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¹® È£ ÁØ (¹Ú»ç)
»ï¼ºÀüÀÚ ¹ÝµµÃ¼¿¬±¸¼Ò
2025.02 Á¹¾÷
hj920721@naver.com
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Studies of high density plasma generation via electrode impedance control in capacitively coupled plasmas
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Á¤ Áö ¿ø (¹Ú»ç)
»ï¼ºÀüÀÚ ¹ÝµµÃ¼¿¬±¸¼Ò
2025.02 Á¹¾÷
meatball@hanyang.ac.kr
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Studies on electron beam-assisted etching in inductively coupled plasma via DC biased grid
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±è µ¿ ¹Î (¼®»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2025.02 Á¹¾÷
koo05171@naver.com
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A study on electron temperature measurement using floating harmonic method in ultra low electron temperature plasma
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¹è ÁØ ÀÏ (¼®»ç)
SEMES
2025.02 Á¹¾÷
wns8354@hanyang.ac.kr
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Electron beam energy distribution in a pulsed-inductively discharge with DC-biased grids
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ÃÖ Á¤ Àº (¼®»ç)
SEMES
2025.02 Á¹¾÷
dmschl103@gmail.com
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The Effects of Pressure and Gas Mixture Ratios on Ultra Low Electron Temperature Plasma Containing Molecular Gases
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ÀÌ ¿µ ±Ô (¼®»ç)
SEMES
2025.02 Á¹¾÷
lyg6813@gmail.com
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A study on the Validity of Power Transfer Efficiency Measurement Method in an Inductively Coupled Plasma
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ÇÑ ½Â ö (¼®»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸® »ç¾÷ºÎ
2025.02 Á¹¾÷
onedayx2@naver.com
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Improvement of photoresist ashing efficiency in inductively coupled plasma using electron beam focusing with an arch- shaped grid
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±è °¡ ¾Ö (¼®»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸® »ç¾÷ºÎ
2025.02 Á¹¾÷
gaae3233@naver.com
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A study on the generation and etching characteristics of ion beam and electron beam via a grid system in inductively coupled plasma
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¾î Çö µ¿ (¹Ú»ç)
SEMES
2024.08 Á¹¾÷
uhd86@hanyang.ac.kr
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A study of electric probes using the self-bias effect and asymmetric floating harmonic double probes for the diagnostic and monitoring of plasma processes
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ÇÏ ¿ì (¹Ú»ç)
PSR Technology
2024.08 Á¹¾÷
heyou715@gmail.com
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A study of the effect of inhomogeneous DC magnetic field in inductively coupled plasma for semiconductor processing
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ÀÌ È£ ¿ø (¹Ú»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸® »ç¾÷ºÎ
2024.02 Á¹¾÷
leeho448@naver.com
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A Study on the effect of RF bias on plasma density and measurement of ion energy distribution in RF biased inductively coupled plasma
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¼Õ Áø ¿õ (¼®»ç)
¿øÀÍ IPS
2024.02 Á¹¾÷
sjinw0512@naver.com
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A method for measuring individual ion density in an Ar/He mixture inductively coupled plasma using two types of Langmuir probes
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¾È ¼¼ ÈÆ (¼®»ç)
SEMES
2024.02 Á¹¾÷
ansee17@daum.net
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Plasma density distribution control in planar helical resonator source
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° ±æ È£ (¼®»ç)
»ï¼ºÀüÀÚ ¹ÝµµÃ¼¿¬±¸¼Ò
2024.02 Á¹¾÷
ggh0505@naver.com
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Control of spatical plasma density distribution using parallel and series resonance in an inductively coupled plasma
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ÀÓ ¿µ ¹Î (¹Ú»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2023.02 Á¹¾÷
dlaekfhd12@hanyang.ac.kr
