
Electrical test method using high density plasmas for high-end printed circuit boards; |
Se-Jin Oh, Young-Cheol Kim, Chin-Wook Chung |
|
83 |
2011.11 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
20(065005) |
A plasma diagnostic technique using a floating probe for the dielectric deposition process; |
Jin-Young Bang, Kyoung-Yoo, Dong-Hwan Kim, Chin-Wook Chung |
|
82 |
2011.10 |
PHYSICS OF PLASMAS |
18(103511) |
Sheath capacitatnce of a planar probe; |
Se-Jin Oh, Young-Kwnag Lee, Chin-Wook Chung |
|
81 |
2011.09 |
Current Applied Physics |
11(S149) |
E-H mode transition in inductively coupled plasma using Ar, O2, N2, andmixture gas; |
Jung-Kyu Lee, Hyo-Chang Lee, Chin-Wook Chung |
|
80 |
2011.08 |
Thin Solid Films |
519(7009) |
Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma; |
Hyo-Chang Lee, Jin-Young Bang, Chin-Wook Chung |
|
79 |
2011.08 |
Thin Solid Films |
519(7042) |
Harmonic analysis of sideband signals generated in plasmas; |
Sung-Ho Jang, Gun-Ho Kim, Chin-Wook Chung |
|
78 |
2011.07 |
PHYSICS OF PLASMAS |
18(073507) |
Electron energy flux control using dual power in side-type inductively coupled plasma; |
Jin-Young Bang, Jin-Yong Kim, Chin-Wook Chung |
|
77 |
2011.06 |
JOURNAL OF PHYSICS D: APPLIED PHYSICS |
44(285203) |
Determination of metastable level densities in a low-pressure inductively coupled argon plasma by the line-ratio method of optical emission spectroscopy; |
Young-Kwang Lee, Se-Youn Moon, Se-Jin Oh, Chin-Wook Chung |
|
76 |
2011.05 |
IEEE TRANSACTIONS ON PLASMA SCIENCE |
99(05762370) |
Evolution of two-dimensional plasma density on the E–H heating-mode transition in planar-type inductively coupled plasma; |
Hyo-Chang Lee, Young-Cheol Kim, Chin-Wook Chung |
|
75 |
2011.05 |
IEEE TRANSACTIONS ON PLASMA SCIENCE |
99(05762360) |
Development of ferrite-enhanced side-type inductively coupled plasma; |
Jin-Young Bang, Chin-Wook Chung |
|
74 |
2011.03 |
PHYSICS OF PLASMAS |
18(033508) |
Characteristics of probe current harmonics based on various applied voltage waveforms in low temperature plasmas; |
Young-Do Kim, Yu-Sin Kim, Hyo-Chang Lee, Jin-Young Bang, Chin-Wook Chung |
|
73 |
2011.02 |
PHYSICS OF PLASMAS |
18(023501) |
Observation of pressure gradient and related flow rate effect on the plasma parameters in plasma processing reactor; |
Hyo-Chang Lee, Aram Kim, Se-Youn Moon, Chin-Wook Chung |
|
72 |
2011.02 |
REVIEW OF SCIENTIFIC INSTRUMENTS |
82(026107) |
Interpolation for evaluation of a two-dimensional spatial profile of plasma densities at low gas pressures; |
Se-Jin Oh, Young-Cheol Kim, Chin-Wook Chung |
|
71 |
2011.01 |
JOURNAL OF APPLIED PHYSICS |
109(013312) |
Correlation between nanoparticle and plasma parameters with particle growth in dusty plasmas; |
K.B. Chai, C.R. Seon, C.W. Chung, N.S. Yoon, W.H. Choe |
|
70 |
2011.01 |
JOURNAL OF APPLIED PHYSICS |
109(013306) |
Ionization in inductively coupled argon plasmas studied by optical emission spectroscopy; |
Young-Kwang Lee, Chin-Wook Chung |
|
69 |
2011.01 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
20(015005) |
Measurements of the total energy lost per electron–ion pair lost in low-pressure inductive argon, helium, oxygen and nitrogen discharge; |
Young-Kwang Lee, Ju-Hwan Ku, Chin-Wook Chung |
|
68 |
2010.12 |
PHYSICS OF PLASMAS |
17(123506) |
A numerical method for determining highly precise electron energy distribution functions from Langmuir probe characteristics; |
Jin-Young Bang, Chin-Wook Chung |
|
67 |
2010.11 |
APPLIED PHYSICS LETTERS |
97(201503) |
Role of hydrogen in evolution of plasma parameters and dust growth in capacitively coupled dusty plasmas; |
K.B. Chai, W.H. Choe, C.R. Seon, C.W. Chung |
|
66 |
2010.11 |
Journal of the Electrochemical Society |
158(H21) |
Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films; |
H.C. Kim, S.H. Woo, J.S. Lee, Y.C. Kim, H.R.Lee, I.J.Choi, Y.D.Kim, C.W. Chung, H.T. Jeon |
|
65 |
2010.09 |
REVIEW OF SCIENTIFIC INSTRUMENTS |
81(093501) |
Radio frequency-compensated Langmuir probe with auxiliary double probes; |
Se-Jin Oh, Seung-Ju Oh, Chin-Wook Chung |
|
64 |
2010.08 |
Proceedings of 10th IEEE Conference on Nanotechnology (IEEE-NANO) |
10(1049) |
Inductively coupled RF heating of nano-particle for non-invasive and selective cancer cell destruction; |
Hyo-Chang Lee, Jung-Kyu Lee, Seung-Ju Oh, Chin-Wook Chung |
|
63 |
2010.07 |
PHYSICS OF PLASMAS |
17(073504) |
Experimental investigation of edge-to-center density ratio in inductively coupled plasmas; |
Gun-Ho Kim, Hyo-Chang Lee, Chin-Wook Chung |
|
62 |
2010.06 |
PHYSICS OF PLASMAS |
17(064502) |
Improved measurement method for electron energy distribution functions with high accuracy and reliability; |
Jin-Young Bang, Aram Kim, Chin-Wook Chung |
|
61 |
2010.06 |
PHYSICS OF PLASMAS |
17(063501) |
Measurement of electron temperature and ion density using the self-bias effect in plasmas; |
Kwang-Tae Hwang, Se-Jin Oh, Ik-Jin Choi, Chin-Wook Chung |
|
60 |
2010.05 |
JOURNAL OF APPLIED PHYSICS |
107(103312) |
Floating harmonics method for measuring electron temperature in non-Maxwellian plasmas; |
Jin Young Bang, ARam Kim, Chin Wook Chung |
|
59 |
2010.05 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
19(034013) |
Transient effects caused by pulsed gas and liquid injections into low pressure plasmas; |
D. Ogawa, C.W. Chung, M. Goeckner, L. Overzet |
|
58 |
2010.05 |
REVIEW OF SCIENTIFIC INSTRUMENTS |
81(053503) |
New interpolation algorithm for evaluation a spatial profile of plasma densities in radio frequency discharges; |
Se-Jin Oh, Sung-Ho Jang, Young-Cheol Kim, Chin-Wook Chung |
|
57 |
2010.04 |
PHYSICS OF PLASMAS |
17(043508) |
Measurement of the total energy losses per electron-ion lost in various mixed gas inductively coupled plasmas; |
Ju-Hwan Ku, Young-Kwang Lee, Chin-Wook Chung |
|
56 |
2010.04 |
PHYSICAL REVIEW E |
81(046402) |
Comparison of pressure dependence of electron energy distributions in oxygen capacitively and inductively coupled plasmas; |
Min-Hyong Lee, Hyo-Chang Lee, Chin-Wook Chung |
|
55 |
2010.04 |
Thin Solid Films |
518(5219) |
Impedance transition and series resonance between bulk plasma and sheath in biased inductively coupled plasma; |
Hyo-Chang Lee, Chin-Wook Chung |
|
54 |
2010.03 |
PHYSICS OF PLASMAS |
17(033506) |
Evolution of the electron energy distribution and E-H mode transition in inductively coupled nitrogen plasma; |
Hyo-Chang Lee, Jung-Kyu Lee, Chin-Wook Chung |
|
53 |
2010.02 |
APPLIED PHYSICS LETTERS |
96(071501) |
Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma; |
Hyo-Chang Lee, Min-Hyong Lee, Chin-Wook Chung |
|
52 |
2010.01 |
APPLIED PHYSICS LETTERS |
96(041503) |
Experimental observation of the transition from nonlocal to local electron kinetics in inductively coupled plasmas; |