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A study on the improvement of plasma generation of the capacitively ciupled plasmas and inductively coupled plasma by the parallel resonance
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È« ¿µ ÈÆ (¹Ú»ç)
SEMES
2023.02 Á¹¾÷
hyh4736@gmail.com
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Experimental investigation on the effect of collisional energy loss in inductively coupled plasma
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Ȳ Å ¿õ (¼®»ç)
»ï¼ºÀüÀÚ ¹ÝµµÃ¼¿¬±¸¼Ò
2023.02 Á¹¾÷
qaws4821@naver.com
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A study on the measurement of plasma distribution by double probes with asymmetric area
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±è °ü ¿ë (¹Ú»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸®»ç¾÷ºÎ
2022.08 Á¹¾÷
kky5958@naver.com
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A study on a hybrid plasma source combined
of inductively coupled and capacitively coupled
plasma sources
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Àü »ó ¹ü (¹Ú»ç)
SEMES
2022.08 Á¹¾÷
jkjk1203@hanmail.net
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A study on rf circuit graphical analysis for impedance matching and electrical probes
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±è Å ¿ì (¹Ú»ç)
»ï¼ºÀüÀÚ ¼³ºñ±â¼ú¿¬±¸¼Ò
2022.02 Á¹¾÷
worldcorn2002@nate.com
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A study on plasma density profile control using virtual ground position and magnetic resonance wireless power transfer in inductively coupled plasma
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ÀÌ ¹« ¿µ (¹Ú»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2022.02 Á¹¾÷
dlandud06@naver.com
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Studies on electrical diagnostic methods for measurement of plasma parameters and dielectric film thickness in deposition plasmas
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À¯ °æ ȯ (¼®»ç)
SEMES
2022.02 Á¹¾÷
meo94@naver.com
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Ashing rate prediction model through real-time plasma measurement
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ÀÌ ¹« Çö (¼®»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2022.02 Á¹¾÷
moohyun619@gmail.com
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A Study on the measurement of individual ion density using floating harmonics probe in two ion species plasmas
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ÀÌ ÁØ È£ (¼®»ç)
SEMES
2022.02 Á¹¾÷
zeizonejunho@naver.com
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Improvement of power transfer efficiency using a parallel resonance in a 60 MHz capacitively plasma
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ÃÖ Àç ÈÆ (¼®»ç)
¿øÀÍ IPS
2022.02 Á¹¾÷
hoone14@naver.com
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A Study on the Wireless Asymmetric Langmuir Probe for Plasma Measurement
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ÀÌ Çö Áß (¼®»ç)
ASML korea
2022.02 Á¹¾÷
guswndwls@gmail.com
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RF distortion effect by the inductive load on the floating harmonic method
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Àå ¾Ö ¼± (¹Ú»ç)
SEMES
2021.08 Á¹¾÷
lemonzzhang@hotmail.com
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Studies on the characteristics of oxygen plasma by measuring negative ion density and floating potential distributions
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Ȳ Àç ±¸ (¼®»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2021.02 Á¹¾÷
jaegu430@naver.com
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RF distortion effect by the inductive load on the floating harmonic method
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ÀÌ ³ª ¿¬ (¼®»ç)
SEMES
2021.2 Á¹¾÷
tkfkdckwrl1@naver.com
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Correlation of electrical characteristics and plasma parameters measured at RF-biased electrodes
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±è °æ Çö (¹Ú»ç)
»ï¼ºÀüÀÚ »ý»ê±â¼ú¿¬±¸¼Ò
2020.8 Á¹¾÷
megatonp@dreamwiz.com
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Analysis of inductively coupled plasmas through measuring electron energy distribution functions for gas decompositio
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±è ÁÖ È£ (¹Ú»ç)