Hyo-Chang Lee, Min-Hyong Lee, Chin-Wook Chung |
|
51 |
2010.01 |
JOURNAL OF APPLIED PHYSICS |
107(023303) |
In situ method for real time measurement of dielectric film thickness in plasmas; |
Sung-Ho Jang, Gun-Ho Kim, Chin-Wook Chung |
|
50 |
2010.01 |
PHYSICS OF PLASMAS |
17(013501) |
Low energy electron heating and evolution of the electron energy distribution by diluted O; |
Hyo-Chang Lee, Min-Hyong Lee, Chin-Wook Chung |
|
49 |
2009.11 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
19(015011) |
Observation of inverse hysteresis in the E to H mode transitions in inductively coupled plasmas; |
Min-Hyong Lee, Chin-Wook Chung |
|
48 |
2009.11 |
Journal of the Korean Physical Society |
55(1869) |
Langmuir Probe Perturbation in Inductively Coupled Plasmas; |
Sung-Ho Jang, Min-Hyong Lee, Chin-Wook Chung |
|
47 |
2009.09 |
PHYSICS OF PLASMAS |
16(093502) |
Experimental investigation of the Boltzmann relation for a bi-Maxwellian distribution in inductively coupled plasmas; |
Jin-Young Bang, Chin-Wook Chung |
|
46 |
2009.09 |
APPLIED PHYSICS LETTERS |
95(111501) |
Experimental measurement of the total energy losses in a low pressure inductively coupled argon plasma; |
Young-Kwang Lee, Min-HyongLee, Chin-Wook Chung |
|
45 |
2009.06 |
PHYSICS OF PLASMAS |
16(063506) |
Electron temperature control by an external magnetic field in solenoidal inductive discharge; |
Min-Hyong Lee, Ju-Hwan Ku, Kwang-Tae Hwang, Chin-Wook Chung |
|
44 |
2008.12 |
APPLIED PHYSICS LETTERS |
93(231503) |
Observationof collisionless heating of low energy electrons in low pressure inductively coupled argon plasmas; |
Min-Hyong Lee, Hyo-Chang Lee, Chin-Wook Chung |
|
43 |
2008.12 |
JOURNAL OF APPLIED PHYSICS |
104(113303) |
Evolution of an electron energy distribution function in a weak dc magnetic field in solenoidal inductive plasma; |
Min-Hyong Lee, Seong-Wook Choi |
|
42 |
2008.10 |
APPLIED PHYSICS LETTERS |
93(151503) |
Observation of the inductive to helicon mode transtion in a weakly magnetized solenoidal inductive discharge; |
Min-Hyong Lee, Chin-Wook Chung |
|
41 |
2008.06 |
Journal of the Korean Physical Society |
52(1792) |
Spectroscopic Measurement of the Electron Temperature and the Metastable Densities by Using a Simple Colisional-Radiative Model in a Low-Pressure Inductively-Coupled Argon Plasma; |
Young-Kwang Lee, Kwang-Tae Hwang, Min-Hyong Lee, Chin-Wook Chung |
|
40 |
2008.01 |
PLASMA SOURCES SCIENCE AND TECHNOLOGY |
17(015014) |
Characterization of a side-type ferrite inductively coupled plasma source for large scale processing; |
K.H. Lee, Y.K. Lee, S.W. Jo, C.W. Chung, V. Godyak |
|
39 |
2007.12 |
APPLIED PHYSICS LETTERS |
91(221505) |
Non-invasive method to measure ion flux in capacitive discharge; |
Min-Hyong Lee, Hyo-Chang Lee, Chin-Wook Chung |
|
38 |
2007.10 |
PHYSICS OF PLASMAS |
14(103507) |
Plasma characteristics in a solenoidal inductive/capacitive discharge under a weak dc magnetic field; |
Min-Hyong Lee, Chin-Wook Chung |
|
37 |
2007.10 |
Journal of the Korean Physical Society |
51(1307) |
New Method to Measure the Electron Temperature and the Plasma Density in a Single-Frequency Capacitive Discharge; |
Min-Hyong Lee, Ik-Jin Choe, Chin-Wook Chung |
|
36 |
2007.07 |
|
55(28) |
Ʈ ö Ư ; |
̰ ȿ, ̿ , ̿ , , |
|
35 |
2007.06 |
ݵ ü ÷ ȸ |
6(1) |
400 kHz Ʈ ö Ǵ Ī Ʈ ũ; |
, , ̿ , |
|
34 |
2007.05 |
Microelectronic Engineering |
85(300) |
Etching characteristics of photoresist and low-k dielectrics by Ar/O; |
H.W. Kim, J.W. Lee, W.S. Hwang, B.H. O, S.G. Lee, S.G. Park J.H. Kim, D.J. Chung, S.P. Chang, Y.C. Joo, J.H. Joo, C.W. Chung, W.J. Park, C.J. Kang, S.H. Joo, S.O. Park, K.H. Kim, J.Y. Jang |
|
33 |
2007.05 |
APPLIED PHYSICS LETTERS |
90(191502) |
On the hysteresis in E to H and H to E transitions and the multistep ionization in inductively coupled plasma; |
Min-Hyong Lee, Kyeong-Hyo Lee, Dong-Seok Hyun, Chin-Wook Chung |
|
32 |
2007.02 |
JOURNAL OF APPLIED PHYSICS |
101(033305) |
Floating probe for electron temperature and ion density measurement applicable to processing plasmas; |
Min-Hyong Lee, Sung-Ho Jang, Chin-Wook Chung |
|
31 |
2006.10 |
Journal of the Korean Physical Society |
49(1687) |
Comparison of plasma densities measured by electrical probes to those measured by microwave probes in inductively coupled plasmas; |
Won-Ki Kim, Min-Hyong Lee, Chin-Wook Chung |
|
30 |
2006.10 |
Japanese Journal of Applied Physics |
45(8035) |
Distributed Ferromagnetic Inductively Coupled Plasma as an Alternative Plasma Processing Tool; |
Valery Godyak, Chin-Wook Chung |
|
29 |
2006.06 |
PHYSICS OF PLASMAS |
13(063510) |
On the E to H and H to E transition mechanisms in inductively coupled plasma; |
Min-Hyong Lee, Chin-Wook Chung |
|
28 |
2006.05 |
JOURNAL OF MATERIALS SCIENCE |
41(5040) |
Photoresist ashing technology using N; |
H.W. Kim, J.H. Myung, J.W. Lee, H.S. Kim, K.H. Kim, J.Y. Jang, T.H. Yoon, S.K. Kim, D.K. Choi, C.W. Chung, G.Y. Yeom, J.M. Myoung, H.J. Kim |
|
27 |
2006.05 |
PHYSICS OF PLASMAS |
13(053502) |
On the multistep ionizations in an argon inductively coupled plasma; |
Min-Hyong Lee, Sung-Ho Jang, Chin-Wook Chung |
|
26 |
2005.12 |
PHYSICS OF PLASMAS |
12(123505) |
Experimental investigation on the floating potential of cylindrical Langmuir probes in non-Maxwellian electron distributions; |
Chin-Wook Chung |
|
25 |
2005.09 |
APPLIED PHYSICS LETTERS |
87(131502) |
Effect of multistep ionizations on the electron temperature in an argon inductively coupled plasma; |
Min-Hyong Lee, Chin-Wook Chung |
|
24 |
2005.09 |
Thin Solid Films |
506(222) |
Study of ashing for low-k dielectrics using the N ferrite-core inductively coupled plasmas; |
H.W. Kim, J.H. Myung, N.H. Kim, H.S. Lee, S.G. Park, J.G. Lee, C.W. Chung, W.J. Park, C.J. Kang, C.G. Yoo, K.H. Ko, J.H. Woo, S.D. Choi, D.K. Choi |
|
23 |
2005.08 |
Surface Engineering, Surface Instrumetation & Vacuum Technology |
80(193) |
Photoresist ashing in nitrogen gas using ferrite core inductively coupled plasmas; |
H.W. Kim, J.H Myung, N.H. Kim, C.W. Chung, W.J. Park, C.J. Kang, C.G. Yoo, D.K. Choi |
|
22 |
2005.08 |
|
51(158) |
ϵ 300mm ö ; |
̿ , , , ̿ |
|
21 |
2005.06 |
PHYSICS OF PLASMAS |
12(063502) |
Characterization of pulsed plasma in unbalanced magnetron argon discharge; |
S. W. Lee, S. H. Seo, J. H. In, C. W. Chung |
|
20 |
2005.06 |
PHYSICS OF PLASMAS |
12(073501) |
Self-consistent global model with multi-step ionizations in inductively coupled plasmas; |
Min-Hyong Lee, Chin-Wook Chung |
|
19 |
2005.07 |
APPLIED PHYSICS LETTERS |
87(041501) |
Feature of electron energy distribution in a low-pressure capacitive discharge; |
S. J. You, C. W. Chung, H. Y. Chang |
|
18 |
2005.06 |
|
50(410) |
ö ͳ ̿ ̿ ̿ 뷮 ; |
, , |
|
17 |
2005.05 |
|
50(329) |
ö Žħ ũ Žħ ̿ е ; |
, , , ſ , ȭ |
|
16 |
2005.02 |
Japanese Journal of Applied Physics |
44(1081) |