¹Ú»ç ÈÄ °úÁ¤
2020.2 Á¹¾÷
electrickjh@gamil.com
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A study on high efficiency plasma generation in inductively coupled plasmas with a resonant antenna coil
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¹® ÁØ Çö (¹Ú»ç)
»ï¼ºÀüÀÚ ¹ÝµµÃ¼¿¬±¸¼Ò
2020.2 Á¹¾÷
cmdoor@hanyang.ac.kr
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Studies on E - H mode transition and its hysteresis with coil current reduction in inductively coupled plasmas
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¼ Á¾ ÀÎ (¼®»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2020.2 Á¹¾÷
jongin904@naver.com
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Modified floating harmonic method by analyzing harmonic currents of a DC blocking capacitor
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±è ¹ü ¼® (¼®»ç)
P S K
2020.2 Á¹¾÷
zxzx0372@naver.com
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Measurements of electron energy probability function in 2 MHz and 13.56 MHz dual frequency capacitively coupled argon plasma
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¹Ú Áö ȯ (¹Ú»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2019.2 Á¹¾÷
starc86@gmail.com
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Frequency-domain nonlinear acoustic echo reduction techniques using single-channel and multi-channel microphones
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¹Ú ÀÏ ¼ (¹Ú»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸®»ç¾÷ºÎ
2019.2 Á¹¾÷
ilseo876@naver.com
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Analysis of characteristics of inductively coupled plasmas using two-dimensional simultaneous plasma diagnostics
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ÀÌ ·¡ ÀÏ (¹Ú»ç)
Tokyo Electron Korea
2019.2 Á¹¾÷
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A study of multi-layer deposition process control using RF/Plasma monitoring technologies for 3D device fabrication process
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¹Ú ±Ù È« (¼®»ç)
LG µð½ºÇ÷¹ÀÌ
2019.2 Á¹¾÷
pak926@nate.com
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The effect of step ionizations on the high energy electron temperature in inductively coupled plasma
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¹é ¼¼ ¿ (¼®»ç)
»ï¼ºÀüÀÚ Foundry»ç¾÷ºÎ
2019.2 Á¹¾÷
back130@naver.com
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The characteristics of remote plasma source in low pressure inductively coupled plamsas
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° Çö ÁÖ (¹Ú»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸®»ç¾÷ºÎ
2018.2 Á¹¾÷
khj2605@naver.com
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Studies on the collisionless heating in low pressure inductively coupled plasmas
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±è µ¿ ȯ (¹Ú»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2017.2 Á¹¾÷
realdh@hotmail.com
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Studies on high temporal resolution probe diagnostic methods for rapidly changing plasmas
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ÀÌ Àç ¿ø (¹Ú»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2017.2 Á¹¾÷
nufrancis@hanyang.ac.kr
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Studies on effect of remote plasma on an in-tandem main inductively coupled discharge
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¿À ½Â ÁÖ (¹Ú»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸®»ç¾÷ºÎ
2017.2 Á¹¾÷
kaisj@hanmail.net
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Studies on global model with multistep ionizations in helium plasma
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±è Çö ÁØ (¹Ú»ç)
Applied Materials (º»»ç)
2016.8 Á¹¾÷
kimhj1833@nate.com
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Studies on discharge characteristics of the ferrite inductive coupled plasma for large area plasma processing
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Àå À± ¹Î (¼®»ç)
LGÀüÀÚ »ý»ê±â¼ú¿ø
2016.8 Á¹¾÷
cynjack@naver.com
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Tunable external RF choke filter design for single Langmuir probe in RF discharges
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±è Áø ¿ë (¹Ú»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸®»ç¾÷ºÎ