Development of a dual inductively coupled plasma for direct and remote plasma generation in a reactor; |
Sae-Hoon Uhm, Kyung-Ho Lee, Hong- Young Chang, Chin-Wook Chung |
|
15 |
2004.12 |
JOURNAL OF MATERIALS SCIENCE |
40(3543) |
Application of N/Ar inductively coupled plasma to the photoresist ashing for low-k dielectrics; |
H.W. Kim, J.H. Myung, N.H. Kim, C.G. Yoo, K.W. Suh, S.K. Kim, D.K. Choi, C.W. Chung, C.J. Kang, W.J. Park, S.G. Park, J.G. Lee |
|
14 |
2004.09 |
PHYSICS OF PLASMAS |
11(4830) |
On a dual inductively coupled plasma for direct and remote plasma in a reacto; |
Sae-Hoon Uhm, Kyong-Ho Lee, Hong- Young Chang, Chin-Wook Chung |
|
13 |
2004.01 |
PHYSICAL REVIEW E |
69(016406) |
Experimental measurement of the electron energy distribution function in the radio frequency electron cyclotron resonance inductive discharge; |
Chin-Wook Chung, S. S. Kim, H. Y. Chang |
|
12 |
2003.12 |
JOURNAL OF APPLIED PHYSICS |
94(7422) |
Mode transition for power dissipation induced by driving frequency in capacitively coupled plasma; |
S.J. You, H.C. Kim, C.W. Chung, H.Y. Chang, J.K. Lee |
|
11 |
2003.07 |
Thin Solid Films |
435(72) |
Theoretical investigation of the evolution of electron energy distribution functions in inductively coupled discharges; |
S.S. Kim, Chin-Wook Chung, H.Y. Chang |
|
10 |
2003.06 |
Surface and Coatings Technology |
169-170(20) |
On inductively coupled plasmas for next-generation processing; |
Y.K. Lee , D.S. Lee , K.H. Bai, C.W. Chung, H.Y. Chang |
|
9 |
2002.07 |
APPLIED PHYSICS LETTERS |
81(2529) |
Power dissipation mode transition by a magnetic field; |
S. J. You, C.W. Chung, K.H. Bai, H.Y. Chang |
|
8 |
2002.02 |
PHYSICAL REVIEW LETTERS |
88(095002) |
Electron Cyclotron Resonance in aWeakly Magnetized Radio-Frequency Inductive Discharge; |
Chin-Wook Chung, S.S. Kim, H.Y. Chang |
|
7 |
2002.01 |
APPLIED PHYSICS LETTERS |
80(1725) |
Heating-mode transition in the capacitive mode of inductively coupled plasmas; |
Chin-Wook Chung, Hong-Young Chang |
|
6 |
2001.04 |
PHYSICS OF PLASMAS |
8(3498) |
Pressure and helium mixing effects on plasma parameters in temperature control using a grid system; |
K.H. Bai, J.I. Hong, C.W. Chung, S.S. Kim, H.Y. Chang |
|
5 |
2001.02 |
PHYSICS OF PLASMAS |
8(2992) |
The electron bounce resonance in a low-pressure solenoidal inductive discharge; |
C.W. Chung, K.I. You, S.H. Seo, S.S. Kim, H.Y. Chang |
|
4 |
2000.09 |
Surface and Coatings Technology |
131(1) |
Review of heating mechanism in inductively coupled plasma; |
Sang-Hun Seo, Chin-Wook Chung, Hong-Young Chang |
|
3 |
2000.06 |
PHYSICS OF PLASMAS |
7(3826) |
The nonlocal and local property of the electron energy distribution function in a low-pressure inductively coupled plasma; |
Chin-Wook Chung, Hong-Young Chang |
|
2 |
2000.05 |
PHYSICS OF PLASMAS |
7(3584) |
The radio frequency magnetic field effect on electron heating in a low frequency inductively coupled plasma; |
Chin-Wook Chung, Sang-Hun Seo, Hong-Young Chang |
|
1 |
2000.04 |
JOURNAL OF APPLIED PHYSICS |
88(1181) |
The finite size effect in a planar inductively coupled plasma; |
C.W. Chung, S.S. Kim, S.H. Seo, H.Y. Chang, N.S. Yoon |
|
0 |
2000.02 |
PHYSICAL REVIEW E |
62(7155) |
Nonlocal electron kinetics in a planar inductive helium discharge; |
Sang-Hun Seo, Chin-Wook Chung, Jung-In Hong, Hong-Young Chang |
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