2016.2 Á¹¾÷
kimjy011@nate.com
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Studies on diagnostics of two dimensional plasma distribution and chamber wall-deposition deielectric film thickness for plasma process
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±è À¯ ½Å (¹Ú»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸®»ç¾÷ºÎ
2016.2 Á¹¾÷
lovehan9@hotmail.com
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Studies on fast plasma diagnostics and negative ion flux distribution measurement using harmonic analysis
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±¸ ½½ ÀÌ (¼®»ç)
SK ÇÏÀ̴нº
2016.2 Á¹¾÷
goooseul@naver.com
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Investing on electron bounce resonance heating at carious chamber height in a low pressure inductively coupled plasma
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Ȳ ö ¹Î (¼®»ç)
Applied Materials Korea
2016.2 Á¹¾÷
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Study on damage-free isotropic radical etch with high selectivity using dry plasma High selective etch on Dummy poly removal
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±è ¿µ ö (¹Ú»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2015.8 Á¹¾÷
saladin072@hanmail.net
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A study on two-dimensional plasma diagnostics and analysis of discharge characteristics for plasma processing
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±è ¿µ µµ (¹Ú»ç)
»ï¼ºÀüÀÚ »ý»ê±â¼ú¿¬±¸¼Ò
2014.8 Á¹¾÷
1984jedi@hanmail.net
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A study on plasma diasnostics and characteristics of inductive discharge for plasma processing
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ÃÖ ÀÍ Áø (¹Ú»ç)
¿øÀÍIPS
2014.8 Á¹¾÷
gnsman@nate.com
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Studies on floating Langmuir probe methods to measure plasma parameters at various plasma conditions
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Ȳ Çý ÁÖ (¼®»ç)
¿øÀÍIPS
2013.8 Á¹¾÷
gpwn1219@naver.com
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A study on estimation method of electron energy distribution functions using floating harmonic analysis
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ÇÑ ´ö ¼± (¼®»ç)
±¹°¡ÇÙÀ¶ÇÕ¿¬±¸¼Ò ÇöóÁ±â¼ú¿¬±¸¼¾ÅÍ
2013.2 Á¹¾÷
q1q1w2w2@naver.com
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¾ÈÅ׳ª Á¢Áö ´Ü ÃàÀü±â¸¦ »ç¿ëÇÑ À¯µµ°áÇÕ ÇöóÁ Ư¼º ¹× ÀÀ¿ë¿¡ °üÇÑ ¿¬±¸
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ÀÌ Èñ Áø (¼®»ç)
Çö´ëÀÚµ¿Â÷
2013.2 Á¹¾÷
jeelhj@naver.com
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¹«¼±Àü·ÂÀü¼ÛÀ» ÀÌ¿ëÇÑ ÇöóÁ ¹Ðµµ ºÐÆ÷ Á¦¾î
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ÀÌ È¿ â (¹Ú»ç)
KRISS Çѱ¹Ç¥ÁذúÇבּ¸¿ø
2012.8 Á¹¾÷
flower4507@hanyang.ac.kr
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Studies on plasma parameters and electron transport heating in RF biased inductively coupled plasma
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¿À ¼¼ Áø (¹Ú»ç)
»ï¼ºÀüÀÚ »ý»ê±â¼ú¿¬±¸¼Ò
2012.8 Á¹¾÷
lifetide@hanyang.ac.kr
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ÇöóÁ Áø´ÜÀ» À§ÇÑ ½¬½º ÀÓÇÇ´ø½º ÃøÁ¤ ¹× Ư¼º ÀÀ¿ë¿¡ °üÇÑ ¿¬±¸
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ÀÌ ¿µ ±¤ (¹Ú»ç)
»ï¼ºÀüÀÚ »ý»ê±â¼ú¿¬±¸¼Ò
2012.2 Á¹¾÷
lifetide@hanyang.ac.kr
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Study on optical emission spectroscopy in inductively coupled argon plasma
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±è Çö ÁØ (¼®»ç)
P S K
2012.2 Á¹¾÷
kimhj1833@hanyang.ac.kr
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Àü·Â°ø±Þ¹æ½Ä¿¡ µû¸¥ À¯µµ°áÇÕ ÇöóÁ Ư¼º º¯È ¿¬±¸
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ÀÌ Á¤ ±Ô (¼®»ç)
ULVAC
2012.2 Á¹¾÷
chunrangljk@hanmail.net
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À¯µµ °áÇÕ ÇöóÁ¿¡¼ °¡½º Á¾·ù¿¡ µû¸¥ E-H ¸ðµå ÀüÀÌ Çö»ó ¿¬±¸
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À¯ °æ (¼®»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2012.2 Á¹¾÷
sblueskyw@naver.com
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A study on estimation method of electron energy distribution functions using floating harmonic analysis
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ÀÌ ¼ö Áø (¼®»ç)
SEMES
2012.2 Á¹¾÷
sjlee0715@hotmail.com
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Study on the discharge characteristics and power dissipation mode transition in asymmetric capacitively coupled plasma
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¹æ Áø ¿µ (¹Ú»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸®»ç¾÷ºÎ
2011.8 Á¹¾÷
tanziny@paran.com
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Studies on plasma source for large-area processing
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ÀÌ ¿µ È£ (¼®»ç)
Çѱ¹Àü·Â
2011.2 Á¹¾÷
withzealot@naver.com
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A study on the efficient power to the plasmas using a transformer
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ÇÑ Çü ½Ä (¼®»ç)
»ï¼ºµð½ºÇ÷¹ÀÌ
2010.8 Á¹¾÷
chosator@naver.com
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Measurement of sheath thickness at a floating pontential
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À± ÀΠâ (¼®»ç)
±èÆ÷ °íµîÇб³ ±³»ç
2010.8 Á¹¾÷
yic8717@paran.com
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The effect of high frequency baised electrode on a low freqency inductively coupled plasmar
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Àå ¼º È£ (¹Ú»ç)
»ï¼ºÀüÀÚ »ý»ê±â¼ú¿¬±¸¼Ò
2010.2 Á¹¾÷
tosungho@hotmail.com
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Studies on Real-time Plasma Diagnostics and Control by Using Harmonic Current Analysis at Floating Potential
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±¸ ÁÖ È¯ (¼®»ç)
LG À̳ëÅØ
2010.2 Á¹¾÷
used_up@naver.com
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Measurement of total energy losses per electron-ion lost in various mixed gas inductively coupled plasmas
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±è ¾Æ ¶÷ (¼®»ç)
PSK
2010.2 Á¹¾÷
rock1023@naver.com
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A study of the harmonic analysis method in non-Maxwellian plasmas
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±è °Ç È£ (¼®»ç)
LGÀüÀÚ ±â¼ú¿¬±¸¼Ò
2009.8 Á¹¾÷
kgunho@hanmail.net
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Experimental investigation on Edge-to-Center density ratio in inductively coupled plasma
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Ȳ ±¤ Å (¼®»ç)
»ï¼ºÀüÀÚ ¹ÝµµÃ¼¿¬±¸¼Ò
2009.8 Á¹¾÷
hkt@nate.com
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Measurement of the eletron temperatures and ion densties using self-bias effect in argon inductively coupled plasma
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Ȳ ±â È£ (¼®»ç)
»ï¼ºÀüÀÚ ¸Þ¸ð¸®»ç¾÷ºÎ
2008.2 Á¹¾÷
gen4@naver.com
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A study on process plasma source diagnostics by real-time measuring technique
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±è Áø ¼º (¼®»ç)
SK ÇÏÀ̴нº ¹Ì·¡±â¼ú¿¬±¸¿ø
2008.2 Á¹¾÷
kjs30513@naver.com
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A study of plasma characteristics depending on antenna shapes in Inductively Coupled Plasmas(ICPs)
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³² Çü È£ (¼®»ç)
´ë¸íÈÇÐ
2008.2 Á¹¾÷
namhh78@naver.com
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New Inductive coupled plasma antenna for improving the high efficiency and azmuthal symmetries
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Á¶ ¼º ¿ø (¹Ú»ç)
»ï¼ºÀüÀÚ
2021.8 Á¹¾÷
sungwon.cho@jcetglobal.com
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Study on discharge characteristics and uniformity control for Ferrite materials and dual structure antenna inductively coupled plasma
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ÀÌ °æ È¿ (¼®»ç)
SK ÇÏÀ̴нº
2007.2 Á¹¾÷
canopus24@paran.com
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Characterization of newly developed side-type ferrite inductively coupled plasma for large area processing
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¹Ú ³² ¼® (¼®»ç)
LG ÀüÀÚ
2005 Á¹¾÷
pureumae@lge.com
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The plasma chracteristic study by a double half turn antenna
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±è ¿ø ±â (¼®»ç)
SK ÇÏÀ̴нº
2005 Á¹¾÷
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Comparison study of electrical probes and microwave probes in an inductively coupled plasma
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